公开(公告)号：US20120228525A1

公开(公告)日：2012-09-13

申请号：US13402277

申请日：2012-02-22

申请人： Masato MORIYA ,  Hideyuki Hayashi ,  Osamu Wakabayashi

发明人： Masato MORIYA ,  Hideyuki Hayashi ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  H05G2/003 ,  H05G2/006

摘要： Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.

摘要翻译： 提供了一种系统和方法，其中与激光装置一起使用的极紫外（EUV）光产生装置被配置为检测已经照射靶的激光束的图像。 EUV光发生装置还可以被配置为基于检测结果来控制激光束被聚焦的位置和目标的位置。

公开(公告)号：US08847181B2

公开(公告)日：2014-09-30

申请号：US13402277

申请日：2012-02-22

申请人： Masato Moriya ,  Hideyuki Hayashi ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Hideyuki Hayashi ,  Osamu Wakabayashi

IPC分类号： H05G2/00 ,  G21K5/00

CPC分类号： H05G2/008 ,  H05G2/003 ,  H05G2/006

摘要： Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.

摘要翻译： 提供了一种系统和方法，其中与激光装置一起使用的极紫外（EUV）光产生装置被配置为检测已经照射靶的激光束的图像。 EUV光发生装置还可以被配置为基于检测结果来控制激光束被聚焦的位置和目标的位置。

公开(公告)号：US08804778B2

公开(公告)日：2014-08-12

申请号：US12580523

申请日：2009-10-16

申请人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

发明人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

IPC分类号： H01S3/10

CPC分类号： H01S3/2316 ,  B82Y20/00 ,  G03F7/70033 ,  H01S3/0007 ,  H01S3/107 ,  H01S3/2232 ,  H01S3/235 ,  H01S5/02284 ,  H01S5/0654 ,  H01S5/06837 ,  H01S5/0687 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4012 ,  H01S5/4062 ,  H01S5/4087

摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.

摘要翻译： 一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包​​含波长的纵模式激光， 以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射 具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

公开(公告)号：US08742379B2

公开(公告)日：2014-06-03

申请号：US13636038

申请日：2011-07-05

申请人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： H01S3/04

CPC分类号： H01S3/0401 ,  G02B7/008 ,  H01S3/005 ,  H01S3/2316 ,  H05G2/008 ,  Y10T137/6851

摘要： A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow.

摘要翻译： 窗口单元可以包括：被配置为允许激光束透过其中的窗口; 以及用于在其周边保持窗口的保持器，所述保持器设置有配置成允许流体流动的内部的流动通道。

公开(公告)号：US08698113B2

公开(公告)日：2014-04-15

申请号：US13696517

申请日：2011-12-13

申请人： Masato Moriya ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： G03F7/708 ,  G03F7/70008 ,  G03F7/70808 ,  G03F7/70833

摘要： A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

摘要翻译： 与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。

公开(公告)号：US08507885B2

公开(公告)日：2013-08-13

申请号：US13494778

申请日：2012-06-12

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC分类号： G21K5/04

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

摘要： The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

摘要翻译： 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射在不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。

公开(公告)号：US08476609B2

公开(公告)日：2013-07-02

申请号：US13306358

申请日：2011-11-29

申请人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B26/02

CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/2316 ,  H05G2/008

摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。

公开(公告)号：US08445876B2

公开(公告)日：2013-05-21

申请号：US12603872

申请日：2009-10-22

申请人： Takashi Suganuma ,  Masato Moriya ,  Tamotsu Abe ,  Kouji Kakizaki ,  Osamu Wakabayashi

发明人： Takashi Suganuma ,  Masato Moriya ,  Tamotsu Abe ,  Kouji Kakizaki ,  Osamu Wakabayashi

IPC分类号： H01J35/00 ,  G03B27/54

CPC分类号： G03F7/70891 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70591 ,  G03F7/7085 ,  H05G2/005

摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.

摘要翻译： 可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。 该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。

公开(公告)号：US20130020499A1

公开(公告)日：2013-01-24

申请号：US13636038

申请日：2011-07-05

申请人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G21K5/04 ,  F16L3/00 ,  H01S3/13

CPC分类号： H01S3/0401 ,  G02B7/008 ,  H01S3/005 ,  H01S3/2316 ,  H05G2/008 ,  Y10T137/6851

摘要： A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow.

摘要翻译： 窗口单元可以包括：被配置为允许激光束透过其中的窗口; 以及用于在其周边保持窗口的保持器，所述保持器设置有配置成允许流体流动的内部的流动通道。

公开(公告)号：US08227778B2

公开(公告)日：2012-07-24

申请号：US12469176

申请日：2009-05-20

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC分类号： G21K5/04

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

摘要： The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

摘要翻译： 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射在不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。