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    Vitamin D.sub.3 derivative and treating agent for inflammatory respiratory disease using same
    2.
    发明授权
    Vitamin D.sub.3 derivative and treating agent for inflammatory respiratory disease using same 失效
    维生素D3衍生物和用于炎性呼吸系统疾病的治疗剂

    公开(公告)号：US6028208A

    公开(公告)日：2000-02-22

    申请号：US242665

    申请日：1999-02-22

    申请人： Qingzhi Gao ,  Kenji Manabe ,  Minoru Furuya ,  Manabu Chokki ,  Hiroaki Mitsuhashi ,  Seiichi Ishizuka ,  Tadashi Kishimoto ,  Masayasu Tabe ,  Yasuji Sakuma ,  Atsuo Hazato ,  Hiroko Tanaka

    发明人： Qingzhi Gao ,  Kenji Manabe ,  Minoru Furuya ,  Manabu Chokki ,  Hiroaki Mitsuhashi ,  Seiichi Ishizuka ,  Tadashi Kishimoto ,  Masayasu Tabe ,  Yasuji Sakuma ,  Atsuo Hazato ,  Hiroko Tanaka

    IPC分类号： C07C401/00 ,  A61K31/59

    CPC分类号： C07C401/00

    摘要： Provided are vitamin D.sub.3 derivatives expressed by the following general formula [1] ##STR1## [wherein, R.sub.1 and R.sub.2 are each a hydrogen atom, a trialkylsilyl group, an acetyl group, a methoxymethyl group, or a tetrahydropyranyl group; R.sub.3 and R.sub.4 are each a hydrogen atom, a hydroxyl group, an acyloxy group, an alkyloxy group, an alkylthio group or an alkyl group which is optionally substituted; R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are each a hydrogen atom, a hydroxyl group, an alkyl group or an acyloxy group; R.sub.9 is a hydrogen atom, a hydroxyl group, an alkyl group or an alkylthio group; R.sub.10 is a hydrogen atom, an alkyl group or an alkyloxy group; A and B are each a hydrogen atom, a hydroxyl group, or together express a single bond; X and Y express a carbonyl oxygen, or one of them is a hydrogen atom and the other is a hydroxyl group or an acyloxy group; n is an integer of 0 to 2; m is an integer of 0 to 2], and a method for manufacturing the derivatives.The compounds can be sued as active ingredients of treating agents for inflammatory respiratory diseases, malignant tumors, rheumatoid arthritis, osteoporosis, diabetes mellitus, hypertension, alopecia, acne, psoriasis and dermatitis.

    摘要翻译： PCT No.PCT / JP98 / 02813 Sec。 一九九九年二月二十二日 102（e）1999年2月22日PCT提交1998年6月24日PCT公布。 公开号WO98 / 58909 日期：1998年12月30日提供由以下通式[1]表示的维生素D3衍生物[其中，R1和R2各自为氢原子，三烷基甲硅烷基，乙酰基，甲氧基甲基或四氢吡喃基; R3和R4各自为氢原子，羟基，酰氧基，烷氧基，烷硫基或任选取代的烷基; R5，R6，R7和R8分别是氢原子，羟基，烷基或酰氧基; R9为氢原子，羟基，烷基或烷硫基; R 10是氢原子，烷基或烷氧基; A和B各自为氢原子，羟基，或一起表示单键; X和Y表示羰基氧，或者其中一个是氢原子，另一个是羟基或酰氧基; n为0〜2的整数， m为0〜2的整数]，以及该衍生物的制造方法。 这些化合物可以作为炎性呼吸系统疾病，恶性肿瘤，类风湿性关节炎，骨质疏松症，糖尿病，高血压，脱发，痤疮，牛皮癣和皮炎的治疗剂的活性成分。

    Method of cleaning storage case
    9.
    发明授权
    Method of cleaning storage case 有权
    储存盒清洗方法

    公开(公告)号：US07967917B2

    公开(公告)日：2011-06-28

    申请号：US11839626

    申请日：2007-08-16

    申请人： Shu Shimada ,  Noriyuki Takahashi ,  Hiroyuki Nakajima ,  Hiroko Tanaka ,  Nobuyuki Kanda

    发明人： Shu Shimada ,  Noriyuki Takahashi ,  Hiroyuki Nakajima ,  Hiroko Tanaka ,  Nobuyuki Kanda

    IPC分类号： B08B5/02 ,  B08B9/093

    CPC分类号： B08B7/0071 ,  G03F1/66 ,  G03F1/82

    摘要： The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80° C. for desorbing and removing the foreign substance adhered to the storage case.

    摘要翻译： 本发明提供了一种清洁用于存放或传送诸如光掩模和光掩模坯料的掩模基板，诸如半导体晶片，薄膜等半导体基板的存储盒的方法。 本发明：便于定期的清洁操作，也可以用于复杂形状的储存盒，不需要大型设备或昂贵的设备来促进环境对策，并且提供高清洁效果。 清洁被有机材料的异物，物理吸收的离子性异物或离子性异物的附着物污染的储存箱的方法包括将储存箱放置在清洁空气的空气流中或惰性气体的步骤 气体在室温至80℃的温度范围内，用于解吸和除去粘附到储存盒的异物。

    Method for cleaning photo mask
    10.
    发明授权
    Method for cleaning photo mask 有权
    清洁光罩的方法

    公开(公告)号：US07718008B2

    公开(公告)日：2010-05-18

    申请号：US11839655

    申请日：2007-08-16

    申请人： Shu Shimada ,  Noriyuki Takahashi ,  Hiroko Tanaka ,  Hiroyuki Ishii ,  Yusuke Shoji ,  Masashi Ohtsuki

    发明人： Shu Shimada ,  Noriyuki Takahashi ,  Hiroko Tanaka ,  Hiroyuki Ishii ,  Yusuke Shoji ,  Masashi Ohtsuki

    IPC分类号： B08B7/00 ,  G01N21/00

    CPC分类号： G03F7/70925 ,  G03F1/64 ,  G03F1/82

    摘要： The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost. The method for cleaning a photo mask with a pellicle mounted, in which the pellicle frame has a gas introducing hole and a gas discharging hole, comprises: a step of introducing a gaseous substituting substance from the gas introducing hole in a pellicle inner space surrounded by the photo mask and the pellicle, substituting foreign substances on the photo mask, and discharging the foreign substances from the gas discharging hole; and a step of irradiating an ultraviolet ray to the photo mask, while an air or a nitrogen gas or a rare gas is introduced from the gas introducing hole, for degrading the substituted substituting substance so as to be gaseous, and discharging the same from the gas discharging hole.

    摘要翻译： 本发明提供了一种清洁光掩模的方法，而不需要除去安装在光掩模上的防护薄膜组件，而不需要用溶液洗涤的大规模设备，具有少量用于清洁和检查的步骤，并且没有 增加生产成本。 用防护薄膜组件清洁光罩的方法，其中防护薄膜组件框架具有气体导入孔和气体排出孔，包括：将气体取代物质从气体导入孔引入防护薄膜组件内部空间的步骤， 光掩模和防护薄膜组件，在光掩模上代替异物，并从排气孔排出异物; 以及从气体导入孔导入空气或氮气或稀有气体而将紫外线照射到光掩模的步骤，使取代的取代物质降解成气态，并将其从 气体排放孔。