摘要:
The invention relates to a transparent plastic film for screening electromagnetic waves, comprising a transparent film substrate and a layer system that has at least one silver layer, as well as a method for producing a plastic film of this type, wherein the silver layer is embedded between two niobium oxide layers.
摘要:
The invention relates to a transparent barrier film, comprising a transparent thermoplastic film and at least one permeation barrier layer, wherein the permeation barrier layer comprises a chemical compound of the elements zinc, tin and oxygen, and the mass fraction of zinc is 5% to 70%. Furthermore, the invention relates to a method for the production of a barrier film of this type.
摘要:
A transparent plastic film for screening electromagnetic waves includes a transparent film substrate and a layer system comprising at least one silver layer and two niobium oxide layers. The silver layer is embedded between the two niobium oxide layers.
摘要:
The invention relates to a transparent barrier layer system on a substrate, wherein the barrier layer system comprises a sequence of individual layers, wherein the individual layers are composed alternately of a layer A and a layer B and wherein a layer A differs from a layer B in terms of the activation energy in the permeation of water vapor with a difference of at least 1.5 kJ/mol.
摘要:
The invention relates to a method and a device for the plasma-enhanced deposition of a layer on a substrate (12) by means of a chemical reaction inside a vacuum chamber (11), wherein at least one starting material of the chemical reaction is guided into the vacuum chamber (11) through an inlet (13), and wherein the inlet (13) is connected as an electrode of a gas discharge at least in the region of the inlet opening (18). A magnetron can also be used in the reactive sputtering method.
摘要:
The invention relates to an antimicrobial material and a method for producing an antimicrobial material, which is deposited on a substrate (2), comprising the steps: Providing the substrate (2) in a vacuum working chamber (3); atomizing a biocidal metal by means of a sputtering device inside the vacuum working chamber (3) in the presence of an inert gas; simultaneous introduction of a precursor, which contains silicon, carbon, hydrogen and oxygen, into the vacuum working chamber (3) so that the sputtered metal particles and the precursor are exposed to a plasma action; deposition of a material on the substrate (2) such that a matrix is formed through the plasma activation of the precursor, in which matrix clusters of sputtered metal particles are incorporated.
摘要:
The invention relates to a layer system, comprising a substrate (1) on which firstly at least one barrier layer (2), followed by an intermediate layer (3) acting as an etch-stop layer and subsequently at least one electrically conductive layer (4) are deposited, and wherein the electrically conductive layer (4) is structured with wet-chemical etching media. The invention further relates to a method for the production and uses of a layer system of this type.