摘要:
The invention relates to a transparent barrier layer system on a substrate, wherein the barrier layer system comprises a sequence of individual layers, wherein the individual layers are composed alternately of a layer A and a layer B and wherein a layer A differs from a layer B in terms of the activation energy in the permeation of water vapor with a difference of at least 1.5 kJ/mol.
摘要:
The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.
摘要:
A transparent plastic film for screening electromagnetic waves includes a transparent film substrate and a layer system comprising at least one silver layer and two niobium oxide layers. The silver layer is embedded between the two niobium oxide layers.
摘要:
The invention relates to a layer system, comprising a substrate (1) on which firstly at least one barrier layer (2), followed by an intermediate layer (3) acting as an etch-stop layer and subsequently at least one electrically conductive layer (4) are deposited, and wherein the electrically conductive layer (4) is structured with wet-chemical etching media. The invention further relates to a method for the production and uses of a layer system of this type.
摘要:
The invention relates to a method and a device for the plasma-enhanced deposition of a layer on a substrate (12) by means of a chemical reaction inside a vacuum chamber (11), wherein at least one starting material of the chemical reaction is guided into the vacuum chamber (11) through an inlet (13), and wherein the inlet (13) is connected as an electrode of a gas discharge at least in the region of the inlet opening (18). A magnetron can also be used in the reactive sputtering method.
摘要:
The invention relates to a transparent plastic film for screening electromagnetic waves, comprising a transparent film substrate and a layer system that has at least one silver layer, as well as a method for producing a plastic film of this type, wherein the silver layer is embedded between two niobium oxide layers.
摘要:
The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.
摘要:
The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.
摘要:
A process is described for modification of a surface of a substrate by ion bombardment, in which the ions are produced by means of a magnetic field-assisted glow discharge in a process gas. The magnetic field-assisted glow discharge is produced by means of a magnetron having an electrode and at least one magnet for production of the magnetic field. The process gas has at least one electronegative constituent, such that negative ions are produced in the magnetic field-assisted glow discharge, and the negative ions which are produced at the surface of the electrode are accelerated in the direction of the substrate by an electrical voltage applied to the electrode.
摘要:
The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.