摘要:
A memory cell system including providing a substrate, forming a charge-storing stack having silicon-rich nitride on the substrate, and forming a gate on the charge-storing stack.
摘要:
A memory cell system including providing a substrate, forming a charge-storing stack having silicon-rich nitride on the substrate, and forming a gate on the charge-storing stack.
摘要:
A semiconductor device includes a substrate and a memory cell formed on the substrate. The memory cell includes a word line. The semiconductor device also includes a protection area formed in the substrate, a conductive structure configured to extend the word line to the protection area, and a contact configured to short the word line and the protection area.
摘要:
A flash memory system configured in accordance with an example embodiment of the invention employs a virtual ground array architecture. During programming operations, target memory cells are biased with a positive source bias voltage to reduce or eliminate leakage current that might otherwise conduct through the target memory cells. A positive source bias voltage may also be applied to target memory cells during verification operations (program verify, soft program verify, erase verify) to reduce or eliminate leakage current that might otherwise introduce errors in the verification operations.
摘要:
According to one exemplary embodiment, a method for fabricating a memory array includes forming a number of trenches in a substrate, where the trenches determine a number of wordline regions in the substrate, where each of the wordline regions is situated between two adjacent trenches, and where each of the wordline regions have a wordline region width. The memory array can be a flash memory array. The method further includes forming a number of bitlines in the substrate, where the bitlines are situated perpendicular to the trenches. The method further includes forming a dielectric region in each of the trenches. The method further includes forming a dielectric stack over the bitlines, wordline regions, and trenches. The method further includes forming a number of wordlines, where each wordline is situated over one of the wordline regions. The wordline region width determines an active wordline width of each of the wordlines.
摘要:
According to one exemplary embodiment, a programmable ROM array includes at least one bitline situated in a substrate. The programmable ROM array further includes at least one wordline situated over the at least one bitline. The programmable ROM array further includes a memory cell situated at an intersection of the at least one bitline and the at least one wordline, where the memory cell includes a dielectric region situated between the at least one bitline and the at least one wordline. A programming operation causes the memory cell to change from a first logic state to a second logic state by causing the dielectric region to break down. The programming operation causes the memory cell to operate as a diode. A resistance of the memory cell can be measured in a read operation to determine if the memory cell has the first or second logic state.
摘要:
A flash memory system configured in accordance with an example embodiment of the invention employs a virtual ground array architecture. During programming operations, target memory cells are biased with a positive source bias voltage to reduce or eliminate leakage current that might otherwise conduct through the target memory cells. A positive source bias voltage may also be applied to target memory cells during verification operations (program verify, soft program verify, erase verify) to reduce or eliminate leakage current that might otherwise introduce errors in the verification operations.
摘要:
A semiconductor device includes a substrate and a memory cell formed on the substrate. The memory cell includes a word line. The semiconductor device also includes a protection area formed in the substrate, a conductive structure configured to extend the word line to the protection area, and a contact configured to short the word line and the protection area.
摘要:
A semiconductor memory device may include an intergate dielectric layer of a high-K, high barrier height dielectric material interposed between a charge storage layer and a control gate. With this intergate high-K, high barrier height dielectric in place, the memory device may be efficiently erased using Fowler-Nordheim tunneling.
摘要:
A flash memory system configured in accordance with an example embodiment of the invention employs a virtual ground array architecture. During programming operations, target memory cells are biased with a positive source bias voltage to reduce or eliminate leakage current that might otherwise conduct through the target memory cells. A positive source bias voltage may also be applied to target memory cells during verification operations (program verify, soft program verify, erase verify) to reduce or eliminate leakage current that might otherwise introduce errors in the verification operations.