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    Method of making coating layers containing photocatalyst and a photocatalyst coating film formed thereby
    2.
    发明授权
    Method of making coating layers containing photocatalyst and a photocatalyst coating film formed thereby 有权
    制造含有光催化剂的涂层和由此形成的光催化剂涂膜的方法

    公开(公告)号：US06335061B1

    公开(公告)日：2002-01-01

    申请号：US09487307

    申请日：2000-01-19

    申请人： Tarou Kanamori ,  Mibuko Shimada ,  Toshinori Sakagami

    发明人： Tarou Kanamori ,  Mibuko Shimada ,  Toshinori Sakagami

    IPC分类号： B05D306

    CPC分类号： C08J7/047 ,  C08J2483/00 ,  C09D183/04 ,  C08L2666/04 ,  C08L2666/54

    摘要： A film which is improved in the resistance to fouling, the durability, and the transparency and has a photocatalytic function is provided by a method of making photocatalyst contained coating layers which comprises the steps of forming on the surface of an organic film an (under)coating of a coating composition composed mainly of at least one component (a) selected from organosilanes, hydrolyzates of the organosilanes, and condensates of the organosilanes and, when desired, a polymer component (b) having a silyl group containing silicon atoms bonded with a hydrolytic group and/or a hydroxy group, and forming on the (under)coating an (over)coating of a coating composition composed mainly of the component (a), a photocatalyst and, if desired, the component (b).

    摘要翻译： 通过制备含有光催化剂的涂层的方法，提供了耐污垢性，耐久性和透明性并具有光催化功能的膜，其包括以下步骤：在有机膜的表面上形成（下） 主要由至少一种选自有机硅烷，有机硅烷的水解产物和有机硅烷的缩合物的组分（a）组成的涂料组合物的涂层，以及当需要时具有含硅原子的甲硅烷基的聚合物组分（b） 水解基和/或羟基，并且在（下）涂层上形成主要由组分（a）组成的涂料组合物，光催化剂和（如果需要）组分（b）的（过）涂层。

    Method of making coating layers containing photocatalyst and a photocatalyst coating glass formed thereby
    3.
    发明授权
    Method of making coating layers containing photocatalyst and a photocatalyst coating glass formed thereby 有权
    制备含有光催化剂的涂层和由此形成的光催化剂涂覆玻璃的方法

    公开(公告)号：US06440569B1

    公开(公告)日：2002-08-27

    申请号：US09487310

    申请日：2000-01-19

    申请人： Tarou Kanamori ,  Mibuko Shimada ,  Toshinori Sakagami

    发明人： Tarou Kanamori ,  Mibuko Shimada ,  Toshinori Sakagami

    IPC分类号： B32B1706

    CPC分类号： C08J7/047 ,  C08J2483/00 ,  C09D183/04 ,  Y10T428/31612 ,  Y10T428/31663 ,  C08L2666/04 ,  C08L2666/54

    摘要： A coating glass which is improved in the resistance to fouling, the durability, and the transparency and has a photocatalytic function is provided by a method of making photocatalyst contained,d coating layers which comprises the steps of forming on the surface of a glass an (under) coating of a coating composition composed mainly of at least one component (a) selected from organosilanes, hydrolyzates of the organosilanes, and condensates of the organosilanes and, when desired, a polymer component (b) having a silyl group containing silicon atoms bonded with a hydrolytic group and/or a hydroxy group, and forming on the (under)coating an (over)coating of a coating composition composed mainly of the component (a), a photocatalyst and, if desired, the component (b).

    摘要翻译： 通过制备含有光催化剂的方法提供耐污垢性，耐久性和透明性并具有光催化功能的涂层玻璃，其包括以下步骤：在玻璃表面上形成（ 主要由至少一种选自有机硅烷，有机硅烷的水解产物和有机硅烷的缩合物的组分（a）组成的涂料组合物的涂覆，以及需要时具有含硅原子键合的甲硅烷基的聚合物组分（b） 和（或）羟基，并且在（下）涂层上形成主要由组分（a）组成的涂料组合物，光催化剂和（如果需要）组分（b）的（过）涂层。

    Coating composition having at least one UV ray absorbing component
    4.
    发明授权
    Coating composition having at least one UV ray absorbing component 有权
    具有至少一种紫外线吸收组分的涂料组合物

    公开(公告)号：US06214416B1

    公开(公告)日：2001-04-10

    申请号：US09236638

    申请日：1999-01-26

    申请人： Toshinori Sakagami ,  Mibuko Shimada

    发明人： Toshinori Sakagami ,  Mibuko Shimada

    IPC分类号： B05D302

    CPC分类号： C09D183/04 ,  C09D4/00 ,  C08G77/02 ,  C08G77/04 ,  C08L2666/54 ,  C08L2666/28

    摘要： A coating composition comprising (A) a hydrolyzate or partial condensate, or both, of an organosilane compound represented by the following formula (1), (R1)nSi(OR2)4−n  (1) wherein R1 is a hydrogen atom or a monovalent organic group having 1-8 carbon atoms, R2 is an alkyl group having 1-5 carbon atoms or an acyl group having 1-6 carbon atoms, and n is an integer from 0 to 2, (B) at least one ultraviolet ray absorbing component selected from the group consisting of fine semiconductor particles, semiconductor sols, and organic compounds having ultraviolet ray absorbing capability, and (C1) water and/or an organic solvent. The coating composition exhibits excellent storage stability and produces coating films with good appearance, superior adhesion properties, weather resistance, high hardness, and superb UV absorbing capability.

    摘要翻译： 一种涂料组合物，其包含（A）由下式（1）表示的有机硅烷化合物的水解产物或部分缩合物或两者，其中R 1是氢原子或具有1-8个碳原子的一价有机基团，R 2是 具有1-5个碳原子的烷基或具有1-6个碳原子的酰基，n是0-2的整数，（B）至少一种紫外线吸收组分，其选自精细的半导体颗粒，半导体 溶胶和具有紫外线吸收能力的有机化合物，和（C1）水和/或有机溶剂。 涂料组合物表现出优异的储存稳定性，并且产生具有良好外观，优异的粘合性能，耐候性，高硬度和极好的UV吸收能力的涂膜。

    Block copolymer compositions and process for the preparation thereof
    9.
    发明授权
    Block copolymer compositions and process for the preparation thereof 失效
    嵌段共聚物组合物及其制备方法

    公开(公告)号：US5093430A

    公开(公告)日：1992-03-03

    申请号：US442334

    申请日：1989-11-22

    申请人： Toshinori Sakagami ,  Yasuo Toyama ,  Hisaharu Ito ,  Takumi, Miyachi

    发明人： Toshinori Sakagami ,  Yasuo Toyama ,  Hisaharu Ito ,  Takumi, Miyachi

    IPC分类号： C08F297/04 ,  C08G81/02 ,  C08L53/02 ,  C09J125/10 ,  C09J153/02

    CPC分类号： C08L53/02 ,  C08F297/046 ,  C08G81/022 ,  C09J153/02

    摘要： A block copolymer composition is provided comprising:(1) 10-60% by weight of a block copolymer [(A--B).sub.11 ].sub.m --Y.sub.1(2) 20-90% by weight of a block copolymer [(A--B).sub.12 ].sub.n --Y.sub.2, and(3) 0-50% by weight of a block copolymer (A--B.sub.13,in which A represents a vinyl aromatic polymer block having a molecular weight of 10,000-30,000 wherein the vinyl aromatic compound is selected from the group consisting of styrene, alkyl substituted styrene and a vinyl naphtalene, B.sub.1 a conjugated diene polymer block having a molecular weight of 25,000-100,000, B.sub.2 a conjugated diene polymer block having a molecular weight at least 1.2 times as high as that of B.sub.1 wherein the conjugated diene compound of B.sub.1 and B.sub.2 is a conjugated diene having four to eight carbon atoms per molecule, Y.sub.1 and Y.sub.2 respectively represent a halogenated, tetravalent silicon compound and a halogenated, tetravalent stannic compound and 11=1-3, m=2-4, 12=1-6, n=2-4 and 13=1-6.The block copolymer is prepared by the successive steps of (i) polymerizing the vinyl aromatic compound building block A and the conjugated diene compound building block B.sub.1, (ii) adding a halogenated tetravalent silicon compound, (iii) adding and polymerizing the conjugated diene compound building block B.sub.2 and (iv) adding a halogenated tetravalent stannic compound. The block copolymer is particularly useful in adhesive compositions.

    摘要翻译： PCT No.PCT / EP88 / 00271 Sec。 371日期：一九八九年十一月二十二日 102（e）日期1989年11月22日PCT提交1988年3月25日PCT公布。 出版物WO89 / 09242 日本特开1989年10月5日提供了一种嵌段共聚物组合物，其包含：（1）10-60重量％嵌段共聚物[（AB）11] m-Y1（2）20-90重量％的嵌段共聚物 [（AB）12] n-Y2和（3）0-50重量％的嵌段共聚物（A-B13，其中A表示分子量为10,000-30,000的乙烯基芳族聚合物嵌段，其中乙烯基芳族 化合物选自苯乙烯，烷基取代的苯乙烯和乙烯基萘，B1是分子量为25,000-100,000的共轭二烯聚合物嵌段，B2是分子量为至少1.2倍的共轭二烯聚合物嵌段 其中B1和B2的共轭二烯化合物是每分子具有4至8个碳原子的共轭二烯的B1，其中Y 1和Y 2分别表示卤代四价硅化合物和卤代四价锡化合物，并且11 = 1-3， m = 2-4,12 = 1-6，n = 2-4和13 = 1-6。通过连续步骤制备嵌段共聚物 （i）使乙烯基芳族化合物结构单元A和共轭二烯化合物结构单元B1聚合，（ii）添加卤代四价硅化合物，（iii）添加和聚合共轭二烯化合物结构单元B2，和（iv） 卤代四价锡化合物。 嵌段共聚物在粘合剂组合物中特别有用。