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    MEMS device including an electrical interconnect through a substrate
    1.
    发明授权
    MEMS device including an electrical interconnect through a substrate 有权
    MEMS器件包括通过衬底的电互连

    公开(公告)号：US08384134B2

    公开(公告)日：2013-02-26

    申请号：US13455494

    申请日：2012-04-25

    申请人： Michael J. Daneman ,  Steven S. Nasiri ,  Martin Lim

    发明人： Michael J. Daneman ,  Steven S. Nasiri ,  Martin Lim

    IPC分类号： H01L27/148 ,  H01L29/84 ,  H01L21/00

    CPC分类号： A45D27/42 ,  B81C1/00238 ,  B81C2203/0792 ,  H01L21/76898

    摘要： A MEMS device is disclosed. The MEMS device comprises a MEMS substrate and a CMOS substrate having a front surface, a back surface and one or more metallization layers. The front surface being bonded to the MEMS substrate. The MEMS device includes one or more conductive features on the back surface of the CMOS substrate and electrical connections between the one or more metallization layers and the one or more conductive features.

    摘要翻译： 公开了MEMS器件。 MEMS器件包括MEMS衬底和具有前表面，后表面和一个或多个金属化层的CMOS衬底。 前表面接合到MEMS基板上。 MEMS器件包括在CMOS衬底的背面上的一个或多个导电特征以及一个或多个金属化层与一个或多个导电特征之间的电连接。

    Maintaining the state of a MEMS device in the event of a power failure
    3.
    发明授权
    Maintaining the state of a MEMS device in the event of a power failure 有权
    在电源故障的情况下保持MEMS器件的状态

    公开(公告)号：US06514781B2

    公开(公告)日：2003-02-04

    申请号：US09900841

    申请日：2001-07-07

    申请人： Mark W. Chang ,  Scott D. Dalton ,  Michael J. Daneman ,  Timothy Beerling ,  Stephen F. Panyko ,  Gary M. Zalewski

    发明人： Mark W. Chang ,  Scott D. Dalton ,  Michael J. Daneman ,  Timothy Beerling ,  Stephen F. Panyko ,  Gary M. Zalewski

    IPC分类号： H01L2100

    CPC分类号： G02B26/0841

    摘要： A method and apparatus for maintaining the state of a MEMS device in the event of a power failure are disclosed. The apparatus and method may be used with a MEMS device generally having one or more MEMS elements moveably coupled to a substrate that uses electrostatic clamping force to sustain the state of the MEMS element. According to the method, a capacitive or other charge-storing circuit is coupled between a clamping surface and an electrical ground. During normal operation, a clamping voltage is applied between the clamping surface and at least one MEMS element to retain the at least one MEMS element against the clamping surface. In the event of a power failure, the source of the clamping voltage and other circuit paths to ground are isolated from the clamping surface. The charge-storing circuit maintains an electric charge on the clamping surface. Leaky circuit paths to ground may be isolated from the clamping surface by an isolator element configured to electrically isolate the clamping surface in the event of a power failure. The isolator element may include an opto-isolator or a low leakage diode.

    摘要翻译： 公开了一种用于在电源故障的情况下保持MEMS装置的状态的方法和装置。 该装置和方法可以与通常具有一个或多个MEMS元件的MEMS器件一起使用，所述MEMS元件可移动地耦合到使用静电夹持力来维持MEMS元件的状态的基板。 根据该方法，电容或其他电荷存储电路耦合在夹紧表面和电接地之间。 在正常操作期间，钳位电压施加在夹紧表面和至少一个MEMS元件之间以将至少一个MEMS元件保持抵靠夹紧表面。 在电源故障的情况下，钳位电压的来源和其他到地的电路路径与夹紧表面隔离。 电荷存储电路在夹持表面上保持电荷。 泄漏电路到地的路径可以通过隔离器元件与夹紧表面隔离，隔离器元件被配置为在电源故障的情况下电隔离夹紧表面。 隔离元件可以包括光隔离器或低泄漏二极管。

    Fabrication and controlled release of structures using etch-stop trenches
    4.
    发明授权
    Fabrication and controlled release of structures using etch-stop trenches 有权
    使用蚀刻停止沟槽的结构的制造和控制释放

    公开(公告)号：US06887391B1

    公开(公告)日：2005-05-03

    申请号：US09712420

    申请日：2000-11-13

    申请人： Michael J. Daneman ,  Behrang Behin

    发明人： Michael J. Daneman ,  Behrang Behin

    IPC分类号： B81B3/00 ,  B81C1/00 ,  C23F1/00 ,  H01L21/311

    CPC分类号： B81C1/00571 ,  B81B2203/0136

    摘要： MEMS structures may be formed on a substrate by forming a series trenches filled with etch-stop material in the device layer, followed by an isotropic etch of the device material stopping on the etch-stop material. This approach provides a controlled release method where the exact timing of the isotropic release etch becomes non-critical. Further, using this method, structures with significant topology may be fabricated while keeping the wafer topology to a minimum during processing until the very end of the process. Using the method of this invention, features with large topology may be formed while keeping the wafer topology to a minimum until the very end of the process.

    摘要翻译： MEMS结构可以通过在器件层中形成填充有蚀刻停止材料的串联沟槽，然后在蚀刻停止材料上停止的器件材料的各向同性蚀刻，在衬底上形成。 这种方法提供了一种控制释放方法，其中各向同性释放蚀刻的精确定时变得非关键。 此外，使用这种方法，可以制造具有显着拓扑结构的结构，同时在处理期间将晶片拓扑保持最小，直到过程的最后结束。 使用本发明的方法，可以形成具有大拓扑结构的特征，同时将晶片拓扑保持在最小状态，直到处理结束。

    Two-dimensional gimbaled scanning actuator with vertical electrostatic comb-drive for actuation and/or sensing
    5.
    发明授权
    Two-dimensional gimbaled scanning actuator with vertical electrostatic comb-drive for actuation and/or sensing 有权
    具有垂直静电梳状驱动器的二维万向扫描执行器用于致动和/或感测

    公开(公告)号：US06819822B2

    公开(公告)日：2004-11-16

    申请号：US09751660

    申请日：2000-12-28

    申请人： Behrang Behin ,  Michael J. Daneman ,  Meng-Hsiung Kiang ,  Kam-Yin Lau ,  Satinderpall Pannu

    发明人： Behrang Behin ,  Michael J. Daneman ,  Meng-Hsiung Kiang ,  Kam-Yin Lau ,  Satinderpall Pannu

    IPC分类号： G02B635

    CPC分类号： G02B6/3556 ,  B81B3/0021 ,  B81B2201/033 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  B81B2207/07 ,  B81C1/00214 ,  G02B6/3512 ,  G02B6/3518 ,  G02B6/3542 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/357 ,  G02B6/3584 ,  G02B26/0833 ,  G02B26/085 ,  G02B26/0858 ,  G02B26/0866 ,  H02N1/008

    摘要： A two-dimensional scanner consists of a rotatable gimbal structure with vertical electrostatic comb-drive actuators and sensors. The scanner's two axes of rotation may be controlled independently by activating two sets of vertical comb-drive actuators. The first set of vertical comb-drive actuator is positioned in between a outer frame of the gimbal structure and the base, and the second set of vertical comb-drive actuator is positioned in between the inner part of the gimbal structure and the outer frame of the gimbal structure. The inner part of the gimbal structure may include a reflective surface, and the device may be used as a mirror. Furthermore, the capacitance of the vertical comb-drives may be measured to monitor the angular position of the mirror, and the capacitive position-monitoring signal may be used to implement closed-loop feedback control of the mirror angle. The two-dimensional scanner may be fabricated in a semiconductor process. Two-dimensional scanners may be used to produce fiber-optic switches.

    摘要翻译： 二维扫描器由可旋转的万向架结构与垂直静电梳状驱动致动器和传感器组成。 扫描仪的两个旋转轴可以通过激活两组垂直梳齿驱动执行器来独立控制。 第一组垂直梳齿驱动致动器位于万向架结构的外框架和基座之间，第二组垂直梳齿驱动致动器定位在万向架结构的内部和外框之间 万向架结构。 万向节结构的内部可以包括反射表面，并且该装置可以用作反射镜。 此外，可以测量垂直梳状驱动器的电容以监视反射镜的角度位置，并且可以使用电容位置监视信号来实现镜角的闭环反馈控制。 二维扫描器可以在半导体工艺中制造。 二维扫描仪可用于生产光纤交换机。

    Use of applied force to improve MEMS switch performance
    6.
    发明授权
    Use of applied force to improve MEMS switch performance 有权
    使用施加力来提高MEMS开关性能

    公开(公告)号：US06819820B1

    公开(公告)日：2004-11-16

    申请号：US09932433

    申请日：2001-08-18

    申请人： Murali Chaparala ,  Michael J. Daneman

    发明人： Murali Chaparala ,  Michael J. Daneman

    IPC分类号： G02B642

    CPC分类号： G02B26/0841 ,  B81B3/0008 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00214 ,  G02B6/32 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3548 ,  G02B6/357 ,  G02B6/358 ,  G02B6/3584 ,  G02B2006/12104

    摘要： A method is disclosed for operating a MEMS device having a flap that is movable with respect to a base. The method includes applying a force to the flap to move the flap at least partially out of contact with an underlying base. Means for applying such a biasing force may be incorporated into a microelectromechanical (MEMS) apparatus having a base and a flap with a portion coupled to the base so that the flap may move out of the plane of the base between first and second position. The base may have a cavity with largely vertical sidewalls that contact a portion of the flap when the flap is in the second position Electrodes may be placed on the vertical sidewalls and electrically isolated from the base to provide electrostatic clamping of the flap to the sidewall. The base may be made from a substrate portion of a silicon-on-insulator (SOI) wafer and the flap defined from a device layer of the SOI wafer. The flap may be connected to the base by one or more flexures such as torsional beams. An array of one or more of such structures may be used to form an optical switch.

    摘要翻译： 公开了一种用于操作具有相对于基座可移动的翼片的MEMS装置的方法。 所述方法包括向所述翼片施加力以使所述翼片至少部分地与下面的基座接触。 用于施加这种偏压力的装置可以结合到具有基部和翼片的微机电（MEMS）装置中，该翼片具有联接到基部的部分，使得翼片可以在第一和第二位置之间移动离开基部的平面。 底座可以具有一个具有很大垂直侧壁的空腔，当瓣片处于第二位置时，电极可以被放置在垂直侧壁上并与底座电隔离以提供瓣片向侧壁的静电夹持。 基底可以由绝缘体上硅（SOI）晶片的衬底部分和从SOI晶片的器件层限定的瓣形成。 翼片可以通过一个或多个挠曲件（例如扭转梁）连接到基座。 可以使用一个或多个这样的结构的阵列来形成光学开关。

    Mechanical landing pad formed on the underside of a MEMS device
    7.
    发明授权
    Mechanical landing pad formed on the underside of a MEMS device 有权
    机械着陆垫形成在MEMS器件的下侧

    公开(公告)号：US06764936B2

    公开(公告)日：2004-07-20

    申请号：US09912150

    申请日：2001-07-23

    申请人： Michael J. Daneman ,  Behrang Behin ,  Meng-Hsiung Kiang

    发明人： Michael J. Daneman ,  Behrang Behin ,  Meng-Hsiung Kiang

    IPC分类号： H01L2144

    CPC分类号： G02B26/085 ,  B81B3/0008 ,  B81B3/001 ,  B81B3/0051 ,  G02B26/0833 ,  G02B26/0841

    摘要： A device having a landing pad structure on an underside of a device and method for fabricating same. The device is formed from a device layer with at least one landing pad protruding from an underside thereof. The landing pad is attached to the device layer by a plug passing through an opening in the device layer. The device may be attached to the device layer by one or more compliant flexures, which allow the device to rotate in and out of a plane defined by the device layer. The landing pads are fabricated by forming one or more vias through the device layer. An underlying sacrificial layer is then partially etched to form one or more depressions at locations corresponding to locations of the vias in the device layer. The vias and depressions are then filled with a landing pad material to form a structure having one or more landing pads protruding from an underside of the device layer. The sacrificial layer is subsequently removed to release the device. Particular embodiments of both methods may be applied to fabricating microelectromechanical systems (MEMS) especially MEMS mirrors. The various embodiments are well suited to use with silicon on insulator (SOI) substrates.

    摘要翻译： 一种在装置的下侧具有着陆垫结构的装置及其制造方法。 该装置由具有从其下侧突出的至少一个着陆板的装置层形成。 着陆垫通过穿过装置层中的开口的塞子附接到装置层。 该装置可以通过一个或多个柔顺的挠曲件附接到装置层，这允许装置在由装置层限定的平面内进出。 通过形成穿过器件层的一个或多个通孔来制造着陆焊盘。 然后将底层牺牲层部分地蚀刻以在对应于器件层中的通孔的位置的位置处形成一个或多个凹陷。 通孔和凹陷然后用着陆垫材料填充以形成具有从装置层的下侧突出的一个或多个着陆垫的结构。 随后去除牺牲层以释放该装置。 两种方法的特定实施例可以应用于制造微机电系统（MEMS），特别是MEMS镜。 各种实施例非常适合于与绝缘体上硅（SOI）衬底一起使用。

    High contrast grating light valve type device
    8.
    发明授权
    High contrast grating light valve type device 有权
    高对比度光栅光阀型装置

    公开(公告)号：US07177081B2

    公开(公告)日：2007-02-13

    申请号：US09802619

    申请日：2001-03-08

    申请人： Akira Tomita ,  David Thomas Amm ,  Michael J. Daneman ,  James Hunter ,  Bryan Staker

    发明人： Akira Tomita ,  David Thomas Amm ,  Michael J. Daneman ,  James Hunter ,  Bryan Staker

    IPC分类号： G02B5/18

    CPC分类号： G02B26/0808 ,  G02B5/1828

    摘要： A grating light valve has with a plurality of spaced reflective ribbons are spatially arranged over a substrate with reflective surfaces. The grating light valve is configured to optimized the conditions for constructive and destructive interference with an incident light source having a wavelength λ. The grating light valve preferably has a set of movable active ribbons alternating between the set of stationary bias ribbons. The active ribbons and the bias ribbons are spatially separated over the substrate surface such that reflective regions of the substrate surface correspond to the spaces between the ribbons. The ribbons and reflective regions of the substrate optically and geometrically optimized for to generate the conditions for constrictive and destructive interference with the incident light source. Accordingly, ribbons of the active ribbons are configured with reflective cross sections that are is approximately equal to the sum of the diffraction cross sections of the bias ribbons and the reflective regions of the substrate. In operation, active ribbons are moved by a multiple of λ/4 to switch between the conditions for constructive and destructive interference.

    摘要翻译： 光栅光阀具有多个间隔开的反射带，其空间上布置在具有反射表面的基板上。 光栅光阀被配置为优化与具有波长λ的入射光源的建构性和相消干涉的条件。 光栅光阀优选地具有在一组固定偏置带之间交替的一组可移动有源带。 有源带和偏置带在衬底表面上在空间上分开，使得衬底表面的反射区域对应于带之间的空间。 光学和几何优化的基板的带和反射区域以产生用于对入射光源的收缩和相消干涉的条件。 因此，有源带的带被构造成具有近似等于偏置带的衍射横截面和基板的反射区域之和的反射横截面。 在操作中，活动色带移动λ/ 4的倍数，以在建构性和相消干涉的条件之间切换。