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12 条记录 (耗时 0.028 秒)

    WATERMARK DEFECT REDUCTION BY RESIST OPTIMIZATION
    1.
    发明申请
    WATERMARK DEFECT REDUCTION BY RESIST OPTIMIZATION 审中-公开
    通过耐压优化降低水价缺陷

    公开(公告)号：US20080213689A1

    公开(公告)日：2008-09-04

    申请号：US11863117

    申请日：2007-09-27

    申请人： Michael Kocsis ,  Roel Gronheid ,  Akimasa Soyano

    发明人： Michael Kocsis ,  Roel Gronheid ,  Akimasa Soyano

    IPC分类号： G03F7/004 ,  G03F7/26

    CPC分类号： G03F7/2041 ,  G03F7/0045

    摘要： A method is disclosed for lithographic processing. In one aspect, the method comprises obtaining a resist material with predetermined resist properties. The method further comprises using the resist material for providing a resist layer on the device to be lithographic processed. The method further comprises illuminating the resist layer according to a predetermined pattern to be obtained. The obtained resist material comprises a tuned photo-acid generator component and/or a tuned quencher component and/or a tuned acid mobility as to reduce watermark defects on the lithographic processed device. In another aspect, a corresponding resist material, a set of resist materials, use of such materials and a method for setting up a lithographic process are disclosed.

    摘要翻译： 公开了一种用于光刻处理的方法。 一方面，该方法包括获得具有预定抗蚀剂性质的抗蚀剂材料。 该方法还包括使用抗蚀剂材料在待光刻处理的器件上提供抗蚀剂层。 该方法还包括根据要获得的预定图案来照射抗蚀剂层。 获得的抗蚀剂材料包括调节的光酸产生剂组分和/或调谐的猝灭剂组分和/或调谐的酸迁移率，以减少光刻加工设备上的水印缺陷。 另一方面，公开了相应的抗蚀剂材料，一组抗蚀剂材料，这种材料的使用以及用于建立光刻工艺的方法。

    Radiation-sensitive resin composition
    4.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US06800419B2

    公开(公告)日：2004-10-05

    申请号：US10369674

    申请日：2003-02-21

    申请人： Akimasa Soyano ,  Hiroyuki Ishii ,  Hidemitsu Ishida ,  Motoyuki Shima ,  Yukio Nishimura

    发明人： Akimasa Soyano ,  Hiroyuki Ishii ,  Hidemitsu Ishida ,  Motoyuki Shima ,  Yukio Nishimura

    IPC分类号： G03F7039

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

    摘要： A radiation-sensitive resin composition comprising: (A) an alkali insoluble or scarcely alkali-soluble resin having an acid-dissociable protecting group of the following formula [I], wherein R1 groups are monovalent alicyclic hydrocarbon groups or alkyl groups, provided that at least one of the R1 groups is the monovalent alicyclic hydrocarbon group, or any two of the R1 groups and the carbon atom form a divalent alicyclic hydrocarbon group, (B) a photoacid generator, and (C) propylene glycol monomethyl ether acetate, &ggr;-butyrolactone, and cyclohexanone as solvents. The resin composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays and exhibits excellent film thickness uniformity and storage stability.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含：（A）具有下式[I]的酸解离保护基的碱不溶性或几乎不溶的碱溶性树脂，其中R 1为一价脂环族烃基或烷基， 条件是R 1基团中的至少一个为一价脂环族烃基，或者R 1基团和碳原子中的任何两个形成二价脂环族烃基，（B）光致酸发生剂和（C ）丙二醇单甲醚乙酸酯，γ-丁内酯和环己酮作为溶剂。 树脂组合物可用作用于使用深紫外线的微细加工的化学增幅抗蚀剂，并且显示出优异的膜厚均匀性和储存稳定性。

    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND
    6.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
    辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物

    公开(公告)号：US20140004463A9

    公开(公告)日：2014-01-02

    申请号：US13699003

    申请日：2011-05-19

    申请人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    发明人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  C07C69/653 ,  C07C69/753 ,  C07D307/93 ,  C08F22/18 ,  C08F24/00 ,  C08F220/24 ,  C08F220/26 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041

    摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

    摘要翻译： 提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出 排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段 接触角启用。 一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的结构单元（I）的聚合物和（B）辐射敏感性酸产生剂。

    Radiation-sensitive resin composition
    8.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US06623907B2

    公开(公告)日：2003-09-23

    申请号：US09774714

    申请日：2001-02-01

    申请人： Jun Numata ,  Aki Suzuki ,  Hiromichi Hara ,  Norihiro Natsume ,  Kiyoshi Murata ,  Masafumi Yamamoto ,  Akimasa Soyano ,  Toru Kajita ,  Tsutomu Shimokawa

    发明人： Jun Numata ,  Aki Suzuki ,  Hiromichi Hara ,  Norihiro Natsume ,  Kiyoshi Murata ,  Masafumi Yamamoto ,  Akimasa Soyano ,  Toru Kajita ,  Tsutomu Shimokawa

    IPC分类号： G03F7004

    CPC分类号： G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  Y10S430/111 ,  Y10S430/128

    摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.

    摘要翻译： 一种正色辐射敏感性树脂组合物，其包含：（A）具有至少一个氨基的低分子量化合物，其中所述氮原子具有与其键合的至少一个氢原子，并且至少一个氢原子被 叔丁氧基羰基，（B）光酸产生剂和（C-1）不溶于或几乎不溶于碱的树脂，其被酸解离基团保护并且当酸解离基解离时变得可溶于碱，或（C -2）碱溶性树脂和碱溶性控制剂。 还公开了包含低分子量化合物（A），光酸产生剂（B），碱溶性树脂（D）和能够与碱溶性树脂交联的化合物的负色辐射敏感性树脂组合物 在酸（E）的存在下。 该组合物可用作化学放大抗蚀剂，其有效地响应各种辐射，表现出优异的灵敏度和分辨率，即使图案是隔离线图案，也以高精度和稳定的方式形成精细图案。

    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND
    10.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
    辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物

    公开(公告)号：US20130143160A1

    公开(公告)日：2013-06-06

    申请号：US13699003

    申请日：2011-05-19

    申请人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    发明人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  C07C69/653 ,  C07C69/753 ,  C07D307/93 ,  C08F22/18 ,  C08F24/00 ,  C08F220/24 ,  C08F220/26 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041

    摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

    摘要翻译： 提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出 排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段 接触角启用。 一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的结构单元（I）的聚合物和（B）辐射敏感性酸产生剂。