Semiconductor material doping based on target valence band discontinuity
    2.
    发明授权
    Semiconductor material doping based on target valence band discontinuity 有权
    基于目标价带不连续的半导体材料掺杂

    公开(公告)号:US08426225B2

    公开(公告)日:2013-04-23

    申请号:US12960476

    申请日:2010-12-04

    摘要: A solution for designing and/or fabricating a structure including a quantum well and an adjacent barrier is provided. A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier. For example, a target valence band discontinuity can be selected such that a dopant energy level of a dopant in the adjacent barrier coincides with a valence energy band edge for the quantum well and/or a ground state energy for free carriers in a valence energy band for the quantum well. The quantum well and the adjacent barrier can be formed such that the actual band discontinuity corresponds to the target band discontinuity.

    摘要翻译: 提供了一种用于设计和/或制造包括量子阱和相邻屏障的结构的解决方案。 选择量子阱和相邻屏障之间的目标频带不连续性以与量子阱和/或屏障的掺杂剂的活化能一致。 例如,可以选择目标价带不连续性,使得相邻势垒中的掺杂剂的掺杂剂能级与量子阱的价态能带边缘和/或价态能带中的自由载流子的基态能量一致 量子阱。 可以形成量子阱和相邻势垒,使得实际波段不连续性对应于目标波段不连续。

    Semiconductor Material Doping
    3.
    发明申请
    Semiconductor Material Doping 有权
    半导体材料掺杂

    公开(公告)号:US20110138341A1

    公开(公告)日:2011-06-09

    申请号:US12960476

    申请日:2010-12-04

    IPC分类号: G06F17/50 H01L21/66

    摘要: A solution for designing and/or fabricating a structure including a quantum well and an adjacent barrier is provided. A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier. For example, a target valence band discontinuity can be selected such that a dopant energy level of a dopant in the adjacent barrier coincides with a valence energy band edge for the quantum well and/or a ground state energy for free carriers in a valence energy band for the quantum well. The quantum well and the adjacent barrier can be formed such that the actual band discontinuity corresponds to the target band discontinuity.

    摘要翻译: 提供了一种用于设计和/或制造包括量子阱和相邻屏障的结构的解决方案。 选择量子阱和相邻屏障之间的目标频带不连续性以与量子阱和/或屏障的掺杂剂的活化能一致。 例如,可以选择目标价带不连续性,使得相邻势垒中的掺杂剂的掺杂剂能级与量子阱的价态能带边缘和/或价态能带中的自由载流子的基态能量一致 量子阱。 可以形成量子阱和相邻势垒,使得实际波段不连续性对应于目标波段不连续。

    Light emitting device with dislocation bending structure
    8.
    发明授权
    Light emitting device with dislocation bending structure 有权
    具有位错弯曲结构的发光器件

    公开(公告)号:US08633468B2

    公开(公告)日:2014-01-21

    申请号:US13370470

    申请日:2012-02-10

    IPC分类号: H01L29/06

    摘要: A solution for reducing a number of dislocations in an active region of an emitting device is provided. A dislocation bending structure can be included in the emitting device between the substrate and the active region. The dislocation bending structure can be configured to cause dislocations to bend and/or annihilate prior to reaching the active region, e.g., due to the presence of a sufficient amount of strain. The dislocation bending structure can include a plurality of layers with adjacent layers being composed of a material, but with molar fractions of an element in the respective material differing between the two layers. The dislocation bending structure can include at least forty pairs of adjacent layers having molar fractions of an element differing by at least five percent between the adjacent layers.

    摘要翻译: 提供了用于减少发射装置的有源区域中的多个位错的解决方案。 位错弯曲结构可以包括在衬底和有源区域之间的发射器件中。 位错弯曲结构可以被配置为在到达活性区域之前导致位错弯曲和/或湮灭,例如由于存在足够量的应变。 位错弯曲结构可以包括多个层,其中相邻层由材料组成,但是相应材料中的元素的摩尔分数在两层之间不同。 位错弯曲结构可以包括至少四十对相邻层之间相邻层之间具有至少百分之五的摩尔分数的相邻层。

    Light Emitting Device with Dislocation Bending Structure
    9.
    发明申请
    Light Emitting Device with Dislocation Bending Structure 有权
    具有位错弯曲结构的发光装置

    公开(公告)号:US20120205619A1

    公开(公告)日:2012-08-16

    申请号:US13370470

    申请日:2012-02-10

    IPC分类号: H01L33/04

    摘要: A solution for reducing a number of dislocations in an active region of an emitting device is provided. A dislocation bending structure can be included in the emitting device between the substrate and the active region. The dislocation bending structure can be configured to cause dislocations to bend and/or annihilate prior to reaching the active region, e.g., due to the presence of a sufficient amount of strain. The dislocation bending structure can include a plurality of layers with adjacent layers being composed of a material, but with molar fractions of an element in the respective material differing between the two layers. The dislocation bending structure can include at least forty pairs of adjacent layers having molar fractions of an element differing by at least five percent between the adjacent layers.

    摘要翻译: 提供了用于减少发射装置的有源区域中的多个位错的解决方案。 位错弯曲结构可以包括在衬底和有源区域之间的发射器件中。 位错弯曲结构可以被配置为在到达活性区域之前导致位错弯曲和/或湮灭,例如由于存在足够量的应变。 位错弯曲结构可以包括多个层,其中相邻层由材料组成,但是相应材料中的元素的摩尔分数在两层之间不同。 位错弯曲结构可以包括至少四十对相邻层之间相邻层之间具有至少百分之五的摩尔分数的相邻层。

    Semiconductor Material Doping
    10.
    发明申请
    Semiconductor Material Doping 有权
    半导体材料掺杂

    公开(公告)号:US20110253975A1

    公开(公告)日:2011-10-20

    申请号:US13162908

    申请日:2011-06-17

    IPC分类号: H01L33/04

    摘要: A solution for designing and/or fabricating a structure including a quantum well and an adjacent barrier is provided. A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier. For example, a target valence band discontinuity can be selected such that a dopant energy level of a dopant in the adjacent barrier coincides with a valence energy band edge for the quantum well and/or a ground state energy for free carriers in a valence energy band for the quantum well. Additionally, a target doping level for the quantum well and/or adjacent barrier can be selected to facilitate a real space transfer of holes across the barrier. The quantum well and the adjacent barrier can be formed such that the actual band discontinuity and/or actual doping level(s) correspond to the relevant target(s).

    摘要翻译: 提供了一种用于设计和/或制造包括量子阱和相邻屏障的结构的解决方案。 选择量子阱和相邻屏障之间的目标频带不连续性以与量子阱和/或屏障的掺杂剂的活化能一致。 例如,可以选择目标价带不连续性,使得相邻势垒中的掺杂剂的掺杂剂能级与量子阱的价态能带边缘和/或价态能带中的自由载流子的基态能量一致 量子阱。 另外,可以选择量子阱和/或相邻势垒的目标掺杂水平以促进穿过势垒的空穴的实际空间传递。 可以形成量子阱和相邻势垒,使得实际的带不连续性和/或实际掺杂水平对应于相关目标。