-
公开(公告)号:US20210391257A1
公开(公告)日:2021-12-16
申请号:US16900204
申请日:2020-06-12
Applicant: Micron Technology, Inc.
Inventor: Qui V. Nguyen , Chang H. Siau
IPC: H01L23/528 , H01L27/11524 , H01L27/11556 , H01L27/11529 , H01L27/11519 , H01L27/1157 , H01L27/11582 , H01L27/11573 , H01L27/11565 , H01L23/522 , H01L23/535
Abstract: A microelectronic device comprises blocks, contact structures, filled vias, and a base structure. The blocks each have a vertically alternating sequence of conductive structures and insulative structures arranged in tiers. Each block comprises a forward staircase structure and a reverse staircase structure. The contact structures are on steps of the forward staircase structure of a first of the blocks and on additional steps of the reverse staircase structure of a second of the blocks horizontally neighboring the first of the blocks. The filled vias extend through portions of the first of the blocks within horizontal boundaries of the reverse staircase structure of the first of the blocks and extend through portions of the second of the blocks within horizontal boundaries of the forward staircase structure of the second of the blocks. The base structure underlies the blocks and comprises transistors coupled to the filled vias.
-
公开(公告)号:US20220068325A1
公开(公告)日:2022-03-03
申请号:US17034540
申请日:2020-09-28
Applicant: MICRON TECHNOLOGY, INC.
Inventor: Chang H. Siau , Michele Piccardi , Qui V. Nguyen
Abstract: Memory having an array of memory cells and a plurality of access lines each connected to a respective plurality of memory cells of the array of memory cells might include a controller configured to cause the memory to apply a respective programming pulse having a first target voltage level and a first pulse width to each access line of a first subset of access lines of the plurality of access lines, and apply a respective programming pulse having the first target voltage level and a second pulse width longer than the first pulse width to each access line of a second subset of access lines of the plurality of access lines, wherein each access line of the first subset of access lines is nearer a particular end of the string of series-connected memory cells than each access line of the second subset of access lines.
-
公开(公告)号:US12080644B2
公开(公告)日:2024-09-03
申请号:US17929638
申请日:2022-09-02
Applicant: Micron Technology, Inc.
Inventor: Qui V. Nguyen , Chang H. Siau
IPC: H01L23/528 , H01L23/522 , H01L23/535 , H10B41/10 , H10B41/27 , H10B41/35 , H10B41/41 , H10B43/10 , H10B43/27 , H10B43/35 , H10B43/40
CPC classification number: H01L23/5283 , H01L23/5226 , H01L23/535 , H10B41/10 , H10B41/27 , H10B41/35 , H10B41/41 , H10B43/10 , H10B43/27 , H10B43/35 , H10B43/40
Abstract: A microelectronic device comprises blocks, contact structures, filled vias, and a base structure. The blocks each have a vertically alternating sequence of conductive structures and insulative structures arranged in tiers. Each block comprises a forward staircase structure and a reverse staircase structure. The contact structures are on steps of the forward staircase structure of a first of the blocks and on additional steps of the reverse staircase structure of a second of the blocks horizontally neighboring the first of the blocks. The filled vias extend through portions of the first of the blocks within horizontal boundaries of the reverse staircase structure of the first of the blocks and extend through portions of the second of the blocks within horizontal boundaries of the forward staircase structure of the second of the blocks. The base structure underlies the blocks and comprises transistors coupled to the filled vias.
-
公开(公告)号:US11437318B2
公开(公告)日:2022-09-06
申请号:US16900204
申请日:2020-06-12
Applicant: Micron Technology, Inc.
Inventor: Qui V. Nguyen , Chang H. Siau
IPC: H01L23/528 , H01L23/522 , H01L23/535 , H01L27/11519 , H01L27/11524 , H01L27/11529 , H01L27/11556 , H01L27/11565 , H01L27/1157 , H01L27/11573 , H01L27/11582
Abstract: A microelectronic device comprises blocks, contact structures, filled vias, and a base structure. The blocks each have a vertically alternating sequence of conductive structures and insulative structures arranged in tiers. Each block comprises a forward staircase structure and a reverse staircase structure. The contact structures are on steps of the forward staircase structure of a first of the blocks and on additional steps of the reverse staircase structure of a second of the blocks horizontally neighboring the first of the blocks. The filled vias extend through portions of the first of the blocks within horizontal boundaries of the reverse staircase structure of the first of the blocks and extend through portions of the second of the blocks within horizontal boundaries of the forward staircase structure of the second of the blocks. The base structure underlies the blocks and comprises transistors coupled to the filled vias.
-
公开(公告)号:US11670346B2
公开(公告)日:2023-06-06
申请号:US17034540
申请日:2020-09-28
Applicant: MICRON TECHNOLOGY, INC.
Inventor: Chang H. Siau , Michele Piccardi , Qui V. Nguyen
CPC classification number: G11C7/1018 , G11C7/1096 , G11C7/222 , G11C16/10 , G11C16/26 , G11C16/3454
Abstract: Memory having an array of memory cells and a plurality of access lines each connected to a respective plurality of memory cells of the array of memory cells might include a controller configured to cause the memory to apply a respective programming pulse having a first target voltage level and a first pulse width to each access line of a first subset of access lines of the plurality of access lines, and apply a respective programming pulse having the first target voltage level and a second pulse width longer than the first pulse width to each access line of a second subset of access lines of the plurality of access lines, wherein each access line of the first subset of access lines is nearer a particular end of the string of series-connected memory cells than each access line of the second subset of access lines.
-
公开(公告)号:US20220415794A1
公开(公告)日:2022-12-29
申请号:US17929638
申请日:2022-09-02
Applicant: Micron Technology, Inc.
Inventor: Qui V. Nguyen , Chang H. Siau
IPC: H01L23/528 , H01L27/11529 , H01L27/11556 , H01L27/11565 , H01L27/1157 , H01L27/11573 , H01L23/522 , H01L27/11524 , H01L27/11519 , H01L27/11582 , H01L23/535
Abstract: A microelectronic device comprises blocks, contact structures, filled vias, and a base structure. The blocks each have a vertically alternating sequence of conductive structures and insulative structures arranged in tiers. Each block comprises a forward staircase structure and a reverse staircase structure. The contact structures are on steps of the forward staircase structure of a first of the blocks and on additional steps of the reverse staircase structure of a second of the blocks horizontally neighboring the first of the blocks. The filled vias extend through portions of the first of the blocks within horizontal boundaries of the reverse staircase structure of the first of the blocks and extend through portions of the second of the blocks within horizontal boundaries of the forward staircase structure of the second of the blocks. The base structure underlies the blocks and comprises transistors coupled to the filled vias.
-
-
-
-
-