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    Method improving integrated circuit planarization during etchback
    1.
    发明授权
    Method improving integrated circuit planarization during etchback 失效
    在回蚀期间改进集成电路平面化的方法

    公开(公告)号：US5399533A

    公开(公告)日：1995-03-21

    申请号：US161642

    申请日：1993-12-01

    Applicant: Dipankar Pramanik ,  Vivek Jain ,  Milind Weling

    Inventor： Dipankar Pramanik ,  Vivek Jain ,  Milind Weling

    IPC: H01L21/768 ,  H01R ,  H01R4/64

    CPC classification number: H01L21/76819

    Abstract: An integrated circuit fabrication method begins with semiconductor devices formed on a substrate. A patterned metal layer is deposited on the substrate to connect the semiconductor devices. A nitride layer is deposited over the metal layer and substrate. The nitride layer topography comprises hills located over metal regions and valleys located over non-metal regions. Spin-on-glass (SOG) is deposited over the nitride layer, thereby filling the valleys and covering the hills. The SOG layer and the nitride layer hills are etched back at substantially the same etch rate, using plasma etching, to form a planar surface. An oxide layer is then deposited over the planar surface to encapsulate the semiconductor devices, metal layer, nitride layer and SOG layer. Vias may then be etched through the oxide layer and the nitride layer to expose portions of the underlying metal layer and facilitate upper layer metal connections thereto. A second metal layer is deposited on the oxide layer and the fabrication process continues until the integrated circuit is complete.

    Abstract translation: 集成电路制造方法从形成在衬底上的半导体器件开始。 图案化的金属层沉积在衬底上以连接半导体器件。 氮化物层沉积在金属层和衬底上。 氮化物层形貌包括位于非金属区域上的金属区域和山谷之上的山丘。 旋转玻璃（SOG）沉积在氮化物层上，从而填充谷并覆盖山丘。 使用等离子体蚀刻以基本相同的蚀刻速率回蚀SOG层和氮化物层丘，以形成平坦表面。 然后在平面表面上沉积氧化物层以封装半导体器件，金属层，氮化物层和SOG层。 然后可以将通孔蚀刻通过氧化物层和氮化物层以暴露下面的金属层的部分，并促进与其的上层金属连接。 第二金属层沉积在氧化物层上，制造过程继续进行，直到集成电路完成。

    Method for leak detection in etching chambers
    2.
    发明授权
    Method for leak detection in etching chambers 失效
    腐蚀室泄漏检测方法

    公开(公告)号：US5522957A

    公开(公告)日：1996-06-04

    申请号：US171491

    申请日：1993-12-22

    Applicant: Milind Weling ,  Calvin T. Gabriel ,  Vivek Jain ,  Dipankar Pramanik

    Inventor： Milind Weling ,  Calvin T. Gabriel ,  Vivek Jain ,  Dipankar Pramanik

    IPC: H01J37/32 ,  H01L21/306

    CPC classification number: H01J37/3244 ,  H01J37/32935 ,  Y10S148/162

    Abstract: A method and apparatus for detecting the presence of gaseous impurities, notably oxygen, in a gas mixture that flows over an IC wafer in an etcher during the etching process. The method is based upon the discovery that the ratio of the etch rate of spin-on-glass material to the etch rate of other materials, such as plasma-enhanced chemical vapor deposition (PECVD oxide) materials, varies in a predictable manner with the amount of oxygen contaminating the gas mixture. The standard ratio, in the absence of oxygen, is determined for a given set of processing conditions by first etching an SOG wafer, then etching a PECVD oxide material wafer, measuring the amount of material etched in each case, and from that calculating the respective etch rates, and finally taking the ratio of the two calculated etch rates. This standard ratio is used as the benchmark for future tests. When a production run is to be conducted on a new material, the above procedure is repeated when the equipment is otherwise ready for the run, and the new calculated etch rate ratio is compared with the standard ratio. If they are substantially equal, this indicates a lack of oxygen contamination. If the ratio has changed, and other processing conditions have been taken into account (such as RF power and temperature), this indicates the presence of impurities in the gas mixture, and hence probably a leak in the system, or contamination of the gas source itself. In IC manufacturing, the production run is then typically stopped to correct the problem. Calibration data can be generated in advance to determine by how much to adjust the etching time, given a particular measured ratio that is not the same as the standard ratio. The system may be automatically controlled by a computer that calculates the corrected etching time based upon the measured ratio of the respective etch rates of SOG and the PECVD oxide material.

    Abstract translation: 一种用于在蚀刻过程期间在蚀刻器中流过IC晶片的气体混合物中检测气态杂质（特别是氧）的存在的方法和装置。 该方法基于以下发现：旋涂玻璃材料的蚀刻速率与其它材料（诸如等离子体增强化学气相沉积（PECVD氧化物）材料）的蚀刻速率的比率以可预测的方式以 氧气混合物的污染量。 在不存在氧的情况下，通过首先蚀刻SOG晶片，然后蚀刻PECVD氧化物材料晶片，测量在每种情况下蚀刻的材料的量，并从计算相应的 蚀刻速率，最后得到两个计算的蚀刻速率的比值。 该标准比例被用作未来测试的基准。 当对新材料进行生产运行时，当设备准备运行时，重复上述步骤，并将新计算的蚀刻速率比与标准比率进行比较。 如果它们基本相同，则这表明缺乏氧气污染。 如果比例发生变化，并考虑了其他加工条件（如RF功率和温度），则表明气体混合物中存在杂质，因此可能是系统泄漏或气体源的污染 本身。 在IC制造中，通常停止生产运行以纠正问题。 可以预先产生校准数据，以确定调整蚀刻时间的程度，给定与标准比率不同的特定测量比。 该系统可以由计算机自动控制，该计算机基于SOG和PECVD氧化物材料的相应蚀刻速率的测量比来计算校正的蚀刻时间。

    Planarization
    3.
    发明授权
    Planarization 失效
    平面化

    公开(公告)号：US5378318A

    公开(公告)日：1995-01-03

    申请号：US893616

    申请日：1992-06-05

    Applicant: Milind Weling ,  Vivek Jain

    Inventor： Milind Weling ,  Vivek Jain

    IPC: H01L21/311 ,  H01L21/768 ,  H01L21/00

    CPC classification number: H01L21/31116 ,  H01L21/76819

    Abstract: A method for improved planarization of surface topographies encountered in semiconductor processing that involve the etch-back of exposed surfaces of an oxide of silicon and a spin-on-glass. The oxide of silicon is chosen to be oxygen-deficient and thus silicon-rich, with a spectroscopically-defined silicon richness coefficient CSR that is greater than 0, and preferably greater than 0.005. A fluorine-containing process gas such as CHF.sub.3 combined with one or more of CF.sub.4, C.sub.2 F.sub.6 and SF.sub.6 can be used in the etch chemistry. Sensitivity of the etch rate to certain parameters, such as the relative surface area of the exposed oxide of silicon and the fraction of fluorine present, is either reduced or eliminated. Improvement and better control of planarization is achieved by the process, resulting in a widening of the etch-back process window.

    Abstract translation: 一种用于改善在半导体处理中遇到的表面形貌的平面化的方法，其涉及硅的氧化物和旋涂玻璃的暴露表面的回蚀。 硅的氧化物选择为缺氧的，因此富含硅，其光谱定义的硅富集系数CSR大于0，优选大于0.005。 在蚀刻化学中可以使用与CF4，C2F6和SF6中的一种或多种组合的含氟工艺气体，例如CHF 3。 蚀刻速率对某些参数（例如暴露的硅的氧化物的相对表面积和存在的氟的分数）的敏感度被降低或消除。 通过该过程实现了平坦化的改进和更好的控制，导致了回蚀加工窗口的扩大。

    Method for robust wireless wind turbine condition monitoring
    5.
    发明授权
    Method for robust wireless wind turbine condition monitoring 有权
    强大的无线风力发电机状态监测方法

    公开(公告)号：US09249781B2

    公开(公告)日：2016-02-02

    申请号：US13341291

    申请日：2011-12-30

    Applicant: Christoph Lang ,  Peter Volkmer ,  Murat Senel ,  Vivek Jain ,  Lakshmi Venkatraman ,  Huang Lee

    Inventor： Christoph Lang ,  Peter Volkmer ,  Murat Senel ,  Vivek Jain ,  Lakshmi Venkatraman ,  Huang Lee

    IPC: F03D7/04

    CPC classification number: F03D7/047 ,  F03D7/048 ,  F05B2270/111 ,  F05B2270/326 ,  Y02E10/723

    Abstract: A wind turbine condition monitoring system and method are disclosed where the wind turbines include a tower, a gearbox coupled to the tower, and turbine blades coupled to the gearbox. The monitoring system includes blade sensors coupled to the blades, a hub node coupled to the gearbox and a controller. The controller is in communication with the hub node and blade sensors, and determines blade positions based on blade sensor readings. The blade sensors and hub node can include multi-axis accelerometers. The controller can wirelessly communicate with the blade sensors directly or through the hub node. Using position information, shadowing areas with obstructed communication can be avoided, node separation can be accounted for to reduce power requirements and/or interference from multiple transmitters can be avoided during node communications.

    Abstract translation: 公开了一种风力涡轮机状况监测系统和方法，其中风力涡轮机包括塔架，联接到塔架的齿轮箱和联接到齿轮箱的涡轮机叶片。 监测系统包括耦合到叶片的叶片传感器，耦合到齿轮箱的轮毂节点和控制器。 控制器与集线器节点和刀片传感器通信，并根据刀片传感器读数确定刀片位置。 叶片传感器和轮毂节点可以包括多轴加速度计。 控制器可以直接或通过集线器节点与刀片传感器无线通信。 使用位置信息，可以避免阻碍通信的阴影区域，可以考虑节点分离以减少功率需求，并且可以在节点通信期间避免多个发射机的干扰。

    DYNAMIC FUNCTION SLOT ASSIGNMENT IN INTRA-VEHICULAR WIRELESS NETWORKS
    7.
    发明申请
    DYNAMIC FUNCTION SLOT ASSIGNMENT IN INTRA-VEHICULAR WIRELESS NETWORKS 有权
    内部无线网络中的动态功能槽分配

    公开(公告)号：US20100296478A1

    公开(公告)日：2010-11-25

    申请号：US12469154

    申请日：2009-05-20

    Applicant: Thomas Hogenmueller ,  Vivek Jain

    Inventor： Thomas Hogenmueller ,  Vivek Jain

    IPC: H04W72/04

    CPC classification number: H04W74/04 ,  H04W72/0446 ,  H04W84/18

    Abstract: A wireless transmission method includes providing a commanding node and a plurality of sub-networks. Each of the sub-networks includes at least one responding node. Corresponding ones of a plurality of time slots are assigned to individual ones of the sub-networks based on at least one operational characteristic of the sub-networks. The time slots are disposed within a plurality of frequency channels. Communication is conducted between the commanding node and the sub-networks within the assigned time slots of the sub-networks.

    Abstract translation: 无线传输方法包括提供命令节点和多个子网络。 每个子网络包括至少一个响应节点。 基于子网络的至少一个操作特性，将多个时隙中的相应的时隙分配给各个子网络。 时隙设置在多个频道内。 在子网络的分配时隙内的命令节点和子网之间进行通信。

    SECURITY SYSTEM AND METHOD FOR WIRELESS COMMUNICATION WITHIN A VEHICLE
    8.
    发明申请
    SECURITY SYSTEM AND METHOD FOR WIRELESS COMMUNICATION WITHIN A VEHICLE 有权
    一种车辆无线通信的安全系统和方法

    公开(公告)号：US20100296387A1

    公开(公告)日：2010-11-25

    申请号：US12469068

    申请日：2009-05-20

    Applicant: Vivek Jain ,  Thomas Hogenmueller

    Inventor： Vivek Jain ,  Thomas Hogenmueller

    IPC: H04L12/24 ,  H04J1/00 ,  G06F19/00

    CPC classification number: H04L63/08 ,  G06F21/606 ,  G06F2221/2147 ,  H04L61/6027 ,  H04L67/12 ,  H04W12/06 ,  H04W12/12 ,  H04W72/0453 ,  H04W84/18

    Abstract: A method for providing wireless communications between nodes of a vehicle includes providing a plurality of frequency channels on which the nodes of a first vehicle may wirelessly communicate. Wireless communication with a second vehicle adjacent to the first vehicle includes assigning a first of the frequency channels to the first vehicle for intra-vehicle transmissions within the first vehicle, and a second of the frequency channels to the second vehicle for intra-vehicle transmissions within the second vehicle. The first vehicle is prohibited from using the second frequency channel and the second vehicle is prohibited from using the first frequency channel.

    Abstract translation: 一种用于在车辆的节点之间提供无线通信的方法包括提供多个频道，第一车辆的节点可以在其上进行无线通信。 与第一车辆相邻的第二车辆的无线通信包括：向第一车辆分配第一频率信道以用于第一车辆内的车内传输，以及将第二车辆频率的第二频率信道分配给第二车辆以进行车内传输， 第二辆车。 禁止第一车辆使用第二频道，禁止第二车辆使用第一频道。

    METHOD OF USING ACKNOWLEDGMENT TONES FOR DATA CONSISTENCY IN INTRA-VEHICULAR WIRELESS NETWORKS
    9.
    发明申请
    METHOD OF USING ACKNOWLEDGMENT TONES FOR DATA CONSISTENCY IN INTRA-VEHICULAR WIRELESS NETWORKS 审中-公开
    在无线网络中使用确认数据一致性的方法

    公开(公告)号：US20100091756A1

    公开(公告)日：2010-04-15

    申请号：US12248311

    申请日：2008-10-09

    Applicant: Thomas Alfons Hogenmueller ,  Vivek Jain ,  Lakshmi Venkatraman ,  Abtin Keshavarzian ,  Krishna Chintalapudi ,  Serbulent Tozlu ,  Yuan Tian

    Inventor： Thomas Alfons Hogenmueller ,  Vivek Jain ,  Lakshmi Venkatraman ,  Abtin Keshavarzian ,  Krishna Chintalapudi ,  Serbulent Tozlu ,  Yuan Tian

    IPC: H04J3/00 ,  H04B7/00

    CPC classification number: H04L1/1692 ,  H04L2001/0097

    Abstract: A method for providing electronic communications between wireless nodes includes wirelessly transmitting data from a transmitting one of the nodes to a plurality of receiving ones of the nodes. A respective first acknowledgment tone is wirelessly transmitted from each of the receiving nodes to the transmitting node and to each other one of the receiving nodes. Each first acknowledgment tone is transmitted in response to the respective receiving node receiving the transmitted data. Each of the first acknowledgment tones is transmitted in a respective, unique time slot. At least one second acknowledgment tone is wirelessly transmitted from at least one of the nodes to each other one of the nodes. The second acknowledgment tone is transmitted dependent upon whether a group of received first acknowledgment tones matches a group of expected-to-be-received first acknowledgment tones.

    Abstract translation: 一种用于在无线节点之间提供电子通信的方法包括从节点中的发送节点之一向节点的多个接收节点无线地发送数据。 相应的第一确认音从每个接收节点无线发送到发送节点，并且彼此相互接收节点之一。 响应于相应的接收节点接收所发送的数据，发送每个第一确认音。 每个第一确认音在相应的唯一时隙中发送。 至少一个第二确认音从节点中的至少一个无线发送到彼此中的一个节点。 第二确认音是根据一组接收到的第一确认音与一组预期接收的第一确认音匹配而发送的。

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