公开(公告)号：US20180076047A1

公开(公告)日：2018-03-15

申请号：US15562072

申请日：2016-03-24

申请人： MITSUI CHEMICALS, INC.

发明人： Hirofumi TANAKA ,  Yasuhisa KAYABA ,  Hiroko WACHI ,  Koji INOUE ,  Shoko ONO

IPC分类号： H01L21/3105 ,  C08G73/02 ,  C09D179/02 ,  H01L21/02 ,  H01L21/311

CPC分类号： H01L21/31051 ,  C08G73/0206 ,  C09D179/02 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02343 ,  H01L21/02362 ,  H01L21/31058 ,  H01L21/31133 ,  H01L21/31138 ,  H01L21/76

摘要： A method for manufacturing a filling planarization film, the method including: a first coating step of applying a first coating liquid, containing a polyamine and a first solvent, to a region including a recessed part of a member having the recessed part, to fill the first coating liquid into the recessed part; and a second coating step of applying a second coating liquid, containing an organic substance having two or more carboxyl groups and a second solvent having a boiling point of 200° C. or less and an SP value of 30 (MPa)1/2 or less, to the region including the recessed part of the member into which the first coating liquid has been filled.

公开(公告)号：US20170162382A1

公开(公告)日：2017-06-08

申请号：US15325511

申请日：2015-08-05

申请人： MITSUI CHEMICALS, INC.

发明人： Yasuhisa KAYABA ,  Hirofumi TANAKA ,  Shoko ONO ,  Koji INOUE ,  Hiroko WACHI ,  Tsuneji SUZUKI

IPC分类号： H01L21/02 ,  C08L79/00 ,  C09D157/06

摘要： The invention provides a sealing composition including: polymer (A) containing a cationic functional group and having a weight average molecular weight of from 2,000 to 1,000,000; and a benzotriazole compound; in which the content of the polymer (A) is from 0.05 parts by mass to 0.20 parts by mass with respect to 100 parts by mass of the sealing composition; in which the content of the benzotriazole compound in the sealing composition is from 3 ppm by mass to 200 ppm by mass; and in which the sealing composition has a pH of from 3.0 to 6.5.

公开(公告)号：US20160049343A1

公开(公告)日：2016-02-18

申请号：US14779757

申请日：2014-03-11

申请人： MITSUI CHEMICALS INC.

发明人： Yasuhisa KAYABA ,  Shoko ONO ,  Hirofumi TANAKA ,  Tsuneji SUZUKI ,  Shigeru MIO ,  Kazuo KOHMURA

IPC分类号： H01L23/29 ,  C09J179/04 ,  H01L23/528 ,  H01L23/532 ,  H01L21/02 ,  H01L21/56

CPC分类号： H01L23/293 ,  C08G73/0206 ,  C08K5/0091 ,  C08L79/02 ,  C09J179/04 ,  H01L21/0206 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/56 ,  H01L23/528 ,  H01L23/53209 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： Provided is a method for manufacturing a composite body, the method containing: a composition preparation process of preparing a composition that contains a polymer having a cationic functional group and having a weight average molecular weight of from 2,000 to 1,000,000, and that has a pH of from 2.0 to 11.0; a composite member preparation process of preparing a composite member that includes a member A and a member B, a surface of the member B having a defined isoelectric point, and that satisfies a relationship: the isoelectric point of a surface of the member B

摘要翻译： 本发明提供一种复合体的制造方法，该方法包括：制备含有阳离子官能团的聚合物，重均分子量为2,000〜1,000,000的组合物的组合物制备方法，其具有 从2.0到11.0; 制备复合构件的复合构件制备方法，其包括构件A和构件B，构件B的具有确定的等电点的表面，并且满足以下关系：构件B的表面的等电点 组分的pH <构件A的表面的等电点; 以及将组合物施加到构件A的表面和包含在复合构件中的构件B的表面的施加过程。

公开(公告)号：US20210191269A1

公开(公告)日：2021-06-24

申请号：US16757830

申请日：2018-11-13

申请人： MITSUI CHEMICALS, INC.

发明人： Hiroko WACHI ,  Yasuhisa KAYABA ,  Hirofumi TANAKA ,  Kenichi FUJII

IPC分类号： G03F7/11 ,  H01L21/311 ,  G03F7/075

摘要： Provided are a semiconductor element intermediate including: a substrate and a multilayer resist layer, in which the multilayer resist layer includes a metal-containing film, and in which the metal-containing film has a content of germanium element of 20 atm % or more, or a total content of tin element, indium element, and gallium element of 1 atm % or more, as measured by X-ray photoelectric spectroscopy, and an application of the semiconductor intermediate.

公开(公告)号：US20180334588A1

公开(公告)日：2018-11-22

申请号：US15776031

申请日：2016-11-16

申请人： MITSUI CHEMICALS, INC.

发明人： Yasuhisa KAYABA ,  Hirofumi TANAKA ,  Koji INOUE

IPC分类号： C09D177/06 ,  C08G69/42 ,  H01L21/02 ,  H01L23/29

摘要： Provided is a composition for forming a film for semiconductor devices, including: a compound (A) including a Si—O bond and a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom; a crosslinking agent (B) which includes three or more —C(═O)OX groups (X is a hydrogen atom or an alkyl group having from 1 to 6 carbon atoms) in the molecule, in which from one to six of three or more —C(═O)OX groups are —C(═O)OH groups, and which has a weight average molecular weight of from 200 to 600; and a polar solvent (D).

公开(公告)号：US20220171280A1

公开(公告)日：2022-06-02

申请号：US17442028

申请日：2020-03-27

申请人： MITSUI CHEMICALS, INC.

发明人： Yasushi SATOH ,  Takashi UNEZAKI ,  Hirofumi TANAKA ,  Ken ITO

IPC分类号： G03F1/64 ,  C09J133/08 ,  C09J11/06

摘要： Task of the present invention is to provide a tackifier solution having high solution stability and also provide, by using such a tackifier solution, a pellicle having only few tackifier residues and exhibiting reduced outgas generation. Present invention is a pellicle comprising a pellicle frame, a pellicle membrane stretched over an end surface of one opening of the pellicle frame, and a tackifier layer provided on an end surface of the other opening of the pellicle frame, wherein the tackifier layer contains a (meth)acrylic tackifier which is a solidified resin composition comprising a polymer (A) and a radical polymerization initiator (B), the polymer (A) having a structural unit derived from a (meth)acrylate and a side chain consisting of a carbon-carbon multiple bond-containing group.

公开(公告)号：US20210375710A1

公开(公告)日：2021-12-02

申请号：US17284488

申请日：2019-11-19

申请人： Mitsui Chemicals, Inc.

发明人： Hiroko WACHI ,  Hirofumi TANAKA ,  Yasuhisa KAYABA ,  Kenichi FUJII

IPC分类号： H01L23/31 ,  H01L23/29 ,  H01L21/02

摘要： A method of producing a semiconductor element intermediate includes: a preparing step of preparing a substrate having a recessed part on a surface thereof; and a filling step of filling tin oxide into the recessed part by an atomic layer deposition method at a substrate temperature of 250° C. or higher, using a tin oxide precursor including a compound represented by the following Formula (1). In Formula (1), each of R1 to R4 independently represents an alkyl group having from 1 to 6 carbon atoms.

公开(公告)号：US20200347265A1

公开(公告)日：2020-11-05

申请号：US16929638

申请日：2020-07-15

申请人： MITSUI CHEMICALS, INC.

发明人： Yasuhisa KAYABA ,  Hirofumi TANAKA ,  Koji INOUE

IPC分类号： C09D177/06 ,  C08G73/02 ,  C08G73/10 ,  H01L21/02 ,  H01L21/3105 ,  C08G69/42 ,  H01L23/29

摘要： Provided is a composition for forming a film for semiconductor devices, including: a compound (A) including a Si—O bond and a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom; a crosslinking agent (B) which includes three or more —C(═O)OX groups (X is a hydrogen atom or an alkyl group having from 1 to 6 carbon atoms) in the molecule, in which from one to six of three or more —C(═O)OX groups are —C(═O)OH groups, and which has a weight average molecular weight of from 200 to 600; and a polar solvent (D).

公开(公告)号：US20190187560A1

公开(公告)日：2019-06-20

申请号：US16301885

申请日：2017-05-19

申请人： MITSUI CHEMICALS, INC.

发明人： Yasuhisa KAYABA ,  Shoko ONO ,  Hirofumi TANAKA

IPC分类号： G03F7/11 ,  H01L21/027 ,  G03F7/09 ,  C09D7/40 ,  G03F7/075 ,  G03F7/16

CPC分类号： G03F7/11 ,  C09D7/40 ,  C09D201/00 ,  G03F7/0755 ,  G03F7/0757 ,  G03F7/094 ,  G03F7/16 ,  G03F7/26 ,  H01L21/027 ,  H01L21/3065

摘要： A composition for forming a metal-containing film, the composition including: a compound (A) which is at least one selected from the group consisting of: a compound (a1) containing a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom, and a compound (a2) which is a compound other than the compound (a1) and which contains a nitrogen atom; and a compound (B) which is at least one selected from the group consisting of: a compound (b1) containing a carboxy group and at least one of a germanium atom, a tin atom, a selenium atom or a zirconium atom, and an ester of the compound (b1).

公开(公告)号：US20180327547A1

公开(公告)日：2018-11-15

申请号：US15776013

申请日：2016-11-16

申请人： MITSUI CHEMICALS, INC.

发明人： Yasuhisa KAYABA ,  Hirofumi TANAKA ,  Hiroko WACHI ,  Shoko ONO

IPC分类号： C08G73/02 ,  C08G73/10 ,  C08K5/092 ,  H01L21/02 ,  H01L21/3105

摘要： A composition for forming a film for semiconductor devices including: a compound (A) including a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom and having a weight average molecular weight of from 10,000 to 400,000; a crosslinking agent (B) which includes the three or more —C(═O)OX groups (X is a hydrogen atom or an alkyl group having from 1 to 6 carbon atoms) in the molecule, in which from one to six of three or more —C(═O)OX groups are —C(═O)OH groups, and which has a weight average molecular weight of from 200 to 600; and water (D), in which the compound (A) is an aliphatic amine.