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公开(公告)号：US6133982A
公开(公告)日：2000-10-17
申请号：US968726
申请日：1997-11-12
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70691 , G03F7/70358 , G03F7/70833 , G03F7/709
摘要： An exposure apparatus having an optical stand for supporting a projecting optical system and a reticle stage, and a base frame have a plurality of struts for supporting the optical stand via dampers. The plurality of struts of the base frame are joined at their upper ends to increase the rigidity of the base frame, thereby reducing vibration caused by acceleration and deceleration of the reticle stage.
摘要翻译： 具有用于支撑投影光学系统和标线片台的光学支架的曝光装置和具有用于通过阻尼器支撑光学支架的多个支柱的基座框架。 底架的多个支柱在其上端连接以增加基架的刚性，从而减少由于标线片台的加速和减速引起的振动。
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公开(公告)号：US5933215A
公开(公告)日：1999-08-03
申请号：US867355
申请日：1997-06-02
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70833 , G03F7/709
摘要： A scanning exposure apparatus wherein a portion of a pattern of an original is projected onto a substrate through a projection optical system and the original and substrate are scanningly moved relative to the projection optical system, whereby the pattern of the original is transferred onto the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting device for supporting the base at three positions, through a damper device and a pillar device. The three positions define an approximately isosceles triangle, and the scan direction is parallel to a straight line that connects a point of intersection of isosceles sides of the triangle and a gravity center thereof.
摘要翻译： 一种扫描曝光装置，其中通过投影光学系统将原稿的图案的一部分投影到基板上，并且原稿和基板相对于投影光学系统扫描地移动，由此将原稿的图案转印到基板上。 该装置包括用于保持原稿的原稿台，用于支撑原稿台的基座和用于通过阻尼器装置和支柱装置在三个位置支撑基座的支撑装置。 三个位置限定大致等腰三角形，并且扫描方向平行于连接三角形的等腰面的交点与其重心的直线。
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公开(公告)号：US5687947A
公开(公告)日：1997-11-18
申请号：US422932
申请日：1995-04-17
申请人： Kazunori Iwamoto , Shunichi Uzawa , Takao Kariya , Ryuichi Ebinuma , Hiroshi Chiba , Shinkichi Ohkawa
发明人： Kazunori Iwamoto , Shunichi Uzawa , Takao Kariya , Ryuichi Ebinuma , Hiroshi Chiba , Shinkichi Ohkawa
CPC分类号： G03F7/707 , G03F7/70841 , G03F7/70858 , G03F7/70866 , G03F7/70883 , G12B5/00
摘要： A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container is disclosed. The method is particularly applicable to an SOR X-ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument is hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given latitude only in the x direction. By this arrangement, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.
摘要翻译： 公开了一种在真空容器中支撑或安装用于支撑掩模和晶片的精密仪器的方法。 该方法特别适用于SOR X射线曝光装置，其中掩模和晶片被设置在期望的减压水平，并且包含在同步加速器辐射中的诸如X射线的曝光能量通过掩模投射到晶片上 以将掩模的图案打印到晶片上。 在x方向垂直的x-y-z坐标系中，将精密仪器挂在至少两个x方向间隔的点上，与真空容器的内壁相连。 在其中一个支撑点上，精密仪器具有x，y和z方向运动的纬度，而在另一个支撑点，精密仪器是固定的，或仅在x方向上被赋予纬度。 通过这种布置，当真空容器因内部和外部压力之间的差异而变形时，可以正确地支撑精密仪器。
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公开(公告)号：US5168512A
公开(公告)日：1992-12-01
申请号：US668238
申请日：1991-03-12
IPC分类号： G03F7/20 , G21K1/02 , H01L21/027
CPC分类号： G03F7/702 , G03F7/2039 , G03F7/70691 , G03F7/70808 , G21K1/025 , H01L21/0278
摘要： A method for the manufacture of semiconductor devices wherein a radiation beam including first and second beams is projected from a synchrotron orbit radiation source into an ambience maintained substantially at a vacuum, includes the steps of directing the radiation beam to a wafer through a window effective to isolate the ambience to thereby print a circuit pattern on an X-ray sensitive layer on the wafer with the first beam, providing a support for supporting the window having an opening, extracting the second beam through the opening, and detecting and correcting any deviation of the first beam with respect to the wafer.
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公开(公告)号：US5128975A
公开(公告)日：1992-07-07
申请号：US641332
申请日：1991-01-15
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30
摘要： An X-ray exposure system for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask and the wafer are held on a main frame so that their surfaces extend substantially parallel to a vertical axis. The main frame suspends from a supporting frame through a plurality of air mounts, each being vertically displaceable. The supporting frame is placed on the same reference surface as that of an SOR ring that produces synchrotron radiation. By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation, as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.
摘要翻译： 公开了一种用于将半导体晶片暴露于具有同步加速器辐射中所含的X射线的掩模的X射线曝光系统。 在该系统中，掩模和晶片被保持在主框架上，使得其表面基本上平行于垂直轴线延伸。 主框架通过多个空气支架从支撑框架悬挂，每个空气支架可垂直移动。 支撑框架放置在与产生同步加速器辐射的SOR环相同的参考表面上。 通过使用这些空气支架，可以控制掩模和晶片相对于照射区域相对于同步加速器辐射的照射区域的任何倾斜以及掩模和晶片在垂直方向上的位置。 并保持不变。 因此，确保了精确的图案印刷。
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6.发明授权
公开(公告)号：US5822389A
公开(公告)日：1998-10-13
申请号：US464038
申请日：1995-06-05
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
摘要翻译： 同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源，以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元，用于将辐射束引导到曝光单元的光束端口 具有用于反射辐射束的反射镜的单元，用于使晶片相对于晶片台对准的预对准系统，用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统， 用于存储掩模的掩模存储装置，用于存储晶片的晶片存储装置，用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置 晶圆台。
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公开(公告)号：US5796469A
公开(公告)日：1998-08-18
申请号：US891803
申请日：1997-07-14
申请人： Ryuichi Ebinuma
发明人： Ryuichi Ebinuma
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70833 , G03F7/70866 , G03F9/70
摘要： An exposure apparatus in which a portion of a pattern of a reticle is projected onto a wafer and in which the reticle and the wafer are scanned synchronously such that the pattern of the reticle is transferred to the wafer. The apparatus includes a reticle stage and a wafer stage for scanningly moving the reticle and the wafer, respectively, a measuring system for measuring a deviation of the reticle stage relative to the wafer stage in a predetermined direction other than the direction of scanning movement, and an adjusting device for adjusting the wafer stage on the basis of the measurement by the measuring system. In one aspect, the measuring system includes a laser interferometer. In another aspect, a frame member is provided for supporting the stages, and a flow passageway is provided in the frame member for flowing therethrough a temperature adjusting medium. In yet another aspect, the present invention is directed to an exposure method for the manufacture of microdevices.
摘要翻译： 将掩模版图形的一部分投影到晶片上并且将掩模版和晶片同步扫描的曝光装置，使得标线片的图案被转印到晶片上。 该装置包括：分划板台和用于分别扫描光罩和晶片的晶片台;测量系统，用于测量除了扫描方向以外的预定方向相对于晶片台的偏离;以及 调整装置，用于基于测量系统的测量来调整晶片台。 在一个方面，测量系统包括激光干涉仪。 在另一方面，提供了一种用于支撑台架的框架构件，并且在框架构件中设置有用于流过温度调节介质的流动通道。 在另一方面，本发明涉及一种用于制造微型器件的曝光方法。
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公开(公告)号：US5577552A
公开(公告)日：1996-11-26
申请号：US412101
申请日：1995-03-28
申请人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
发明人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
CPC分类号： H05K7/20281 , G03F7/707 , G03F7/70875 , G05D23/1919
摘要： A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
摘要翻译： 可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模，以将掩模的图案印刷在晶片上。 该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统，用于将供应的液体介质分配到多个流动通道中的分配系统，以将液体介质供应到多个控制对象，例如 ，掩模台，晶片台等。 该装置还包括多个温度控制装置，每个温度控制装置设置在对应的一个流动通道中，用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。 因此，能够以简单的结构有效地控制多个控制对象的温度。
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公开(公告)号：US5537186A
公开(公告)日：1996-07-16
申请号：US282328
申请日：1994-07-29
CPC分类号： G03F7/70716 , B23Q1/601 , B23Q1/72 , B23Q17/2495
摘要： A movable stage apparatus suitable for a semiconductor exposure apparatus or the like has a stage, a first driving mechanism for moving the stage in a predetermined direction, and a second driving mechanism for moving the stage by a minute amount in the predetermined direction. One of the mover and stator of the second driving mechanism is substantially fixed to the stage and the other is substantially movable with the movement of the stage by the first driving mechanism.
摘要翻译： 适用于半导体曝光装置等的可移动平台装置具有台，用于沿预定方向移动台的第一驱动机构和用于沿预定方向微动地移动台的第二驱动机构。 第二驱动机构的动子和定子中的一个基本上固定在舞台上，另一个基本上可以随着舞台的移动而被第一驱动机构移动。
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公开(公告)号：US5161176A
公开(公告)日：1992-11-03
申请号：US802705
申请日：1991-12-06
申请人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
发明人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066
摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。
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