公开(公告)号：US20090127476A1

公开(公告)日：2009-05-21

申请号：US12358548

申请日：2009-01-23

Applicant: Moshe FINAROV

Inventor： Moshe FINAROV

IPC: G21K5/00 ,  G01N21/00

CPC classification number: G01N21/211 ,  G01N21/01 ,  G01N2201/023

Abstract: A method and system are presented for use in optical processing of an article by VUV radiation. The method comprises: localizing incident VUV radiation propagation from an optical head assembly towards a processing site on the article outside the optical head assembly and localizing reflected VUV radiation propagation from said processing site towards the optical head assembly by localizing a medium, non-absorbing with respect to VUV radiation, in within the light propagation path in the vicinity of said site outside the optical head assembly. The level of the medium is controlled by measuring the reflected VUV radiation.

Abstract translation: 提出了一种用于通过VUV辐射对物品进行光学处理的方法和系统。 该方法包括：将来自光学头组件的入射VUV辐射传播定位到光学头组件外部的制品上的处理位置，并将来自所述处理部位的反射的VUV辐射传播定位到光学头组件，定位介质，不吸收 相对于在光学头组件外部的所述位置附近的光传播路径内的VUV辐射。 通过测量反射的VUV辐射来控制介质的水平。

公开(公告)号：US20080062406A1

公开(公告)日：2008-03-13

申请号：US11930594

申请日：2007-10-31

Applicant: Moshe FINAROV ,  Boaz BRILL

Inventor： Moshe FINAROV ,  Boaz BRILL

IPC: G01N21/00 ,  G01J3/40 ,  G01N21/55

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

公开(公告)号：US20070258092A1

公开(公告)日：2007-11-08

申请号：US11778495

申请日：2007-07-16

Applicant: Moshe FINAROV

Inventor： Moshe FINAROV

IPC: G01J4/00 ,  G01J1/42

CPC classification number: G01N21/956 ,  G01N21/211 ,  G01N21/8806

Abstract: A system and method are presented for measurement on an article. The system comprises an illuminator for producing light of at least one predetermined wavelength range; an optical system; a displacement arrangement; and a control system. The optical system is configured to define at least a measurement channel, and comprises a light directing assembly for directing an input light beam, propagating along an input light path from the illuminator, onto the article and directing a light beam returned from the illuminated region of the article to at least one light detector. The displacement arrangement is associated with at least the light directing assembly of the optical system, and is configured and operable by the control system to rotate said at least light directing assembly of the optical system with respect to a stage supporting the article about a rotational axis substantially normal to the stage.

Abstract translation: 提出了一种用于物品测量的系统和方法。 该系统包括用于产生至少一个预定波长范围的光的照明器; 光学系统; 排水安排; 和控制系统。 光学系统被配置为至少限定测量通道，并且包括光导组件，用于将输入光束沿着从照明器的输入光路传播到物品上并且引导从照明区域返回的光束 该物品至少有一个光检测器。 所述位移布置与至少所述光学系统的所述光导组件相关联，并且被所述控制系统配置和操作以使所述光学系统的所述至少光导向组件相对于支撑所述制品的旋转轴线 基本上正常于舞台。

公开(公告)号：US20120044506A1

公开(公告)日：2012-02-23

申请号：US13270647

申请日：2011-10-11

Applicant: Yoel COHEN ,  Moshe FINAROV ,  Klara VINOKUR

Inventor： Yoel COHEN ,  Moshe FINAROV ,  Klara VINOKUR

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are provided for controlling processing of a structure. First measured data is provided being indicative of at least one of: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of: a thickness of the processed structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is indicative of the quality of processing.

Abstract translation: 提供了一种用于控制结构的处理的方法和系统。 提供了首先测量的数据，其指示以下至少一个：在结构处理之前的结构的至少一些选定的位置中的结构W的至少一层（L2）的厚度（d2）和表面轮廓 处理前的结构。 在处理之后至少对结构的选定部位进行光学测量，并且生成第二测量数据，指示处理结构（d'）的厚度和处理结构的表面轮廓中的至少一个。 通过使用第一测量数据解释第二测量数据来分析第二测量数据，以确定至少一层处理结构的厚度（d'1或d'2）。 该确定的厚度表示处理的质量。

公开(公告)号：US20120008147A1

公开(公告)日：2012-01-12

申请号：US13235986

申请日：2011-09-19

Applicant: Moshe FINAROV ,  Boaz Brill

Inventor： Moshe FINAROV ,  Boaz Brill

IPC: G01B11/24

CPC classification number: G01B11/24 ,  G01B9/02087 ,  G01J3/45 ,  G01N21/21 ,  H01L22/12 ,  H01L22/20

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure

Abstract translation: 提出了一种用于确定图案化结构中的线轮廓的方法和系统，其目的在于控制该结构的制造过程。 图案化结构包括多个不同的层，结构中的图案由图案化区域和未图案化区域形成。 进行至少第一次和第二次测量，每次利用具有在一定入射角度指向结构的入射光的宽波长带的结构照明，检测从该结构返回的光的光谱特性，以及产生测量 数据代表。 分析通过第一测量获得的测量数据，从而确定结构的至少一个参数。 然后，利用该确定的参数，同时分析通过第二测量获得的测量数据，使得能够确定结构的轮廓

公开(公告)号：US20090135419A1

公开(公告)日：2009-05-28

申请号：US11719419

申请日：2005-11-16

Applicant: Moshe FINAROV

Inventor： Moshe FINAROV

IPC: G01J3/42

CPC classification number: G01J3/10 ,  G01J3/02 ,  G01J3/0218 ,  G01J3/28 ,  G01J3/2803 ,  G01J3/42 ,  G01J2003/2866

Abstract: A system and method for use in spectrometric measurements of an article using selecting an optimal integration time range of the light detection system during which the measurement is to be applied, the optimal integration time being that at which a required value of signal to noise ratio (SNR) of the measurements is obtainable.

Abstract translation: 一种用于在使用测量的光检测系统的最佳积分时间范围内使用物品的光谱测量的系统和方法，最佳积分时间是所需的信噪比值（ SNR）。

公开(公告)号：US20080158553A1

公开(公告)日：2008-07-03

申请号：US12027878

申请日：2008-02-07

Applicant: Moshe FINAROV ,  Shahar Gov

Inventor： Moshe FINAROV ,  Shahar Gov

IPC: G01N21/00

CPC classification number: G01N21/95607

Abstract: A method and system are presented for use in measuring/inspecting a patterned article. Optical measurements are applied to a measurement site on the article by illuminating the measurement site with a plurality of wavelengths at substantially normal incidence of the illuminating light, detecting light returned from the illuminated site, and generating measured data indicative thereof. The measurements are applied to the measurement site through a polarizer rotatable between its different orientations selected from a number of pre-calibrated orientations.

Abstract translation: 提出了一种用于测量/检查图案制品的方法和系统。 通过以基本上垂直入射的照明光照射具有多个波长的测量部位，检测从照明部位返回的光并产生表示其的测量数据，将光学测量应用于物品上的测量部位。 通过偏振器将测量值施加到测量位置，该偏振器可以在从多个预校准取向中选择的不同取向之间旋转。