公开(公告)号：US20180180999A1

公开(公告)日：2018-06-28

申请号：US15740285

申请日：2016-05-31

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Junpei KOBAYASHI ,  Taku KATO ,  Keisuke SHUTO ,  Masayoshi SUZUKI

IPC: G03F7/038 ,  G03F9/00 ,  C08F2/44 ,  C08F2/48 ,  C08L33/10 ,  C08L33/08 ,  C08L33/26

CPC classification number: G03F7/0388 ,  C08F2/44 ,  C08F2/48 ,  C08F220/26 ,  C08F2222/1026 ,  C08L33/08 ,  C08L33/10 ,  C08L33/26 ,  C08L2203/16 ,  C09D4/06 ,  G03F7/0002 ,  G03F7/027 ,  G03F9/7042 ,  C09D4/00 ,  C08F222/1006 ,  C08F265/06 ,  C08F2222/1013 ,  C08F220/54

Abstract: A novel imprint material including a component (A); a component (B); a component (C); and a component (D) below. (A): a compound of Formula (1) below, (B): a compound of Formula (2) below, (C): a compound of Formula (3) below, and (D): a photopolymerization initiator, wherein, each R1 is independently a hydrogen atom or a methyl group, R2 is a C1-5 hydrocarbon group that optionally has a hydroxy group as a substituent, m is 2 or 3, X is a divalent linking group having an ethylene oxide unit and/or a propylene oxide unit, R3 is a hydrogen atom or a C1-3 alkyl group, n is 1 or 2, and when n is 1, R4 is a C1-12 alkyl group that is optionally substituted with at least one substituent, and when n is 2, R4 is a C1-12 alkylene group that is optionally substituted with at least one substituent.

公开(公告)号：US20180371136A1

公开(公告)日：2018-12-27

申请号：US16064674

申请日：2016-12-16

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Junpei KOBAYASHI ,  Keisuke SHUTO ,  Taku KATO ,  Masayoshi SUZUKI

IPC: C08F220/10 ,  C08F220/56 ,  C08F2/46 ,  C08L71/02 ,  G03F7/00 ,  B29C59/02 ,  B29C59/04

Abstract: A novel imprint material including: (A) a compound of formula (1); (B) a compound of formula (2); (C) a compound of formula (3); (D) a compound of formula (4); and (E) a photopolymerization initiator: wherein each R1 is independently a hydrogen atom or methyl group; R2 is a divalent or trivalent hydrocarbon group; j is 0 or 1; k is 2 or 3; X is a divalent linking group having an ethylene oxide and/or a propylene oxide unit; R3 is a hydrogen atom or alkyl group; m is 1 or 2; R5 is a trivalent, tetravalent, pentavalent, or hexavalent organic group, which optionally has at least one hetero atom; n is an integer from 3 to 6; where m is 1, R4 is an alkyl group optionally substituted with at least one substituent; and where m is 2, R4 is an alkylene group optionally substituted with at least one substituent.

公开(公告)号：US20170306095A1

公开(公告)日：2017-10-26

申请号：US15520703

申请日：2015-09-08

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Keisuke SHUTO ,  Taku KATO ,  Junpei KOBAYASHI ,  Masayoshi SUZUKI

IPC: C08G77/04 ,  C08G77/00 ,  F21V31/00 ,  H01L33/00

CPC classification number: C08G77/04 ,  C08G77/80 ,  C08G2190/00 ,  C08K5/5419 ,  C08K5/548 ,  C08L83/06 ,  F21V31/005 ,  H01L23/29 ,  H01L23/31 ,  H01L33/0045 ,  H01L33/56 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A sealing material composition for LED has excellent heat-resistant transparency, adhesion, and crack resistance, and low sulfur gas permeability. A sealing material composition for LED has the following (A), (B), (C), and (D):(A): polysiloxane containing units (1-1), (1-2), and (1-3): wherein R1 is C1-12 alkyl or C6-20 aryl, R2 is hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (A); (B): polysiloxane containing units (2-1), (2-2), and (2-3): wherein R3 and R4 are each hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (B); (C): adhesive; and (D): condensation catalyst for silanol group.

公开(公告)号：US20170269474A1

公开(公告)日：2017-09-21

申请号：US15505483

申请日：2015-07-24

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Junpei KOBAYASHI ,  Taku KATO ,  Keisuke SHUTO ,  Masayoshi SUZUKI

IPC: G03F7/00 ,  C08F290/06

CPC classification number: G03F7/0002 ,  C08F2/44 ,  C08F2/48 ,  C08F290/068 ,  C08F290/148 ,  C08F2220/1841 ,  C08F2220/1875 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0755 ,  G03F7/0757 ,  H01L21/027 ,  Y10T428/24802 ,  C08F2220/1825 ,  C08F2230/085 ,  C08F2220/1858

Abstract: A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3): wherein, X is C1-5 linear alkylene, R1 is H or CH3; each of R2, R3, and R4 is independently H, CH3, or C2H5; and the sum of the number of carbon atoms on R2, R3, and R4 is 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends: wherein, each of R6 and R7 is independently C1-3 alkyl; R5 is C1-3 alkylene; and k is 0 to 3; and (D): photopolymerization initiator.

公开(公告)号：US20150321445A1

公开(公告)日：2015-11-12

申请号：US14395903

申请日：2013-04-16

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Junpei KOBAYASHI ,  Taku KATO ,  Keisuke SHUTO ,  Masayoshi SUZUKI

IPC: B32B3/30 ,  H01L31/0236 ,  C08J5/18

CPC classification number: B32B3/30 ,  B82Y10/00 ,  B82Y40/00 ,  C08F222/1006 ,  C08J5/18 ,  C08J2333/06 ,  C09D4/00 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0757 ,  H01L27/14625 ,  H01L31/0236 ,  H01L31/02366 ,  Y10T428/24802

Abstract: There is provided an imprint material that allows a resin film to be readily released from a mold at the time of mold release after curing, that is, an imprint material that forms a film having a low mold release property as well as high transparency, high scratch resistance, and a high fingerprint wiping-off property; and a film which is formed from the material and to which a pattern is transferred. An imprint material including: a (A) component: a compound having a propylene oxide unit and two polymerizable groups or a compound having a propylene oxide unit, an ethylene oxide unit, and two polymerizable groups; a (B) component: a silicone compound; and a (C) component: a photopolymerization initiator.

Abstract translation: 提供了一种压印材料，其允许树脂膜在固化后脱模时容易地从模具中释放，即形成具有低脱模性能以及高透明度，高的膜的压印材料 耐刮擦性和高指纹擦拭性; 以及由材料形成并且图案被转印到其上的膜。 一种压印材料，包括：（A）成分：具有环氧丙烷单元和两个可聚合基团的化合物或具有环氧丙烷单元，环氧乙烷单元和两个可聚合基团的化合物; a（B）成分：硅酮化合物; 和（C）成分：光聚合引发剂。

公开(公告)号：US20190292324A1

公开(公告)日：2019-09-26

申请号：US15753689

申请日：2016-08-12

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Takehiro NAGASAWA ,  Taku KATO ,  Kentaro OHMORI ,  Keisuke SHUTO ,  Kenji TAKASE

IPC: C08G77/442 ,  B29D11/00 ,  G02B1/04

Abstract: A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.

公开(公告)号：US20180244852A1

公开(公告)日：2018-08-30

申请号：US15757628

申请日：2016-09-01

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Kei YASUI ,  Takehiro NAGASAWA ,  Taku KATO ,  Keisuke SHUTO

IPC: C08G77/20 ,  C08F230/08 ,  C08F290/06 ,  H01L27/146 ,  B29D11/00 ,  G02B1/04

Abstract: There is provided a polymerizable composition suitable to produce a molded product in which high refractive index is maintained, and dimensional change and a transmittance change further caused by a high-temperature heat history can be suppressed. A polymerizable composition comprising (a) 100 parts by mass of a specific reactive silsesquioxane compound and (b) 10 to 2,000 parts by mass of a specific fluorene compound, and a cured product obtained by curing the polymerizable composition, and a resin lens manufactured from the polymerizable composition.

公开(公告)号：US20160251469A1

公开(公告)日：2016-09-01

申请号：US15030909

申请日：2014-10-06

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Junpei KOBAYASHI ,  Taku KATO ,  Keisuke SHUTO ,  Masayoshi SUZUKI

IPC: C08F290/06 ,  G03F7/00

CPC classification number: C08F290/068 ,  B32B3/10 ,  C07F7/0838 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/0755 ,  G03F7/0757 ,  Y10T428/24802

Abstract: A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X0 in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, R1 and R2 are each independently a C1-3 alkyl group; R0 is a C1-3 alkylene group; and k is an integer of 0 to 3.

Abstract translation: 提供压印材料，以及由材料制备并且图案转印到其上的膜。 包括：（A），（B），（C）和（D）成分的印记材料; （B）成分与（A）成分和（B）成分的总量相对于100质量％的比例为5质量％以上且25质量％以下：（A） 具有式（1）的重复单元且在式（1）中具有两个或更多个X 0的可聚合基团的倍半硅氧烷化合物; （B）具有式（2）的重复单元并在其端部具有两个可聚合基团的硅氧烷化合物; （C）光聚合引发剂; 和（D）溶剂，式中R 1和R 2各自独立地为C 1-3烷基; R 0是C 1-3亚烷基; k为0〜3的整数。