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公开(公告)号：US10774234B2
公开(公告)日：2020-09-15
申请号：US14896639
申请日：2014-06-09
IPC分类号： C09D133/14 , C09D143/02 , C12M1/00 , C08L101/02 , C09D201/02 , C08L43/02 , C09D5/16 , C08F230/02
摘要： The present invention is to provide a cell culture vessel comprising a copolymer which contains a recurring unit containing an organic group of the following formula (a) and a recurring unit containing an organic group of the following formula (b) being coated onto a surface thereof, a method for manufacturing the same and a method for manufacturing a cell aggregate using the same (wherein Ua1, Ua2, Ub1, Ub2 and Ub3, and An− are as defined in the present specification and the claims).
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公开(公告)号：US09822330B2
公开(公告)日：2017-11-21
申请号：US14435342
申请日：2013-10-11
发明人： Takahiro Kishioka , Shigeo Kimura , Yoshiomi Hiroi , Yuki Usui , Hiromi Kitano , Tadashi Nakaji , Makoto Gemmei
IPC分类号： C12M1/00 , G03F7/075 , C08F230/08 , C12M1/12
CPC分类号： C12M23/20 , C08F230/08 , C12M23/30 , C12M25/02 , C12M31/00 , G03F7/0757 , Y10T428/24479 , Y10T428/24802 , Y10T428/31612 , Y10T428/31663
摘要： There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanion or a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
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公开(公告)号：US09678427B2
公开(公告)日：2017-06-13
申请号：US15106861
申请日：2014-12-10
发明人： Hiroto Ogata , Takahiro Kishioka , Yoshiomi Hiroi , Tomoya Ohashi , Yuki Usui
IPC分类号： G03F7/11 , G03F7/09 , C09D167/02 , C09D181/04 , C09D167/00 , H01L21/027
CPC分类号： G03F7/11 , C08G63/6856 , C08G63/6886 , C09D167/02 , C09D167/025 , C09D181/04 , G03F7/091 , G03F7/094
摘要： A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent. wherein A is a divalent organic group containing a triazine ring, X1 is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X1 is an —O— group, Z is a divalent group having at least one sulfur atom.
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4.发明申请公开(公告)号：US20150267159A1
公开(公告)日：2015-09-24
申请号：US14435342
申请日：2013-10-11
发明人： Takahiro Kishioka , Shigeo Kimura , Yoshiomi Hiroi , Yuki Usui , Hiromi Kitano , Tadashi Nakaji , Makoto Gemmei
IPC分类号： C12M1/00 , G03F7/075 , C08F230/08
CPC分类号： C12M23/20 , C08F230/08 , C12M23/30 , C12M25/02 , C12M31/00 , G03F7/0757 , Y10T428/24479 , Y10T428/24802 , Y10T428/31612 , Y10T428/31663
摘要： There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanionor a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
摘要翻译： 提供了可以形成更精细图案的新材料，并且可以应用于各种细胞种类，蛋白质，病毒等的吸附/粘附控制，而不受光源的限制。 一种光降解材料，包括：能够通过硅氧烷键与基材表面结合的部分; （2-a）和/或式（2-b）的结构单元：（其中R 2至R 4为饱和直链烷基; X为氢原子或烷基; Z为碳阴离子，磺基阴离子; Q是酯键基，磷酸二酯键基，酰胺键，亚烷基或亚苯基或这些二价基的组合; m1是1〜200的整数，n是1〜 10）。
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公开(公告)号：US11345827B2
公开(公告)日：2022-05-31
申请号：US14896623
申请日：2014-06-09
IPC分类号： C09D133/14 , C09D143/02 , C08L101/02 , C09D201/02 , C08L43/02 , C09D5/16 , C08F230/02 , C12M1/00
摘要： This is to provide a coating film having a function of inhibiting adhesion of a biological substance, a method for manufacturing the coating film, a copolymer obtainable by polymerizing a specific monomer mixture, a composition for forming a coating film having a specific composition, a method for manufacturing a varnish containing a copolymer to be used as a raw material of the composition for forming a coating film which is used for forming said film, and a sol for forming the coating film. In particular, this is to provide a coating film obtained by the method comprising a process of applying a composition for forming a coating film which comprises a copolymer comprising a recurring unit containing an organic group of the formula (a) and a recurring unit containing an organic group of the formula (b) and a solvent onto a substrate; and a process of drying at a temperature of −200° C. to 200° C. (wherein Ua1, Ua2, Ub1, Ub2 and Ub3, and An− are as defined in the present specification and the claims).
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公开(公告)号：US10889791B2
公开(公告)日：2021-01-12
申请号：US15768427
申请日：2016-10-14
发明人： Junko Katayama , Yoshiomi Hiroi , Ayako Aihara , Natsuki Abe , Taito Nishino
IPC分类号： C12M1/00 , C08F230/02 , C09D143/02 , G01N37/00 , A61K35/19 , C12M1/26 , B01J19/00 , C09D5/16 , C09D201/06 , C08F220/34 , C12M3/06
摘要： The invention provides a coating agent for a flow passage which comprises a copolymer containing a recurring unit which contains an organic group of the formula (a) wherein Ua1 and Ua2 are defined herein, and a recurring unit which contains an organic group of the formula (b) wherein Ub1, Ub2, Ub3, and An− are defined herein. The invention also provides a flow passage device having the coating agent for a flow passage on at least part of an inner surface of a flow passage, a platelet-producing flow passage device and a method for manufacturing the same.
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7.发明授权公开(公告)号：US10669445B2
公开(公告)日：2020-06-02
申请号：US15535049
申请日：2015-12-10
发明人： Yoshiomi Hiroi , Natsuki Abe , Taito Nishino , Masaki Kitahara
IPC分类号： C09D143/02 , C09D133/14 , C08F230/02 , C09D5/00 , C09D5/16 , A61L27/34 , A61L31/10
摘要： The present invention provides a copolymer obtainable by polymerizing a monomer mixture which contains at least compounds of the following formulae (A), (B) and (C), wherein Ta, Tb, Tc, Ua1, Ua2, Ub1, Ub2 and Ub3, Qa, Qb and Qc, Ra, Rb and Rc, An− and m are as defined in Specification and Claims, and so on. The copolymer of the present invention can be utilized as an ion complex material excellent in a function of inhibiting adhesion of a biological substance.
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公开(公告)号：US10092687B2
公开(公告)日：2018-10-09
申请号：US14896632
申请日：2014-06-09
发明人： Tatsuro Kanaki , Takahiro Kishioka , Taito Nishino , Yoshiomi Hiroi , Ayako Otani , Tomoyuki Ozawa
摘要： This is to provide a blood filter comprising a porous element; and a copolymer which exists in at least a part of a surface of the porous element, and which contains a recurring unit containing an organic group of the following formula (a) and a recurring unit containing an organic group of the following formula (b), wherein Ua1, Ua2, Ub1, Ub2 and Ub3, and An− are as defined in the present specification and the claims.
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公开(公告)号：US11894429B2
公开(公告)日：2024-02-06
申请号：US17851868
申请日：2022-06-28
发明人： Yoshiomi Hiroi , Shinichi Maeda
IPC分类号： H01L29/24 , H01L21/02 , H01L29/786 , C04B35/626 , C04B35/01 , C04B35/453
CPC分类号： H01L29/247 , C04B35/01 , C04B35/453 , C04B35/62625 , C04B35/62675 , H01L21/02554 , H01L21/02565 , H01L21/02592 , H01L21/02628 , H01L29/78693 , C04B2235/3284 , C04B2235/3286 , C04B2235/3293
摘要： Methods for producing the amorphous metal oxide semiconductor layer where amorphous metal oxide semiconductor layer is formed by use of a precursor composition containing a metal salt, a primary amide, and a water-based solution. The methodology for producing the amorphous metal oxide semiconductor layer includes applying the precursor composition onto a substrate to form a precursor film, and firing the film at a temperature of 150° C. or higher and lower than 300° C.
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