公开(公告)号：US20100243471A1

公开(公告)日：2010-09-30

申请号：US12739804

申请日：2008-08-25

申请人： Naichao Li ,  John J. Gagliardi ,  Philip G. Clark ,  Patricia M. Savu

发明人： Naichao Li ,  John J. Gagliardi ,  Philip G. Clark ,  Patricia M. Savu

IPC分类号： C09K13/00 ,  H01L21/302 ,  C25F3/30

CPC分类号： H01L21/31053 ,  B24B37/044 ,  C09G1/02

摘要： A composition for use in polishing a wafer is disclosed. The composition includes an aqueous solution of initial components substantially free of loose abrasive particles and having a pH in the range of about 2 to 7, the aqueous solution including at least one polyelectrolyte and a surfactant. In certain embodiments, the wafer polishing composition can be adjusted to control cut rate and selectivity for modifying semiconductor wafers using a fixed abrasive Chemical Mechanical Polishing (CMP) process. Also disclosed is a CMP method and a process for polishing a wafer using the polishing composition.

摘要翻译： 公开了一种用于抛光晶片的组合物。 所述组合物包含初始组分的水溶液，其基本上不含松散的磨料颗粒，并且pH在约2-7范围内，所述水溶液包含至少一种聚电解质和表面活性剂。 在某些实施方案中，可以调整晶片抛光组合物以控制使用固定磨料化学机械抛光（CMP）工艺修改半导体晶片的切割速率和选择性。 还公开了CMP方法和使用抛光组合物研磨晶片的方法。

公开(公告)号：US08092707B2

公开(公告)日：2012-01-10

申请号：US11839329

申请日：2007-08-15

申请人： L. Charles Hardy ,  Heather K. Kranz ,  Thomas E. Wood ,  David A. Kaisaki ,  John J. Gagliardi ,  John C. Clark ,  Patricia M. Savu ,  Philip G. Clark

发明人： L. Charles Hardy ,  Heather K. Kranz ,  Thomas E. Wood ,  David A. Kaisaki ,  John J. Gagliardi ,  John C. Clark ,  Patricia M. Savu ,  Philip G. Clark

IPC分类号： C09K13/00

CPC分类号： H01L21/31053 ,  B24B37/044 ,  B24B37/245 ,  C09G1/02 ,  H01L21/3212

摘要： The disclosure pertains to compositions and methods for modifying or refining the surface of a wafer suited for semiconductor fabrication. The compositions include working liquids useful in modifying a surface of a wafer suited for fabrication of a semiconductor device. In some embodiments, the working liquids are aqueous solutions of initial components substantially free of loose abrasive particles, the components including water, a surfactant, and a pH buffer exhibiting at least one pKa greater than 7. In certain embodiments, the pH buffer includes a basic pH adjusting agent and an acidic complexing agent, and the working liquid exhibits a pH from about 7 to about 12. In further embodiments, the disclosure provides a fixed abrasive article comprising a surfactant suitable for modifying the surface of a wafer, and a method of making the fixed abrasive article. Additional embodiments describe methods that may be used to modify a wafer surface.

摘要翻译： 本公开涉及用于改性或精制适于半导体制造的晶片表面的组合物和方法。 组合物包括可用于改性适于制造半导体器件的晶片表面的工作液体。 在一些实施方案中，工作液体是基本上不含松散磨料颗粒的初始组分的水溶液，组分包括水，表面活性剂和显示出至少一个pKa大于7的pH缓冲液。在某些实施方案中，pH缓冲剂包括 碱性pH调节剂和酸性络合剂，并且工作液体的pH为约7至约12.在另外的实施方案中，本公开提供了包含适于改性晶片表面的表面活性剂的固定磨料制品，以及方法 制造固定的磨料制品。 另外的实施例描述了可用于修改晶片表面的方法。

公开(公告)号：US20100160458A1

公开(公告)日：2010-06-24

申请号：US12625652

申请日：2009-11-25

申请人： Patricia M. Savu ,  Philip G. Clark ,  Michael J. Parent ,  Jason M. Kehren

发明人： Patricia M. Savu ,  Philip G. Clark ,  Michael J. Parent ,  Jason M. Kehren

IPC分类号： B01F17/26

CPC分类号： C11D1/004 ,  C11D1/65

摘要： A method of making a composition comprises independently providing a first component comprising a first compound, and a second components comprising a second compound; and combining the first component and the second component, wherein: a) the first compound is represented by and b) the second compound is represented by Rf represents a perfluoroalkyl group having from 1 to 12 carbon atoms. R1, R2, R3, and R4 each independently represent H or an alkyl group having from 1 to 6 carbon atoms. R5 represents H, an alkyl group having from 1 to 6 carbon atoms, or a hydroxyalkyl group having from 1 to 6 carbon atoms. R6 and R7 each independently represent an alkyl group having from 1 to 6 carbon atoms, or a hydroxyalkyl group having from 1 to 6 carbon atoms. Compositions preparable according to the method are also disclosed.

摘要翻译： 制备组合物的方法包括独立地提供包含第一化合物的第一组分和包含第二化合物的第二组分; 并且组合第一组分和第二组分，其中：a）第一化合物由下式表示，b）第二化合物由Rf表示具有1至12个碳原子的全氟烷基表示。 R 1，R 2，R 3和R 4各自独立地表示H或具有1至6个碳原子的烷基。 R5表示H，具有1至6个碳原子的烷基或具有1至6个碳原子的羟烷基。 R6和R7各自独立地表示具有1至6个碳原子的烷基或具有1至6个碳原子的羟烷基。 还公开了根据该方法可制备的组合物。

公开(公告)号：US4230222A

公开(公告)日：1980-10-28

申请号：US005478

申请日：1979-01-22

申请人： Philip G. Clark

发明人： Philip G. Clark

IPC分类号： B65G45/26 ,  B65G37/00

CPC分类号： B65G45/26

摘要： A conveyor assembly for moving particulate material such as grain on a conveyor belt. The conveyor assembly includes a tail section, one or more intermediate sections according to the needed length, and a head section. The head section contains a powered drive pulley. The tail section contains a tail pulley. An endless conveyor belt is trained between the tail pulley and the drive pulley. Each intermediate section carries at least one roller for carrying the forward run of the conveyor belt. The intermediate section rollers have a contoured, concave surface to support the conveyor belt with a dish-shaped or concave profile such that material is held on the conveyor belt and inhibited from spilling over the sides. The tail pulley is mounted in a tail pulley shroud having a funnel-shaped outlet directed toward the forward run of the conveyor belt. The tail pulley has paddles which are operative to sweep up spilled material in the tail sections and move it around the shroud housing through the outlet to discharge it back onto the forward run of the conveyor belt. The longitudinal position of the tail pulley is adjustable in order to set the tension in the conveyor belt.

摘要翻译： 用于在输送带上移动诸如谷物的颗粒材料的输送机组件。 输送机组件包括尾部，根据所需长度的一个或多个中间部分和头部。 头部包含动力传动皮带轮。 尾部包含一个尾部滑轮。 在尾部滑轮和驱动滑轮之间训练无端的传送带。 每个中间部分承载至少一个用于承载传送带前进的辊。 中间部分辊具有轮廓的凹形表面，以支撑具有碟形或凹形轮廓的传送带，使得材料保持在传送带上并且防止在侧面溢出。 尾部滑轮安装在具有指向传送带的前进的漏斗形出口的尾部滑轮罩中。 尾轮具有桨叶，其操作以在尾部中清除溢出的材料并且通过出口将其围绕护罩壳体移动，以将其排回到传送带的前进运行。 尾轮的纵向位置是可调节的，以便设定输送带中的张力。

公开(公告)号：US6039170A

公开(公告)日：2000-03-21

申请号：US25562

申请日：1998-02-18

申请人： Philip G. Clark

发明人： Philip G. Clark

IPC分类号： B65G47/95 ,  B65G37/00

CPC分类号： B65G47/95

摘要： An enclosed movable tripper belt conveyor includes an elongated trunking having an endless conveyor belt carried by troughing idlers along an upper path leading from a tail pulley to a head pulley. The belt returns from the head pulley to the tail pulley in sliding contact with a floor of the trunking. A movable tripper unit includes a tripper that discharges the material being conveyed to a valve that is configured and arranged to selectively discharge the material to one side or the other of the movable tripper unit. A cover is received over the trunking and the movable tripper unit so as to form with the trunking an enclosure containing the belt, the tail pulley, the head pulley, all of the troughing idlers and the movable tripper unit.

摘要翻译： 封闭的可移动牵引带输送机包括细长的集群，其具有环形输送带，所述环形输送带通过沿着从尾部滑轮引导到头部滑轮的上部路径的凹槽来运送。 皮带从头部皮带轮返回到尾部滑轮，与集线器的地板滑动接触。 可移动的脱扣器单元包括将被输送的材料排出到阀的脱扣器，所述阀被构造和布置成选择性地将材料排出到可动脱扣器单元的一侧或另一侧。 盖子被收纳在集群和可移动的脱扣器单元上，从而形成带有包含带，尾带轮，头部带轮，所有槽式惰轮和可移动的脱扣器单元的外壳。

公开(公告)号：US5526922A

公开(公告)日：1996-06-18

申请号：US264448

申请日：1994-06-23

申请人： Philip G. Clark

发明人： Philip G. Clark

IPC分类号： B65G17/12 ,  B65G17/36

CPC分类号： B65G17/126 ,  B65G2201/04

摘要： A belt type conveyor includes buckets which include front and rear forward angling walls for nesting. The front walls act as a retaining wall and a pour chute for discharging material at the correct time and location. The buckets may also include rear portions which direct material falling onto the rear portion into the next bucket. The rear portions may also include a wear block mounted at the top of the rear wall for preventing wear on the remaining portions of the bucket. The buckets may include flanges extending on either side, which ride under bogies for maintaining proper tension and for following the correct desired path of the conveyor.

摘要翻译： 带式输送机包括用于嵌套的前后倾斜壁的铲斗。 前壁用作挡土墙和倾倒槽，用于在正确的时间和位置排放材料。 铲斗还可以包括将材料落到后部进入下一个铲斗的后部。 后部还可以包括安装在后壁顶部的磨损块，用于防止铲斗剩余部分的磨损。 铲斗可以包括在任一侧上延伸的凸缘，其在转向架下方运动以保持适当的张力并且跟随输送机的正确的所需路径。

公开(公告)号：US20090029274A1

公开(公告)日：2009-01-29

申请号：US11782766

申请日：2007-07-25

申请人： Erik D. Olson ,  Philip G. Clark

发明人： Erik D. Olson ,  Philip G. Clark

IPC分类号： C11D17/00 ,  G03G17/00

CPC分类号： H01L21/31133 ,  G03F7/426 ,  H01L21/02071 ,  H01L21/28079 ,  H01L29/78

摘要： A method of removing contamination from a substrate having an ion-implanted region is described. The method comprises applying a composition comprising a fluorinated solvent and a co-solvent to the substrate in an amount sufficient to assist in the removal of contamination from the substrate. As contaminant is removed, metal patterns or other desired features on the substrate remain. Additionally, the composition for removing contamination is not harmful to the user or the substrate (i.e., non-flammable and/or non caustic).

摘要翻译： 描述了从具有离子注入区域的衬底去除污染物的方法。 该方法包括以足以帮助从衬底除去污染物的量向基材施加包含氟化溶剂和共溶剂的组合物。 当污染物被去除时，衬底上的金属图案或其它所需特征保留。 另外，用于除去污染物的组合物对使用者或基材无害（即，不可燃和/或不苛性）。

公开(公告)号：US07614852B2

公开(公告)日：2009-11-10

申请号：US12004632

申请日：2007-12-24

申请人： Philip G. Clark

发明人： Philip G. Clark

IPC分类号： F03D1/06

CPC分类号： F03D1/0641 ,  F05B2240/301 ,  Y02E10/721 ,  Y02E10/725

摘要： A blade is disclosed for use in a wind turbine, with the blade having a longitudinal axis for extending radially outwardly from a center of rotation of the blade on the wind turbine. The blade has a front side with a front surface for orienting in a windward direction and a rear side with a rear surface for orienting in a leeward direction. The blade has a profile taken in a plane oriented substantially perpendicular to the longitudinal axis of the blade. The profile of the blade has a leading edge and a trailing edge. The profile is characterized by a camber ratio, and the camber ratio of the profile is greater than or equal to approximately 4%.

摘要翻译： 公开了一种用于风力涡轮机的叶片，其中叶片具有用于从风力涡轮机上的叶片的旋转中心径向向外延伸的纵向轴线。 叶片具有前侧，其具有用于沿向上方向定向的前表面和具有后表面的后侧，用于在背风方向上定向。 叶片具有在基本上垂直于叶片的纵向轴线定向的平面中截取的轮廓。 叶片的轮廓具有前缘和后缘。 轮廓的特征在于外倾比，轮廓的外倾比大于或等于大约4％。

公开(公告)号：US20090160194A1

公开(公告)日：2009-06-25

申请号：US12004632

申请日：2007-12-24

申请人： Philip G. Clark

发明人： Philip G. Clark

IPC分类号： F03D1/06 ,  F03D1/00 ,  F03D1/02 ,  F03D11/00 ,  F03D9/00

CPC分类号： F03D1/0641 ,  F05B2240/301 ,  Y02E10/721 ,  Y02E10/725

摘要： A blade is disclosed for use in a wind turbine, with the blade having a longitudinal axis for extending radially outwardly from a center of rotation of the blade on the wind turbine. The blade has a front side with a front surface for orienting in a windward direction and a rear side with a rear surface for orienting in a leeward direction. The blade has a profile taken in a plane oriented substantially perpendicular to the longitudinal axis of the blade. The profile of the blade has a leading edge and a trailing edge. The profile is characterized by a camber ratio, and the camber ratio of the profile is greater than or equal to approximately 4%.

公开(公告)号：US07425505B2

公开(公告)日：2008-09-16

申请号：US10894319

申请日：2004-07-19

申请人： Philip G. Clark ,  Kurt Karl Christenson ,  Brent D. Schwab

发明人： Philip G. Clark ,  Kurt Karl Christenson ,  Brent D. Schwab

IPC分类号： H01L21/44

CPC分类号： H01L21/31138 ,  H01L21/02063 ,  H01L21/02137 ,  H01L21/02203 ,  H01L21/02337 ,  H01L21/02343 ,  H01L21/02348 ,  H01L21/3105 ,  H01L21/31058 ,  H01L21/3122 ,  H01L21/3124 ,  H01L21/3125 ,  H01L21/31695 ,  H01L21/76814 ,  H01L21/76826 ,  H01L23/3171 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention provides improvements to the use of silyating agents in semiconductor processing. More particularly, the silyating agents may be provided in combination with a substantially non-flammable ether, so that the combination is substantially non-flammable. Additionally, the silyating agent may be utilized in vapor form, or applied in conjunction with the electromagnetic radiation. Each of these embodiments can enhance the usability of the silyating agent, i.e., by rendering the silyating agent more safe, more easily utilized in a variety of processing equipment and/or by enhancing the passivation efficacy/efficiency of the silyating agent.

摘要翻译： 本发明提供了在半导体加工中使用硅烷化剂的改进。 更具体地说，可以与基本上不可燃的醚组合提供该酯化剂，使得该组合基本上是不可燃的。 另外，可以以蒸气形式使用，也可以与电磁辐射结合使用。 这些实施方案中的每一个都可以增强水解剂的可用性，即通过使得silyating剂更安全，更容易地用于各种加工设备和/或通过提高所述silyating剂的钝化效率/效率。