公开(公告)号：US06843816B2

公开(公告)日：2005-01-18

申请号：US10467481

申请日：2002-01-31

申请人： Terunori Ito ,  Naoyoshi Mochizuki ,  Hiroyuki Watanabe ,  Yoshitsugu Uchino ,  Akira Shimogawara

发明人： Terunori Ito ,  Naoyoshi Mochizuki ,  Hiroyuki Watanabe ,  Yoshitsugu Uchino ,  Akira Shimogawara

IPC分类号： B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  C09G1/02 ,  C09G1/04

CPC分类号： C09K3/14 ,  C01F17/0043 ,  C01P2006/12 ,  C01P2006/60 ,  C09K3/1409

摘要： A cerium-based abrasive and a production method of the cerium-based abrasive excellent in polishing properties of a high polishing speed and scarce formation of polishing scratches are provided by keeping the color of the abrasive in specified ranges or stably making fluorine be contained in the abrasive. For example, as such a cerium-based abrasive, examples include a cerium-based abrasive containing cerium oxide as a main component and having an L* value in a range not lower than 65 and or lower 90, an a* value in a range 0 or higher but 15 or lower, and a b* value in a range 10 or higher but 30 or lower in the case the color is expressed by an L*a*b* color system.

摘要翻译： 通过将研磨剂的颜色保持在规定范围内，或者稳定地使氟含有的方法，可以提供高抛光速度的抛光性能和抛光痕迹形成少的铈系研磨剂和铈系磨料的制造方法 磨料。 例如，作为这样的铈系研磨剂，例如可以举出含有氧化铈作为主要成分且L *值在65以上或90以下的铈基研磨剂，a *值范围 0或更高但为15或更低，并且在颜色由L * a * b *颜色系统表示的情况下，ab *值在10以上且30以下的范围内。

公开(公告)号：US6083476A

公开(公告)日：2000-07-04

申请号：US981332

申请日：1998-01-29

申请人： Naoyoshi Mochizuki ,  Kenzo Hanawa

发明人： Naoyoshi Mochizuki ,  Kenzo Hanawa

IPC分类号： C01G49/08 ,  C09C1/24 ,  C09C3/08 ,  C09C1/22 ,  B32B5/16 ,  C01G49/02

CPC分类号： B82Y30/00 ,  C01G49/08 ,  C09C1/24 ,  C09C3/08 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/42 ,  C01P2006/60 ,  C01P2006/80 ,  Y10T428/2991 ,  Y10T428/2993 ,  Y10T428/2995 ,  Y10T428/2996 ,  Y10T428/2998

摘要： Black ultrafine magnetite particles of this invention have an FeO content of 31 to 35% and a particle size of 0.1 .mu.m or less. A process for producing the black ultrafine magnetite particles comprises dispersing ultrafine magnetite particles with a particle size of 0.1 .mu.m or less in water containing ferrous hydroxide, aging the dispersion of 90 to 200.degree. C. at a free alkali concentration of 1 mol/liter (M/l) or more, then adding 0.2 to 5%, based on the magnetite particles, of sodium oleate or potassium oleate, and adjusting the pH to 5 to 6 to adhere oleic acid to magnetite.

摘要翻译： PCT No.PCT / JP97 / 01524 Sec。 371日期1998年1月29日 102（e）1998年1月29日PCT PCT 1997年5月7日PCT公布。 公开号WO97 / 42125 PCT 日期：1997年11月13日本发明的超细磁铁矿颗粒的FeO含量为31〜35％，粒径为0.1μm以下。 黑色超细磁铁矿颗粒的制造方法包括在含有氢氧化亚铁的水中分散粒径为0.1μm以下的超细磁铁矿颗粒，以1mol / l的游离碱浓度使分散液老化90〜200℃ （M / l）以上，然后加入基于磁铁矿颗粒0.2〜5％的油酸钠或油酸钾，并将pH调节至5〜6以使油酸粘附于磁铁矿。

公开(公告)号：US07156888B2

公开(公告)日：2007-01-02

申请号：US10473402

申请日：2003-03-18

申请人： Naoyoshi Mochizuki

发明人： Naoyoshi Mochizuki

IPC分类号： C09K3/14 ,  C09G1/02

CPC分类号： C01F17/0043 ,  C01P2004/50 ,  C01P2006/80 ,  C09G1/02 ,  C09K3/1409 ,  C09K3/1463

摘要： The object of the present invention is to provide a powder cerium-based abrasive which enables the preparation of a cerium-based abrasive slurry, in which the dispersed state of the abrasive particles is maintained for a long period of time, simply by blending it with a dispersion medium such as water and which makes easier the after-treatment of the abrasive slurry having been used. The cerium-based abrasive of this invention is a cerium-based abrasive including chlorine-containing compounds in which chlorine (element) is contained in amounts, in terms of total mass, equivalent to 0.05% to 5.0% of the mass of the total rare earth oxide contained therein. An abrasive slurry including the abrasive of this invention as a solid content is superior in dispersion maintaining properties of its abrasive particles. Accordingly, an abrasive slurry having a stable concentration of the solid content can be supplied continuously. Further, the abrasive requires no dispersant for maintaining its dispersed state, and hence separation treatment for a dispersant is unnecessary after the abrasive has been used. Thus, the abrasive according to the present invention makes simpler the after-treatment of the abrasive slurry after use.

摘要翻译： 本发明的目的是提供一种粉末状铈基研磨剂，其能够制备铈基磨料浆料，其中磨料颗粒的分散状态长期保持，简单地将其与 诸如水的分散介质，并且使已经使用的磨料浆料的后处理更容易。 本发明的铈基研磨剂是包含含氯化合物的铈基磨料，其中含有氯（元素）的总量，相当于总稀土的质量的0.05％至5.0％ 其中含有地球氧化物。 包括本发明的研磨剂作为固体含量的磨料浆料在其磨料颗粒的分散维持性方面是优异的。 因此，可以连续供给具有稳定浓度的固体含量的研磨浆料。 此外，研磨剂不需要分散剂来维持其分散状态，因此在使用磨料后不需要分散剂的分离处理。 因此，根据本发明的研磨剂在使用后使磨料浆料的后处理变得更简单。

公开(公告)号：US5951724A

公开(公告)日：1999-09-14

申请号：US030803

申请日：1998-02-26

申请人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda ,  Kazuhiko Kato

发明人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda ,  Kazuhiko Kato

IPC分类号： B24B37/00 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y99/00 ,  C01B33/113 ,  C01B33/18 ,  C01F17/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/3105 ,  C01R17/00 ,  H01L21/309

CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1454

摘要： A fine particulate polishing agent comprises fine particles of a solid solution composed of single-crystal ceric oxide and silicon dioxide and fine particles of silicon dioxide. A slurry polishing agent comprising the fine particulate polishing agent can be prepared by a method which comprises the steps of mixing, with stirring, single-crystal ceric oxide fine particles, silica sol and a liquid; drying the mixture; subjecting the dried particulate material to a thermal treatment at a high temperature and then cooling the solid solution powder formed by the thermal treatment and composed of single crystal ceric oxide and silicon dioxide; again mixing the powder with silica sol and a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry.

摘要翻译： 细颗粒抛光剂包括由单晶氧化铈和二氧化硅组成的固溶体的微粒和二氧化硅的微粒。 包含微粒抛光剂的浆料抛光剂可以通过包括以下步骤的方法制备：在搅拌下混合单晶氧化铈细颗粒，二氧化硅溶胶和液体; 干燥混合物; 使干燥的颗粒材料在高温下进行热处理，然后冷却由热处理形成的固溶粉末，并由单晶氧化铈和二氧化硅组成; 再次将粉末与硅溶胶和液体混合; 然后使用湿磨粉碎机对混合物进行解聚，得到浆料。

公开(公告)号：US20070077868A1

公开(公告)日：2007-04-05

申请号：US11633415

申请日：2006-12-05

申请人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

发明人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

IPC分类号： B05D7/00 ,  B24D3/02 ,  B24B7/30

CPC分类号： C03C19/00 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1445 ,  C09K3/1463 ,  Y10T428/256 ,  Y10T428/2991 ,  Y10T428/2993

摘要： There is provided a cerium-based abrasive containing cerium oxide as a main component, in which the abrasive particles composing the abrasive are coated with a coating layer containing at least either one of a silicon component of silicon or a silicon compound and an aluminum component of aluminum or an aluminum compound. The cerium-based abrasive can be produced by wet-dispersing the cerium-based abrasive in a dispersion medium to obtain a slurry and carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry. Further, the cerium-based abrasive can be produced by carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry during the pulverization step or after the pulverization step in the conventional cerium-based abrasive production process and after that roasting and classifying the obtained cerium-based abrasive.

摘要翻译： 提供了一种含有氧化铈作为主要成分的铈基研磨剂，其中构成研磨剂的磨料颗粒被涂覆有包含硅或硅化合物的硅成分中的至少一种的涂层和铝 铝或铝化合物。 铈系研磨剂可以通过将铈系研磨剂在分散介质中进行湿式分散而得到浆料，并通过将含有硅化合物和铝化合物中的至少一种的处理溶液添加至 泥浆。 此外，可以通过在粉碎步骤期间或在常规铈 - 铝合金中的粉碎步骤之后，将含有硅化合物和铝化合物中的至少一种的处理溶液添加到浆料中来进行表面处理来制备铈基研磨剂， 之后对所获得的铈基磨料进行焙烧和分级。

公开(公告)号：US5938837A

公开(公告)日：1999-08-17

申请号：US719618

申请日：1996-09-25

申请人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda

发明人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda

IPC分类号： C30B7/14 ,  B24C11/00 ,  C01F17/00 ,  C09K3/14 ,  C30B7/00 ,  C30B29/16

CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C09K3/1409 ,  C30B29/16 ,  C30B29/605 ,  C30B7/00 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/50 ,  C01P2004/64

摘要： Cerium oxide ultrafine particles consist essentially of cerium oxide single crystal grains having a grain size ranging from 10 to 80 nm and the cerium oxide ultrafine particles can be prepared by a method which comprises the steps of mixing, with stirring, an aqueous solution of cerous nitrate with a base in such a mixing ratio that the pH value of the mixture ranges from 5 to 10, then rapidly heating the resulting mixture up to a temperature of 70 to 100.degree. C. and maturing the mixture at that temperature. The cerium oxide ultrafine particles not only have an average particle size ranging from 10 to 80 nm, but also are uniform in the particle size and in the shape.

摘要翻译： 氧化铈超微粒子主要由粒度为10〜80nm的氧化铈单晶粒子组成，氧化铈超微粒子可以通过以下方法制备：将搅拌下的硝酸铈水溶液 以这样的混合比例使混合物的pH值达到5至10，然后将所得混合物快速加热至70至100℃的温度，并在该温度下熟化混合物。 氧化铈超微粒子的平均粒径不仅为10〜80nm，而且粒径和形状均匀。

公开(公告)号：US06946009B2

公开(公告)日：2005-09-20

申请号：US10467307

申请日：2002-03-08

申请人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

发明人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

IPC分类号： B24B37/00 ,  C09C1/68 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304

CPC分类号： C03C19/00 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1445 ,  C09K3/1463 ,  Y10T428/256 ,  Y10T428/2991 ,  Y10T428/2993

摘要： There is provided a cerium-based abrasive containing cerium oxide as a main component, in which the abrasive particles composing the abrasive are coated with a coating layer containing at least either one of a silicon component of silicon or a silicon compound and an aluminum component of aluminum or an aluminum compound. The cerium-based abrasive can be produced by wet-dispersing the cerium-based abrasive in a dispersion medium to obtain a slurry and carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry. Further, the cerium-based abrasive can be produced by carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry during the pulverization step or after the pulverization step in the conventional cerium-based abrasive production process and after that roasting and classifying the obtained cerium-based abrasive.

摘要翻译： 提供了一种含有氧化铈作为主要成分的铈基研磨剂，其中构成研磨剂的磨料颗粒被涂覆有包含硅或硅化合物的硅成分中的至少一种的涂层和铝 铝或铝化合物。 铈系研磨剂可以通过将铈系研磨剂在分散介质中进行湿式分散而得到浆料，并通过将含有硅化合物和铝化合物中的至少一种的处理溶液添加至 泥浆。 此外，可以通过在粉碎步骤期间或在常规铈 - 铝合金中的粉碎步骤之后，将含有硅化合物和铝化合物中的至少一种的处理溶液添加到浆料中来进行表面处理来制备铈基研磨剂， 之后对所获得的铈基磨料进行焙烧和分级。

公开(公告)号：US20050198913A1

公开(公告)日：2005-09-15

申请号：US11121009

申请日：2005-05-04

申请人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

发明人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

IPC分类号： B24B37/00 ,  C09C1/68 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  B24D3/02

CPC分类号： C03C19/00 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1445 ,  C09K3/1463 ,  Y10T428/256 ,  Y10T428/2991 ,  Y10T428/2993

摘要： There is provided a cerium-based abrasive containing cerium oxide as a main component, in which the abrasive particles composing the abrasive are coated with a coating layer containing at least either one of a silicon component of silicon or a silicon compound and an aluminum component of aluminum or an aluminum compound. The cerium-based abrasive can be produced by wet-dispersing the cerium-based abrasive in a dispersion medium to obtain a slurry and carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry. Further, the cerium-based abrasive can be produced by carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry during the pulverization step or after the pulverization step in the conventional cerium-based abrasive production process and after that roasting and classifying the obtained cerium-based abrasive.

摘要翻译： 提供了一种含有氧化铈作为主要成分的铈基研磨剂，其中构成研磨剂的磨料颗粒被涂覆有包含硅或硅化合物的硅成分中的至少一种的涂层和铝 铝或铝化合物。 铈系研磨剂可以通过将铈系研磨剂在分散介质中进行湿式分散而得到浆料，并通过将含有硅化合物和铝化合物中的至少一种的处理溶液添加至 泥浆。 此外，可以通过在粉碎步骤期间或在常规铈 - 铝合金中的粉碎步骤之后，将含有硅化合物和铝化合物中的至少一种的处理溶液添加到浆料中来进行表面处理来制备铈基研磨剂， 之后对所获得的铈基磨料进行焙烧和分级。

公开(公告)号：US06689178B2

公开(公告)日：2004-02-10

申请号：US10111405

申请日：2002-05-06

申请人： Terunori Ito ,  Hidehiko Yamasaki ,  Naoyoshi Mochizuki ,  Yoshitsugu Uchino

发明人： Terunori Ito ,  Hidehiko Yamasaki ,  Naoyoshi Mochizuki ,  Yoshitsugu Uchino

IPC分类号： C09K314

CPC分类号： C09K3/1409 ,  C01F17/0043 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2006/12 ,  C03C19/00

摘要： Regarding a cerium oxide-based abrasive containing cerium oxide as a main component and abrasive particles with an average particle diameter of 0.2 to 3.0 &mgr;m, the present invention provides a cerium-based abrasive containing coarse particles of 10 &mgr;m or larger in a concentration of 1000 ppm or lower (by weight) or magnetic particles in a concentration of 1000 ppm or lower (by weight). The coarse particles or the magnetic particles are particularly preferable to exist in a concentration of 300 ppm or lower (by weight). Further, by controlling an average value of the specific surface area of the abrasive particles to be within 0.5 to 30 m2/g, the resulting abrasive is provided with a high cutting property and is capable of forming a polished face with high precision. The production method of such cerium-based abrasives comprises control being the concentration of the coarse particles and the classification point and repeated classification. The control of the magnetic particle concentration is made possible by utilization of a filter of a magnetic material and alteration of pulverization media, which are either solely or properly combined with each other to be performed.

摘要翻译： 关于含有氧化铈作为主要成分的氧化铈系研磨剂和平均粒径为0.2〜3.0μm的磨料颗粒，本发明提供了含有浓度为1000的10μm以上的粗颗粒的铈系研磨剂 ppm或更低（重量）或浓度为1000ppm或更低（重量）的磁性颗粒。 粗颗粒或磁性颗粒特别优选以300ppm或更低（重量）的浓度存在。 此外，通过将磨粒的比表面积的平均值控制在0.5〜30m 2 / g以内，所得到的研磨剂具有高切削性，能够以高精度形成研磨面 。 这种铈系研磨剂的制造方法包括粗粒子的浓度和分级点和重复分级的控制。 通过使用磁性材料的过滤器和粉碎介质的改变使得磁性颗粒浓度的控制成为可能，它们彼此单独地或适当地组合以进行。