公开(公告)号：US5938837A

公开(公告)日：1999-08-17

申请号：US719618

申请日：1996-09-25

申请人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda

发明人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda

IPC分类号： C30B7/14 ,  B24C11/00 ,  C01F17/00 ,  C09K3/14 ,  C30B7/00 ,  C30B29/16

CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C09K3/1409 ,  C30B29/16 ,  C30B29/605 ,  C30B7/00 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/50 ,  C01P2004/64

摘要： Cerium oxide ultrafine particles consist essentially of cerium oxide single crystal grains having a grain size ranging from 10 to 80 nm and the cerium oxide ultrafine particles can be prepared by a method which comprises the steps of mixing, with stirring, an aqueous solution of cerous nitrate with a base in such a mixing ratio that the pH value of the mixture ranges from 5 to 10, then rapidly heating the resulting mixture up to a temperature of 70 to 100.degree. C. and maturing the mixture at that temperature. The cerium oxide ultrafine particles not only have an average particle size ranging from 10 to 80 nm, but also are uniform in the particle size and in the shape.

摘要翻译： 氧化铈超微粒子主要由粒度为10〜80nm的氧化铈单晶粒子组成，氧化铈超微粒子可以通过以下方法制备：将搅拌下的硝酸铈水溶液 以这样的混合比例使混合物的pH值达到5至10，然后将所得混合物快速加热至70至100℃的温度，并在该温度下熟化混合物。 氧化铈超微粒子的平均粒径不仅为10〜80nm，而且粒径和形状均匀。

公开(公告)号：US5951724A

公开(公告)日：1999-09-14

申请号：US030803

申请日：1998-02-26

申请人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda ,  Kazuhiko Kato

发明人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda ,  Kazuhiko Kato

IPC分类号： B24B37/00 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y99/00 ,  C01B33/113 ,  C01B33/18 ,  C01F17/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/3105 ,  C01R17/00 ,  H01L21/309

CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1454

摘要： A fine particulate polishing agent comprises fine particles of a solid solution composed of single-crystal ceric oxide and silicon dioxide and fine particles of silicon dioxide. A slurry polishing agent comprising the fine particulate polishing agent can be prepared by a method which comprises the steps of mixing, with stirring, single-crystal ceric oxide fine particles, silica sol and a liquid; drying the mixture; subjecting the dried particulate material to a thermal treatment at a high temperature and then cooling the solid solution powder formed by the thermal treatment and composed of single crystal ceric oxide and silicon dioxide; again mixing the powder with silica sol and a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry.

摘要翻译： 细颗粒抛光剂包括由单晶氧化铈和二氧化硅组成的固溶体的微粒和二氧化硅的微粒。 包含微粒抛光剂的浆料抛光剂可以通过包括以下步骤的方法制备：在搅拌下混合单晶氧化铈细颗粒，二氧化硅溶胶和液体; 干燥混合物; 使干燥的颗粒材料在高温下进行热处理，然后冷却由热处理形成的固溶粉末，并由单晶氧化铈和二氧化硅组成; 再次将粉末与硅溶胶和液体混合; 然后使用湿磨粉碎机对混合物进行解聚，得到浆料。

公开(公告)号：US6159858A

公开(公告)日：2000-12-12

申请号：US884165

申请日：1997-06-27

申请人： Sadahiro Kishii ,  Ko Nakamura ,  Yoshihiro Arimoto ,  Akiyoshi Hatada ,  Rintaro Suzuki ,  Naruo Ueda ,  Kenzo Hanawa

发明人： Sadahiro Kishii ,  Ko Nakamura ,  Yoshihiro Arimoto ,  Akiyoshi Hatada ,  Rintaro Suzuki ,  Naruo Ueda ,  Kenzo Hanawa

IPC分类号： C03C19/00 ,  C09G1/02 ,  C09K3/14 ,  C09K13/04 ,  H01L21/02 ,  H01L21/306 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/302

CPC分类号： C09G1/02 ,  C03C19/00 ,  C09K3/1409 ,  C09K3/1463 ,  C09K3/1472 ,  C09K13/04 ,  H01L21/02065 ,  H01L21/02074 ,  H01L21/31053 ,  H01L21/3212

摘要： A slurry contains MnO.sub.2 or other manganese oxide as a primary component of abrasive particles. Further, a polishing process using such a manganese oxide abrasive and a fabrication process of a semiconductor device using such a polishing process are disclosed.

摘要翻译： 浆料含有MnO 2或其它氧化锰作为磨料颗粒的主要成分。 此外，公开了使用这种氧化锰研磨剂的研磨工艺和使用这种抛光工艺的半导体器件的制造工艺。

公开(公告)号：US5766279A

公开(公告)日：1998-06-16

申请号：US719617

申请日：1996-09-25

申请人： Naruo Ueda ,  Norikazu Yamamoto ,  Kenzo Hanawa ,  Kazuhiko Kato

发明人： Naruo Ueda ,  Norikazu Yamamoto ,  Kenzo Hanawa ,  Kazuhiko Kato

IPC分类号： B24B37/00 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y99/00 ,  C01B33/113 ,  C01F17/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/3105

CPC分类号： H01L21/02024 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/31053

摘要： A fine particulate polishing agent is based on cerium oxide and silicon oxide; a slurry polishing agent comprises the foregoing fine particulate polishing agent which can be prepared by a method which comprises the steps of mixing, with stirring, cerium oxide fine particles, silica sol and a liquid; drying the mixture; mixing the material with a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry. Preferably, the dried particulate material is subjected to a thermal treatment at a high temperature of 150.degree. to 1200.degree. C., preferably 800.degree. to 900.degree. C., thereby to produce a solid solution of cerium oxide and silicon oxide. The slurry polishing agent can ensure the achievement of surface roughness comparable to or superior to that achieved by the colloidal silica polishing agents and a high polishing rate at least comparable to that achieved by the conventional cerium oxide polishing agents.

摘要翻译： 细颗粒抛光剂基于氧化铈和氧化硅; 浆料抛光剂包括上述微粒抛光剂，其可以通过包括以下步骤的方法制备：在搅拌下混合氧化铈细颗粒，硅溶胶和液体; 干燥混合物; 将材料与液体混合; 然后使用湿磨粉碎机对混合物进行解聚，得到浆料。 优选将干燥的颗粒材料在150℃至1200℃，优选800-900℃的高温下进行热处理，从而产生氧化铈和氧化硅的固溶体。 浆料抛光剂可以确保实现与胶体二氧化硅抛光剂相比或优于胶体二氧化硅抛光剂的表面粗糙度，以及与常规二氧化铈抛光剂所达到的至少相当的高抛光速率。