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    Zinc lanthanide sulfonic acid electrolytes
    1.
    发明申请
    Zinc lanthanide sulfonic acid electrolytes 失效
    锌镧系磺酸电解质

    公开(公告)号：US20070051925A1

    公开(公告)日：2007-03-08

    申请号：US10555361

    申请日：2004-05-13

    申请人： Nicholas Martyak ,  Martin Nosowitz

    发明人： Nicholas Martyak ,  Martin Nosowitz

    IPC分类号： H01B1/12

    CPC分类号： H01M8/188 ,  C25D3/02 ,  C25D3/22 ,  C25D3/54 ,  C25D3/565 ,  H01B1/122 ,  H01M6/04 ,  H01M2300/0005 ,  Y02E60/528

    摘要： Disclosed are aqueous solutions for use in high energy, highly efficient electrical energy storage devices. The solutions contain (a) a high purity sulfonic acid with a low concentration of low valent sulfur compounds or higher valent sulfur compounds susceptible to reduction, (b) a metal or metals in an oxidized state that are capable of being reduced to the zero valent oxidation state, (c) a metal that is in an oxidized state that is incapable of being reduced to its metallic state and (d) optionally, a buffering agent and/or conductivity salts.

    摘要翻译： 公开了用于高能量，高效电能存储装置的水溶液。 溶液含有（a）低浓度低价硫化合物的高纯度磺酸或易于还原的高价硫化合物，（b）能够还原成零价金属或氧化态的金属 氧化态，（c）处于不能还原成其金属状态的氧化态的金属和（d）任选的缓冲剂和/或导电盐。

    Generation of organosulfonic acid from its salts
    7.
    发明授权
    Generation of organosulfonic acid from its salts 失效
    从其盐生成有机磺酸

    公开(公告)号：US06187169B1

    公开(公告)日：2001-02-13

    申请号：US09288266

    申请日：1999-04-08

    申请人： Michael D. Gernon ,  Nicholas M. Martyak ,  Martin Nosowitz ,  Gary S. Smith

    发明人： Michael D. Gernon ,  Nicholas M. Martyak ,  Martin Nosowitz ,  Gary S. Smith

    IPC分类号： C25B300

    CPC分类号： C07C303/22 ,  C25B3/00 ,  C07C309/04

    摘要： A procedure for the generation of organosulfonic acids from solutions of corresponding metal organosulfonate compounds by electrowinning, electrolytically driven hydrolysis or chemically driven hydrolysis is described. Appropriate organosulfonate compounds include the water soluble salts of alkanesulfonic and aromatic sulfonic acids which incorporate metals from Group VIB, VIIB, VIIIB, IB, IIB or VA of the periodic table. The electrowinning and electrolytic techniques described can be applied in divided or undivided cells and can be operated in continuous fashion to provide the greatest efficiency. Hydrolysis based methods can employ either anodic oxidation or oxidation both of which function to oxidize the metal cation(s) present to hydrolytically unstable higher oxidation states.

    摘要翻译： 描述了通过电解提取，电解驱动的水解或化学驱动的水解从相应的金属有机磺酸盐化合物的溶液中产生有机磺酸的方法。 合适的有机磺酸酯化合物包括含有元素周期表VIB，VIIB，VIIIB，IB，IIB或VA族金属的烷烃磺酸和芳族磺酸的水溶性盐。 所描述的电解冶金和电解技术可以应用在分开的或不分割的电池中，并且可以以连续的方式操作以提供最大的效率。 基于水解的方法可以采用阳极氧化或氧化两者，其功能是氧化存在的金属阳离子到水解不稳定的较高氧化态。

    Zinc lanthanide sulfonic acid electrolytes
    8.
    发明授权
    Zinc lanthanide sulfonic acid electrolytes 失效
    锌镧系磺酸电解质

    公开(公告)号：US07452486B2

    公开(公告)日：2008-11-18

    申请号：US10555361

    申请日：2004-05-13

    申请人： Nicholas Michael Martyak ,  Martin Nosowitz

    发明人： Nicholas Michael Martyak ,  Martin Nosowitz

    IPC分类号： H01B1/00 ,  H01B1/02 ,  H01M4/02 ,  H01M4/36 ,  H01M4/42

    CPC分类号： H01M8/188 ,  C25D3/02 ,  C25D3/22 ,  C25D3/54 ,  C25D3/565 ,  H01B1/122 ,  H01M6/04 ,  H01M2300/0005 ,  Y02E60/528

    摘要： Disclosed are aqueous solutions for use in high energy, highly efficient electrical energy storage devices. The solutions contain (a) a high purity sulfonic acid with a low concentration of low valent sulfur compounds or higher valent sulfur compounds susceptible to reduction, (b) a metal or metals in an oxidized state that are capable of being reduced to the zero valent oxidation state, (c) a metal that is in an oxidized state that is incapable of being reduced to its metallic state and (d) optionally, a buffering agent and/or conductivity salts.

    摘要翻译： 公开了用于高能量，高效电能存储装置的水溶液。 溶液含有（a）低浓度低价硫化合物的高纯度磺酸或易于还原的高价硫化合物，（b）能够还原成零价金属或氧化态的金属 氧化态，（c）处于不能还原成其金属状态的氧化态的金属和（d）任选的缓冲剂和/或导电盐。

    Composition and method for copper chemical mechanical planarization
    10.
    发明授权
    Composition and method for copper chemical mechanical planarization 失效
    铜化学机械平面化的组成和方法

    公开(公告)号：US06911393B2

    公开(公告)日：2005-06-28

    申请号：US10706178

    申请日：2003-11-12

    申请人： Martin Nosowitz ,  Nicholas M. Martyak ,  Glenn Carroll ,  Patrick K. Janney

    发明人： Martin Nosowitz ,  Nicholas M. Martyak ,  Glenn Carroll ,  Patrick K. Janney

    IPC分类号： C09G1/02 ,  H01L21/321 ,  H01L21/44

    CPC分类号： H01L21/3212 ,  C09G1/02

    摘要： A family of slurries are disclosed which are useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working slurries, and semiconductor wafers. The slurries of the invention are comprised of a liquid carrier; a sulfur-bearing compounds capable of converting copper to copper sulfide; optionally, abrasive particles (polishing agent; optionally a chelating agent; optionally a buffering agent; optionally, a stopping compound; optionally, other additives; and optionally, a co-solvent. The method of the invention comprises the steps of: a) providing a wafer comprising a first material having a surface etched to form a pattern and a second material deposited over the surface of the first material; b) contacting the second material of the wafer with abrasive in the presence of the working slurry; and c) relatively moving the wafer or polishing pad or both while the second material is in contact with the slurry and abrasive particles until an exposed surface of the wafer is planar and comprises at least one area of exposed first material and one area of exposed second material.

    摘要翻译： 公开了可用于修改用于半导体制造的晶片的暴露表面的一系列浆料，以及利用这样一组工作浆料和半导体晶片修改用于半导体制造的晶片的暴露表面的方法。 本发明的浆液由液体载体组成; 能够将铜转化成硫化铜的含硫化合物; 任选地，研磨剂颗粒（抛光剂;任选的螯合剂;任选的缓冲剂;任选地，停止化合物;任选的其它添加剂;以及任选的共溶剂）。本发明的方法包括以下步骤：a） 晶片，其包括具有被蚀刻以形成图案的表面的第一材料和沉积在所述第一材料的表面上的第二材料; b）在工作浆料存在下使晶片的第二材料与研磨剂接触; 以及c）当所述第二材料与所述浆料和所述磨料颗粒接触时，相对移动所述晶片或抛光垫或两者，直到所述晶片的暴露表面是平面的并且包括暴露的第一材料的至少一个区域和暴露的第二材料的一个区域 材料。