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1.发明申请Gas Analyzing System, Lithographic Apparatus and Method of Improving a Sensitivity of a Gas Analyzing System 失效气体分析系统，平版印刷设备和提高气体分析系统灵敏度的方法公开(公告)号：US20100005854A1
公开(公告)日：2010-01-14
申请号：US12500203
申请日：2009-07-09
CPC分类号： G03F7/70916 , G01N1/2273 , G03F7/7085
摘要： A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross-sectional area of the channel section.
摘要翻译： 公开了一种气体分析系统，该系统包括气体分析器和排气室内部的减压室，减压室具有用于气体混合物流入的入口结构和用于气体混合物流出的出口构型， 其中在操作期间的出口构造连接到泵系统以便于气体混合物流出，所述出口构造具有通道部分和流动部分，所述流动部分的横截面积小于截面面积的横截面积 通道部分。
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2.发明申请Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system 失效气体分析系统，光刻设备和提高气体分析系统灵敏度的方法公开(公告)号：US20080128636A1
公开(公告)日：2008-06-05
申请号：US11602496
申请日：2006-11-21
CPC分类号： G03F7/70916 , G01N1/2273 , G03F7/7085
摘要： A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross-sectional area of the channel section.
摘要翻译： 公开了一种气体分析系统，该系统包括气体分析器和排气室内部的减压室，减压室具有用于气体混合物流入的入口结构和用于气体混合物流出的出口构型， 其中在操作期间的出口构造连接到泵系统以便于气体混合物流出，所述出口构造具有通道部分和流动部分，所述流动部分的横截面积小于截面面积的横截面积 通道部分。
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3.发明授权Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system 失效气体分析系统，光刻设备和提高气体分析系统灵敏度的方法公开(公告)号：US07624617B2
公开(公告)日：2009-12-01
申请号：US11602496
申请日：2006-11-21
CPC分类号： G03F7/70916 , G01N1/2273 , G03F7/7085
摘要： A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross-sectional area of the channel section.
摘要翻译： 公开了一种气体分析系统，该系统包括气体分析器和排气室内部的减压室，减压室具有用于气体混合物流入的入口结构和用于气体混合物流出的出口构型， 其中在操作期间的出口构造连接到泵系统以便于气体混合物流出，所述出口构造具有通道部分和流动部分，所述流动部分的横截面积小于截面面积的横截面积 通道部分。
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4.发明授权Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system 失效气体分析系统，光刻设备和提高气体分析系统灵敏度的方法公开(公告)号：US07963144B2
公开(公告)日：2011-06-21
申请号：US12500203
申请日：2009-07-09
CPC分类号： G03F7/70916 , G01N1/2273 , G03F7/7085
摘要： A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross -sectional area of the channel section.
摘要翻译： 公开了一种气体分析系统，该系统包括气体分析器和排气室内部的减压室，减压室具有用于气体混合物流入的入口结构和用于气体混合物流出的出口构型， 其中在操作期间的出口构造连接到泵系统以便于气体混合物流出，所述出口构造具有通道部分和流动部分，所述流动部分的横截面积小于横截面面积的横截面面积 通道部分。
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公开(公告)号：US20110310368A1
公开(公告)日：2011-12-22
申请号：US12996945
申请日：2009-05-20
申请人： Roger Wilhelmus Antonius Henricus Schmitz , Tjarko Adriaan Rudolf Van Empel , Marcel Johannus Elisabeth Hubertus Muitjens , Lun Cheng , Franciscus Johannes Joseph Janssen , William Arie Van Helden , Richard Versluis , Paulus Bartholomeus Johannes Schaareman , Axel Sebastiaan Lexmond , Evert Nieuwkoop , Charles William Barras Potts , Martinus Henricus Johannes Lemmen , Frederik Van Der Graaf , Mathilde Gertrudis Maria De Kroon , Johannes Fransiscus Maria Velthuis
发明人： Roger Wilhelmus Antonius Henricus Schmitz , Tjarko Adriaan Rudolf Van Empel , Marcel Johannus Elisabeth Hubertus Muitjens , Lun Cheng , Franciscus Johannes Joseph Janssen , William Arie Van Helden , Richard Versluis , Paulus Bartholomeus Johannes Schaareman , Axel Sebastiaan Lexmond , Evert Nieuwkoop , Charles William Barras Potts , Martinus Henricus Johannes Lemmen , Frederik Van Der Graaf , Mathilde Gertrudis Maria De Kroon , Johannes Fransiscus Maria Velthuis
CPC分类号： G03F7/70891 , G02B7/008 , G03F7/70875 , G03F7/709 , G03F7/70983 , G21K2201/067
摘要： A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.
摘要翻译： 用于热调节光学元件的方法包括用辐射照射光学元件，不用辐射照射光学元件，允许光学元件和保持在调节液体储存器中的调节流体之间的热流动，并且提供流体 调节流体的流动，以将热调节的流体供应到储存器。 在光学元件的照射期间，流体的流量比不照射光学元件时的流体的流量低。
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公开(公告)号：US09176398B2
公开(公告)日：2015-11-03
申请号：US12996945
申请日：2009-05-20
申请人： Roger Wilhelmus Antonius Henricus Schmitz , Tjarko Adriaan Rudolf Van Empel , Marcel Johannus Elisabeth Hubertus Muitjens , Lun Cheng , Franciscus Johannes Joseph Janssen , Willem Arie Van Helden , Richard Versluis , Paulus Bartholomeus Johannes Schaareman , Axel Sebastiaan Lexmond , Evert Nieuwkoop , Charles William Barras Potts , Martinus Henricus Johannes Lemmen , Frederik Van Der Graaf , Mathilde Gertrudis Maria De Kroon , Johannes Fransiscus Maria Velthuis
发明人： Roger Wilhelmus Antonius Henricus Schmitz , Tjarko Adriaan Rudolf Van Empel , Marcel Johannus Elisabeth Hubertus Muitjens , Lun Cheng , Franciscus Johannes Joseph Janssen , Willem Arie Van Helden , Richard Versluis , Paulus Bartholomeus Johannes Schaareman , Axel Sebastiaan Lexmond , Evert Nieuwkoop , Charles William Barras Potts , Martinus Henricus Johannes Lemmen , Frederik Van Der Graaf , Mathilde Gertrudis Maria De Kroon , Johannes Fransiscus Maria Velthuis
CPC分类号： G03F7/70891 , G02B7/008 , G03F7/70875 , G03F7/709 , G03F7/70983 , G21K2201/067
摘要： A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.
摘要翻译： 用于热调节光学元件的方法包括用辐射照射光学元件，不用辐射照射光学元件，允许光学元件和保持在调节液体储存器中的调节流体之间的热流动，并且提供流体 调节流体的流动，以将热调节的流体供应到储存器。 在光学元件的照射期间，流体的流量比不照射光学元件时的流体的流量低。
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公开(公告)号：US08382301B2
公开(公告)日：2013-02-26
申请号：US12403233
申请日：2009-03-12
申请人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
发明人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
CPC分类号： G03B27/16 , B82Y10/00 , G03F7/70841 , G03F7/70883 , G03F7/70916 , G21K2201/061
摘要： An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
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