公开(公告)号：US08182977B2

公开(公告)日：2012-05-22

申请号：US12729244

申请日：2010-03-23

申请人： Norihiko Ikeda ,  Hiromitsu Nakashima ,  Saki Harada

发明人： Norihiko Ikeda ,  Hiromitsu Nakashima ,  Saki Harada

IPC分类号： G03F7/004 ,  C08F220/26

CPC分类号： C08F224/00 ,  C08F220/26 ,  C08F220/28 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.

摘要翻译： 聚合物包括由下式（a-1）表示的重复单元（a-1），由下式（a-2）表示的重复单元（a-2）和约 1000至约100,000，其中R0表示具有1至5个碳原子的烷基，其中至少一个氢原子被羟基取代，R1表示氢原子，甲基或三氟甲基，其中R1表示 氢原子，甲基或三氟甲基，R 2表示碳原子数1〜4的烷基，R 3表示碳原子数1〜4的烷基，取代或未取代的1〜4价的环状烃基， 碳原子或碳原子数为4〜20的二价环状烃基与碳原子一起形成。

公开(公告)号：US20110223537A1

公开(公告)日：2011-09-15

申请号：US13044573

申请日：2011-03-10

申请人： Takuma Ebata ,  Hiroki Nakagawa ,  Yasuhiko Matsuda ,  Kazuki Kasahara ,  Kenji Hoshiko ,  Hiromitsu Nakashima ,  Norihiko Ikeda ,  Kaori Sakai ,  Saki Harada

发明人： Takuma Ebata ,  Hiroki Nakagawa ,  Yasuhiko Matsuda ,  Kazuki Kasahara ,  Kenji Hoshiko ,  Hiromitsu Nakashima ,  Norihiko Ikeda ,  Kaori Sakai ,  Saki Harada

IPC分类号： G03F7/004 ,  C08F34/02

CPC分类号： C08F20/28 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0397 ,  G03F7/2041

摘要： A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a′), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.

摘要翻译： 辐射敏感性树脂组合物包括聚合物，光致酸发生剂和酸扩散控制剂。 聚合物包括由下式（a-1）表示的第一重复单元。 酸扩散控制器包括由下式（C-1）表示的碱和可光降解碱中的至少一种，其中每个R 1表示氢原子等，R表示由上式（a' ），各R 19表示碳原子数为1〜5的链状烃基等，A表示碳原子数1〜30的二价链状烃基等，m和n为0〜3的整数（m + n = 1至3），其中R 2和R 3各自表示具有1至20个碳原子的一价链烃基等。

公开(公告)号：US20100239981A1

公开(公告)日：2010-09-23

申请号：US12729244

申请日：2010-03-23

申请人： Norihiko IKEDA ,  Hiromitsu Nakashima ,  Saki Harada

发明人： Norihiko IKEDA ,  Hiromitsu Nakashima ,  Saki Harada

IPC分类号： G03F7/004 ,  C08F220/26 ,  C08F224/00

CPC分类号： C08F224/00 ,  C08F220/26 ,  C08F220/28 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.

摘要翻译： 聚合物包括由下式（a-1）表示的重复单元（a-1），由下式（a-2）表示的重复单元（a-2）和约 1000至约100,000，其中R0表示具有1至5个碳原子的烷基，其中至少一个氢原子被羟基取代，R1表示氢原子，甲基或三氟甲基，其中R1表示 氢原子，甲基或三氟甲基，R 2表示碳原子数1〜4的烷基，R 3表示碳原子数1〜4的烷基，取代或未取代的1〜4价的环状烃基， 碳原子或碳原子数为4〜20的二价环状烃基与碳原子一起形成。

公开(公告)号：US08728706B2

公开(公告)日：2014-05-20

申请号：US13420618

申请日：2012-03-15

申请人： Yuusuke Asano ,  Mitsuo Satou ,  Hiromitsu Nakashima ,  Kazuki Kasahara ,  Yoshifumi Oizumi ,  Masafumi Hori ,  Takanori Kawakami ,  Yasuhiko Matsuda ,  Kazuo Nakahara

发明人： Yuusuke Asano ,  Mitsuo Satou ,  Hiromitsu Nakashima ,  Kazuki Kasahara ,  Yoshifumi Oizumi ,  Masafumi Hori ,  Takanori Kawakami ,  Yasuhiko Matsuda ,  Kazuo Nakahara

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0392 ,  C08F20/22 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32

摘要： A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1. -A-R1  (x)

摘要翻译： 辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。 第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或 亚砜基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

公开(公告)号：US20100040974A1

公开(公告)日：2010-02-18

申请号：US12442377

申请日：2007-09-21

申请人： Daita Kouno ,  Hiromitsu Nakashima ,  Yukio Nishimura

发明人： Daita Kouno ,  Hiromitsu Nakashima ,  Yukio Nishimura

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/095 ,  G03F7/11 ,  G03F7/2041 ,  H01L21/0276

摘要： An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a compound having a sulfonic acid residue group, the composition forming an upper layer film with a receding contact angle to water of 70° or more. The upper layer film forming composition of the present invention can form an upper layer film which has a sufficient transparency and is stably maintained without eluting the components into a medium without being intermixed with a photoresist film, can form a resist pattern with high resolution while effectively suppressing a defect, and can suppress a blob defect.

摘要翻译： 在光致抗蚀剂膜的表面上形成上层膜的上层成膜组合物包括（A）可溶于光致抗蚀剂膜的显影剂中的树脂和（B）具有磺酸残基的化合物，该组合物形成 上层膜与水的后退接触角为70°以上。 本发明的上层成膜组合物可以形成具有足够透明度且稳定保持的上层膜，而不将组分洗脱到介质中而不与光致抗蚀剂膜混合，可以有效地形成高分辨率的抗蚀剂图案 抑制缺陷，能够抑制斑点缺陷。

公开(公告)号：US20100021852A1

公开(公告)日：2010-01-28

申请号：US12445152

申请日：2007-10-11

申请人： Yukio Nishimura ,  Norihiko Sugie ,  Hiromitsu Nakashima ,  Norihiro Natsume ,  Daita Kouno

发明人： Yukio Nishimura ,  Norihiko Sugie ,  Hiromitsu Nakashima ,  Norihiro Natsume ,  Daita Kouno

IPC分类号： G03F7/00 ,  C09D133/04

CPC分类号： G03F7/11 ,  G03F7/2041

摘要： A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and a resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1). [In the general formulas (1-1) and (1-2), R1 is hydrogen or the like; R2 is single bonds or the like; and R3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.

摘要翻译： 一种用于形成上层膜的组合物，其用于在光致抗蚀剂膜的表面上形成上层膜，并且其包含具有由以下通式（1-1）表示的重复单元的树脂（A），而不包含 具有由以下通式（1-2）表示的重复单元和具有由以下通式（1-2）表示的重复单元并且不具有由以下通式表示的重复单元的树脂（B） 1-1）。 [通式（1-1）和（1-2）中，R 1为氢等， R2是单键等; R3是具有1〜12个碳原子的氟取代的直链或支链烷基等。]组合物可以形成具有足够高的后退接触角的上层膜。

公开(公告)号：US20090053649A1

公开(公告)日：2009-02-26

申请号：US11579646

申请日：2005-05-02

申请人： Hiromitsu Nakashima ,  Tomohiro Utaka ,  Takashi Chiba ,  Eiji Yoneda ,  Atsushi Nakamura

发明人： Hiromitsu Nakashima ,  Tomohiro Utaka ,  Takashi Chiba ,  Eiji Yoneda ,  Atsushi Nakamura

IPC分类号： G03F7/004 ,  C08F24/00

CPC分类号： C08F220/28 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided.The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1). The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.

摘要翻译： 作为具有对于线间距图案和隔离空间图案的宽焦点（DOF）的宽灵敏度，分辨率等的抗蚀剂的基本性能优异的辐射敏感性树脂组合物， 由于烘烤温度的波动引起的线宽变化最小，并且具有不发生线型破坏现象的小线宽限制，并且提供可用作该组合物的树脂成分的含内酯共聚物。 含有内酯的共聚物由以下化合物（1-1），（2-1）和（3-1）的共聚物表示。 辐射敏感性树脂组合物包含（a）含内酯共聚物和（b）光酸产生剂。

公开(公告)号：US09598520B2

公开(公告)日：2017-03-21

申请号：US13473957

申请日：2012-05-17

申请人： Yuko Kiridoshi ,  Takehiko Naruoka ,  Yukio Nishimura ,  Yusuke Asano ,  Takanori Kawakami ,  Hiromitsu Nakashima

发明人： Yuko Kiridoshi ,  Takehiko Naruoka ,  Yukio Nishimura ,  Yusuke Asano ,  Takanori Kawakami ,  Hiromitsu Nakashima

IPC分类号： G03F7/004 ,  G03F7/38 ,  C08F220/24 ,  C08F228/00 ,  C08F220/22 ,  C08L33/14 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20

CPC分类号： C08F220/22 ,  C08F220/24 ,  C08F228/00 ,  C08L33/14 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  C08L101/00

摘要： A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.

公开(公告)号：US08435718B2

公开(公告)日：2013-05-07

申请号：US13272501

申请日：2011-10-13

申请人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

发明人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/11 ,  G03F7/40

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/30 ,  G03F7/0046 ,  G03F7/2041

摘要： An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group. R1—O—R2  (1)

摘要翻译： 上层形成组合物包括树脂和溶剂。 该树脂可溶于用于由上层形成组合物覆盖以形成通过辐射照射的图案的光致抗蚀剂膜的显影剂。 溶剂溶解在溶剂中的树脂。 溶剂包括由式（1）表示的化合物。 R 1和R 2各自独立地表示碳原子数1〜8的烃基或卤代烃基。 R1-O-R2（1）

公开(公告)号：US20090202945A1

公开(公告)日：2009-08-13

申请号：US12294386

申请日：2007-03-23

申请人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

发明人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

IPC分类号： G03F7/039 ,  C08F20/22

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

摘要翻译： 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。