公开(公告)号：US09404183B2

公开(公告)日：2016-08-02

申请号：US13912256

申请日：2013-06-07

Applicant: Novellus Systems, Inc.

Inventor： Edward Augustyniak ,  Douglas Keil

IPC: H01J37/32 ,  C23C16/52 ,  H01L21/67 ,  C23C16/509

CPC classification number: C23C16/505 ,  C23C16/45565 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32128 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32266 ,  H01J37/32917 ,  H01J37/32926 ,  H01J2237/3321 ,  H01L21/67011

Abstract: A substrate processing system includes a processing chamber including a showerhead, a plasma power source and a pedestal spaced from the showerhead to support a substrate. A filter is connected between the showerhead and the pedestal. A variable bleed current circuit is connected between the filter and the pedestal to vary a bleed current. A controller is configured to adjust a value of the bleed current and configured to perform curve fitting based on the bleed current and DC self-bias voltage to estimate at least one of electrode area ratio, Bohm current, and radio frequency (RF) voltage at a powered electrode.

Abstract translation: 衬底处理系统包括处理室，其包括喷头，等离子体动力源和与喷头间隔开以支撑衬底的基座。 过滤器连接在喷头和底座之间。 滤波器和基座之间连接有可变放电电流电路，以改变放电电流。 控制器被配置为调整渗流电流的值，并且被配置为基于渗流电流和直流自偏压来进行曲线拟合，以估计电极面积比，波峰电流和射频（RF）电压中的至少一个 电源电极。

公开(公告)号：US20160326650A1

公开(公告)日：2016-11-10

申请号：US15193885

申请日：2016-06-27

Applicant: Novellus Systems, Inc.

Inventor： Edward Augustyniak ,  Douglas Keil

IPC: C23C16/505 ,  H01J37/32 ,  C23C16/455 ,  C23C16/52

CPC classification number: C23C16/505 ,  C23C16/45565 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32128 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32266 ,  H01J37/32917 ,  H01J37/32926 ,  H01J2237/3321 ,  H01L21/67011

Abstract: A substrate processing system includes a processing chamber including a showerhead, a plasma power source and a pedestal spaced from the showerhead to support a substrate. A filter is connected between the showerhead and the pedestal. A variable bleed current circuit is connected between the filter and the pedestal to vary a bleed current. A controller is configured to adjust a value of the bleed current and configured to perform curve fitting based on the bleed current and DC self-bias voltage to estimate at least one of electrode area ratio, Bohm current, and radio frequency (RF) voltage at a powered electrode.

公开(公告)号：US11725282B2

公开(公告)日：2023-08-15

申请号：US17445562

申请日：2021-08-20

Applicant: Novellus Systems, Inc.

Inventor： Chunguang Xia ,  Ramesh Chandrasekharan ,  Douglas Keil ,  Edward J. Augustyniak ,  Karl Frederick Leeser

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/509 ,  H01J37/32

CPC classification number: C23C16/45565 ,  C23C16/4401 ,  C23C16/4558 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/45591 ,  C23C16/5096 ,  H01J37/3244

Abstract: A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

公开(公告)号：US20210381106A1

公开(公告)日：2021-12-09

申请号：US17445562

申请日：2021-08-20

Applicant: Novellus Systems, Inc.

Inventor： Chunguang Xia ,  Ramesh Chandrasekharan ,  Douglas Keil ,  Edward J. Augustyniak ,  Karl Frederick Leeser

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/509 ,  H01J37/32

Abstract: A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

公开(公告)号：US10378109B2

公开(公告)日：2019-08-13

申请号：US15193885

申请日：2016-06-27

Applicant: Novellus Systems, Inc.

Inventor： Edward Augustyniak ,  Douglas Keil

IPC: H01J37/32 ,  C23C16/505 ,  C23C16/52 ,  H01L21/67 ,  C23C16/509 ,  C23C16/455

Abstract: A substrate processing system includes a processing chamber including a showerhead, a plasma power source and a pedestal spaced from the showerhead to support a substrate. A filter is connected between the showerhead and the pedestal. A variable bleed current circuit is connected between the filter and the pedestal to vary a bleed current. A controller is configured to adjust a value of the bleed current and configured to perform curve fitting based on the bleed current and DC self-bias voltage to estimate at least one of electrode area ratio, Bohm current, and radio frequency (RF) voltage at a powered electrode.

公开(公告)号：US20160289832A1

公开(公告)日：2016-10-06

申请号：US15177548

申请日：2016-06-09

Applicant: Novellus Systems, Inc

Inventor： Chunguang Xia ,  Ramesh Chandrasekharan ,  Douglas Keil ,  Edward J. Augustyniak ,  Karl Leeser

IPC: C23C16/455

CPC classification number: C23C16/45565 ,  C23C16/4401 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/4558 ,  C23C16/45591 ,  C23C16/5096 ,  H01J37/3244

Abstract: A substrate processing system includes a showerhead that comprises a base portion and a stem portion and that delivers precursor gas to a chamber. A collar connects the showerhead to an upper surface of the chamber. The collar includes a plurality of slots, is arranged around the stem portion of the showerhead, and directs purge gas through the plurality of slots into a region between the base portion of the showerhead and the upper surface of the chamber.

公开(公告)号：US09388494B2

公开(公告)日：2016-07-12

申请号：US13659231

申请日：2012-10-24

Applicant: Novellus Systems, Inc.

Inventor： Chunguang Xia ,  Ramesh Chandrasekharan ,  Douglas Keil ,  Edward J. Augustyniak ,  Karl Leeser

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/509 ,  H01J37/32

CPC classification number: C23C16/45565 ,  C23C16/4401 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/4558 ,  C23C16/45591 ,  C23C16/5096 ,  H01J37/3244

Abstract: A substrate processing system includes a showerhead that comprises a base portion and a stem portion and that delivers precursor gas to a chamber. A collar connects the showerhead to an upper surface of the chamber. The collar includes a plurality of slots, is arranged around the stem portion of the showerhead, and directs purge gas through the plurality of slots into a region between the base portion of the showerhead and the upper surface of the chamber.

Abstract translation: 衬底处理系统包括喷头，其包括基部和杆部分，并将前体气体输送到室。 衣领将花洒连接到房间的上表面。 所述套环包括多个槽，围绕所述喷头的所述杆部分布置，并且将吹扫气体引导通过所述多个狭槽进入所述喷头的基部与所述室的所述上表面之间的区域中。

公开(公告)号：US20130327272A1

公开(公告)日：2013-12-12

申请号：US13912256

申请日：2013-06-07

Applicant: Novellus Systems, Inc.

Inventor： Edward Augustyniak ,  Douglas Keil

IPC: C23C16/52 ,  H01L21/67

CPC classification number: C23C16/505 ,  C23C16/45565 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32128 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32266 ,  H01J37/32917 ,  H01J37/32926 ,  H01J2237/3321 ,  H01L21/67011

Abstract: A substrate processing system includes a processing chamber including a showerhead, a plasma power source and a pedestal spaced from the showerhead to support a substrate. A filter is connected between the showerhead and the pedestal. A variable bleed current circuit is connected between the filter and the pedestal to vary a bleed current. A controller is configured to adjust a value of the bleed current and configured to perform curve fitting based on the bleed current and DC self-bias voltage to estimate at least one of electrode area ratio, Bohm current, and radio frequency (RF) voltage at a powered electrode.

Abstract translation: 衬底处理系统包括处理室，其包括喷头，等离子体动力源和与喷头间隔开以支撑衬底的基座。 过滤器连接在喷头和底座之间。 滤波器和基座之间连接有可变放电电流电路，以改变放电电流。 控制器被配置为调整渗流电流的值，并且被配置为基于渗流电流和直流自偏压来进行曲线拟合，以估计电极面积比，波峰电流和射频（RF）电压中的至少一个 电源电极。