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1.发明申请CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD 有权充电颗粒光束绘图装置和充电颗粒光束绘图方法公开(公告)号：US20140319373A1
公开(公告)日：2014-10-30
申请号：US14258371
申请日：2014-04-22
IPC分类号： H01J37/30
CPC分类号： H01J37/3002 , H01J37/18 , H01L21/02 , H01L21/67115 , H01L21/6719 , H01L21/67207 , H01L21/67213
摘要： A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable of switching an atmosphere state and a vacuum state, a transfer chamber arranged so as to be able to communicate with the load lock chamber and transferring the target object, a soaking chamber arranged so as to be able to communicate with the transfer chamber and having a temperature adjustment container for housing the target object therein and controlling a temperature of the target object with radiation and a temperature adjustment part for controlling a temperature of the temperature adjustment container, and a drawing chamber arranged so as to be able to communicate with the transfer chamber and drawing on the target object at a constant temperature.
摘要翻译： 根据本发明的一个实施例的带电粒子束描绘装置包括：负载锁定室，用于从外部引入目标物体并且能够切换气氛状态和真空状态，传送室被布置成能够 与负载锁定室连通并传送目标物体，均热室布置成能够与传送室连通并具有用于将目标物体容纳在其中的温度调节容器，并用辐射控制目标物体的温度， 用于控制温度调节容器的温度的温度调节部件和布置成能够与传送室连通并在恒定温度下对目标物体进行拉伸的拉伸室。
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2.发明授权Charged particle beam drawing apparatus and charged particle beam drawing method 有权带电粒子束拉制装置和带电粒子束拉制法公开(公告)号：US08987683B2
公开(公告)日：2015-03-24
申请号：US14258371
申请日：2014-04-22
CPC分类号： H01J37/3002 , H01J37/18 , H01L21/02 , H01L21/67115 , H01L21/6719 , H01L21/67207 , H01L21/67213
摘要： A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable of switching an atmosphere state and a vacuum state, a transfer chamber arranged so as to be able to communicate with the load lock chamber and transferring the target object, a soaking chamber arranged so as to be able to communicate with the transfer chamber and having a temperature adjustment container for housing the target object therein and controlling a temperature of the target object with radiation and a temperature adjustment part for controlling a temperature of the temperature adjustment container, and a drawing chamber arranged so as to be able to communicate with the transfer chamber and drawing on the target object at a constant temperature.
摘要翻译： 根据本发明的一个实施例的带电粒子束描绘装置包括：负载锁定室，用于从外部引入目标物体并且能够切换气氛状态和真空状态，传送室被布置成能够 与负载锁定室连通并传送目标物体，均热室布置成能够与传送室连通并具有用于将目标物体容纳在其中的温度调节容器，并用辐射控制目标物体的温度， 用于控制温度调节容器的温度的温度调节部件和布置成能够与传送室连通并在恒定温度下对目标物体进行拉伸的拉伸室。
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公开(公告)号：US10373793B2
公开(公告)日：2019-08-06
申请号：US15687886
申请日：2017-08-28
IPC分类号： H01R4/68 , H01J37/02 , H01J37/317 , H01R4/2406 , H01R4/66
摘要： A conductive contact point pin includes a pin body, and a plurality of convex portions formed in a tip portion of the pin body, wherein the conductive contact point pin breaks, by pressing a substrate where a film to be broken is formed on a conductive film from above the film to be broken, the film to be broken in order to be electrically connected to the conductive film.
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公开(公告)号：US10607810B2
公开(公告)日：2020-03-31
申请号：US16237775
申请日：2019-01-02
发明人： Michihiro Kawaguchi , Kiminobu Akeno , Kiyoshi Nakaso , Keita Ideno , Shintaro Yamamoto , Keisuke Goto , Hitoshi Matsushita , Hirokazu Yoshioka , Ryouta Inoue , Yuuki Fukuda
IPC分类号： H01J37/244 , H01J37/317 , H01J37/06
摘要： The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively.
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公开(公告)号：US20180068824A1
公开(公告)日：2018-03-08
申请号：US15687886
申请日：2017-08-28
IPC分类号： H01J37/02 , H01J37/317 , H01R4/66
CPC分类号： H01J37/026 , H01J37/3174 , H01R4/2406 , H01R4/66
摘要： A conductive contact point pin includes a pin body, and a plurality of convex portions formed in a tip portion of the pin body, wherein the conductive contact point pin breaks, by pressing a substrate where a film to be broken is formed on a conductive film from above the film to be broken, the film to be broken in order to be electrically connected to the conductive film.
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公开(公告)号：US11266999B2
公开(公告)日：2022-03-08
申请号：US16177615
申请日：2018-11-01
发明人： Yosuke Takahashi , Yuji Abe , Kiminobu Akeno
摘要： According to one embodiment, a dust-collecting apparatus includes a main body with a first surface on which a back surface of a first electrode is disposed; a fixing unit configured to control attachment and detachment of the first electrode and the main body; a second electrode configured to transfer a voltage to the first electrode; and a control board configured to control a magnitude and a timing of a voltage which is applied to the second electrode.
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公开(公告)号：US11049688B2
公开(公告)日：2021-06-29
申请号：US16586254
申请日：2019-09-27
发明人： Michihiro Kawaguchi , Kiminobu Akeno , Keita Ideno , Kota Iwasaki , Keisuke Goto , Kiyoshi Nakaso , Shintaro Yamamoto , Hitoshi Matsushita , Ryota Inoue , Yuki Fukuda
IPC分类号： H01J37/244 , H01J37/02 , H01J37/26 , H05H7/00
摘要： A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.
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公开(公告)号：US20190214224A1
公开(公告)日：2019-07-11
申请号：US16237775
申请日：2019-01-02
发明人： Michihiro Kawaguchi , Kiminobu Akeno , Kiyoshi Nakaso , Keita Ideno , Shintaro Yamamoto , Keisuke Goto , Hitoshi Matsushita , Hirokazu Yoshioka , Ryouta Inoue , Yuuki Fukuda
IPC分类号： H01J37/244 , H01J37/317 , H01J37/06
CPC分类号： H01J37/244 , H01J37/06 , H01J37/3174 , H01J2237/0216 , H01J2237/20264
摘要： The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively.
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9.发明授权Charged particle beam writing apparatus and charged particle beam writing method 有权带电粒子束写入装置和带电粒子束写入方法公开(公告)号：US08847178B2
公开(公告)日：2014-09-30
申请号：US13625231
申请日：2012-09-24
CPC分类号： G21K5/08 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F9/7096 , H01J37/3045 , H01J37/3174 , H01J2237/2007 , H01J2237/204 , H01L21/00
摘要： A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.
摘要翻译： 根据本发明的一个方面的带电粒子束写入装置包括：基板盖安装/拆卸单元，用于将覆盖作为书写目标的基板的整个周边的基板盖从上部附接到所述基板盖 基板，写入单元，以基板盖子附着于基板的状态，通过带电粒子束，位置测量单元，在写入单元写入之前和之后，在基板上写入图案，以测量位置 在相对于与基板盖相连接的基板的位置上的预定测量位置处的基板覆盖物的状态和校正单元，校正位于基板盖的位置之间的位置偏差量 写入后测量的基板盖和写入前测量的基板盖的位置。
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