METHOD FOR PRODUCING OPTOELECTRONIC SEMICONDUCTOR DEVICES AND OPTOELECTRONIC SEMICONDUCTOR DEVICE
    1.
    发明申请
    METHOD FOR PRODUCING OPTOELECTRONIC SEMICONDUCTOR DEVICES AND OPTOELECTRONIC SEMICONDUCTOR DEVICE 审中-公开
    用于生产光电半导体器件和光电半导体器件的方法

    公开(公告)号:US20170005079A1

    公开(公告)日:2017-01-05

    申请号:US15113749

    申请日:2015-01-21

    Abstract: A method for producing a plurality of optoelectronic semiconductor components (100) is provided, comprising the following steps: a) providing an auxiliary carrier (2); b) providing a plurality of semiconductor chips (10), wherein each of the semiconductor chips has a carrier body (12) and a semiconductor body (4) arranged on an upper side (22) of the carrier body; c) attaching the plurality of semiconductor chips on the auxiliary carrier, wherein the semiconductor chips are spaced apart from one another in a lateral direction (L) and wherein the semiconductor bodies are facing the auxiliary carrier, as seen from the carrier body; d) forming a scattering layer (18), at least in regions between the semiconductor bodies of adjacent semiconductor chips; e) forming a composite package (20); f) removing the auxiliary carrier (2); and g) individually separating the composite package into a plurality of optoelectronic semiconductor components (100).

    Abstract translation: 提供了一种用于制造多个光电子半导体部件(100)的方法,包括以下步骤:a)提供辅助载体(2); b)提供多个半导体芯片(10),其中每个半导体芯片具有布置在载体主体的上侧(22)上的载体主体(12)和半导体本体(4) c)将多个半导体芯片附接在辅助载体上,其中半导体芯片在横向(L)上彼此间隔开,并且其中半导体主体面向辅助载体,如从载体主体所见; d)至少在相邻半导体芯片的半导体主体之间的区域中形成散射层(18); e)形成复合包装(20); f)拆下辅助载体(2); 以及g)将所述复合封装单独地分离成多个光电子半导体部件(100)。

    Optoelectronic Component And Method For The Production Thereof
    2.
    发明申请
    Optoelectronic Component And Method For The Production Thereof 有权
    光电元件及其制作方法

    公开(公告)号:US20160111594A1

    公开(公告)日:2016-04-21

    申请号:US14889316

    申请日:2014-05-12

    CPC classification number: H01L33/10 H01L33/005 H01L33/04 H01L33/06 H01L33/08

    Abstract: An optoelectronic device (10, 1010) having a semiconductor layer structure (100, 1100) comprising a first light-active layer (140) and a second light-active layer (240). A first tunnel junction (200) is formed between the first light-active layer (140) and the second light-active layer (240). A first Bragg reflector (160) is formed between the first light-active layer (140) and the first tunnel junction (200). A second Bragg reflector (260) is formed between the second light-active layer (240) and the first tunnel junction (200).

    Abstract translation: 具有包括第一光活性层(140)和第二光活性层(240)的半导体层结构(100,1100)的光电子器件(10,1010)。 在第一光活性层(140)和第二光活性层(240)之间形成第一隧道结(200)。 第一布拉格反射器(160)形成在第一光活性层(140)和第一隧道结(200)之间。 第二布拉格反射器(260)形成在第二光活性层(240)和第一隧道结(200)之间。

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