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    Lithographic apparatus and motor for use in the apparatus
    3.
    发明授权
    Lithographic apparatus and motor for use in the apparatus 有权
    用于设备的平版印刷设备和电机

    公开(公告)号：US06717296B2

    公开(公告)日：2004-04-06

    申请号：US10222975

    申请日：2002-08-19

    申请人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Angelo Oscar Peter De Klerk ,  Harmen Klaas Van Der Schoot

    发明人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Angelo Oscar Peter De Klerk ,  Harmen Klaas Van Der Schoot

    IPC分类号： H02K41035

    CPC分类号： G03F7/70758 ,  H02K41/0356 ,  Y10S414/135

    摘要： A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.

    摘要翻译： 洛伦兹致动器在装置的第一部分和第二部分之间提供力，包括附接到装置的第一部分并提供第一磁场的主磁体系统; 辅助磁体系统，附接到第一部分并且以Halbach配置布置，提供第二磁场; 以及导电元件，其附接到所述设备的第二部分并且布置成通过所述导电元件承载的电流与所述第一和第二元件的组合相互作用而在所述设备的所述第一和第二部分之间产生力 磁场。

    Lithographic apparatus and motor for use in the apparatus
    5.
    发明授权
    Lithographic apparatus and motor for use in the apparatus 有权
    用于设备的平版印刷设备和电机

    公开(公告)号：US06943464B2

    公开(公告)日：2005-09-13

    申请号：US10740576

    申请日：2003-12-22

    申请人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Angelo Cesar Peter De Klerk ,  Harmen Klaas Van Der Schoot

    发明人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Angelo Cesar Peter De Klerk ,  Harmen Klaas Van Der Schoot

    IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H02K41/03 ,  H02K41/035

    CPC分类号： G03F7/70758 ,  H02K41/0356 ,  Y10S414/135

    摘要： A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.

    摘要翻译： 洛伦兹致动器在装置的第一部分和第二部分之间提供力，包括附接到装置的第一部分并提供第一磁场的主磁体系统; 辅助磁体系统，附接到第一部分并且以Halbach配置布置，提供第二磁场; 以及导电元件，其附接到所述设备的第二部分并且布置成通过所述导电元件承载的电流与所述第一和第二元件的组合相互作用而在所述设备的所述第一和第二部分之间产生力 磁场。

    Lithographic apparatus and device manufacturing method
    6.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07256866B2

    公开(公告)日：2007-08-14

    申请号：US10961391

    申请日：2004-10-12

    申请人： Henrikus Herman Marie Cox ,  Hans Butler ,  Ronald Casper Kunst ,  Harmen Klaas Van Der Schoot ,  Youssef Karel Maria De Vos

    发明人： Henrikus Herman Marie Cox ,  Hans Butler ,  Ronald Casper Kunst ,  Harmen Klaas Van Der Schoot ,  Youssef Karel Maria De Vos

    IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/70725

    摘要： To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.

    摘要翻译： 为了实现光刻设备的图形支撑件或基板台的高加速度和高移动速度，图案支撑件和基板台之一由用于较大位移的致动器支撑，而省略了用于精确定位的致动器。 图案支撑件和衬底台中的另一个由包括用于精确定位的致动器和用于相对较大位移的致动器的致动器组件支撑。 图案形成装置和基板的对准精度通过提供一种控制系统来实现，该控制系统适于将图案支撑件和基板台中的另一个定位成使得图案支撑件和基板台之一的定位误差为 通过另一个的定位来补偿。

    Lithographic apparatus and device manufacturing method
    7.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07492440B2

    公开(公告)日：2009-02-17

    申请号：US10936712

    申请日：2004-09-09

    申请人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

    发明人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

    IPC分类号： G02B27/52 ,  G02B27/42 ,  H02K41/00

    CPC分类号： G03F7/70716 ,  G03F7/709

    摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

    摘要翻译： 在光刻设备中使用的基板或图案形成装置以及光刻装置的制造方法。 衬底和图案形成装置相对于图案化束对准并且由支撑件可移动地支撑。 然而，所述支撑件中的共振可能使制造的装置不可用和/或可能使控制系统复杂化。 因此，具有耦合到支撑件的柔性耦合装置的致动器组件框架设置有多个致动器，其构造成以多个自由度移动支撑件。 因此，谐振被柔性耦合装置阻尼，导致用于控制系统的较大带宽，从而使得支撑件具有更好的位置精度。