公开(公告)号：US09086626B2

公开(公告)日：2015-07-21

申请号：US14007671

申请日：2012-03-28

申请人： Peng-Fei Fu ,  Eric S. Moyer ,  Jason Suhr

发明人： Peng-Fei Fu ,  Eric S. Moyer ,  Jason Suhr

IPC分类号： G03F7/075

CPC分类号： G03F7/0757

摘要： A coatable resin solution capable of forming a coating when applied to the surface of a substrate that is photo-patternable and developable as a dielectric material upon exposure to ultraviolet radiation is provided. The resin solution comprises a silsequioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ-based resin includes both a hydride component and at least one photo-curable component. The resulting coating exhibits a dielectric constant that is less than or equal to about 3.5.

摘要翻译： 提供了一种可涂覆的树脂溶液，当涂布在基材的表面上时，其可以在曝光于紫外线照射下作为电介质材料可光刻图形显影。 树脂溶液包含基于硅氧烷的（SSQ）树脂，至少一种引发剂和有机溶剂。 SSQ型树脂包括氢化物组分和至少一种可光固化组分。 所得涂层的介电常数小于或等于约3.5。

公开(公告)号：US20140023970A1

公开(公告)日：2014-01-23

申请号：US14007671

申请日：2012-03-28

申请人： Peng-Fei Fu ,  Eric S. Moyer ,  Jason Suhr

发明人： Peng-Fei Fu ,  Eric S. Moyer ,  Jason Suhr

IPC分类号： G03F7/075

CPC分类号： G03F7/0757

摘要： A coatable resin solution capable of forming a coating when applied to the surface of a substrate that is photo-patternable and developable as a dielectric material upon exposure to ultraviolet radiation is provided. The resin solution comprises a silsequioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ-based resin includes both a hydride component and at least one photo-curable component. The resulting coating exhibits a dielectric constant that is less than or equal to about 3.5.

摘要翻译： 提供了一种可涂覆的树脂溶液，当涂布在基材的表面上时，其可以在曝光于紫外线照射下作为电介质材料可光刻图形显影。 树脂溶液包含基于硅氧烷的（SSQ）树脂，至少一种引发剂和有机溶剂。 SSQ型树脂包括氢化物组分和至少一种可光固化组分。 所得涂层的介电常数小于或等于约3.5。

公开(公告)号：US20110236837A1

公开(公告)日：2011-09-29

申请号：US13133175

申请日：2009-10-19

申请人： Peng-Fei Fu ,  Eric Moyer ,  Jason Suhr

发明人： Peng-Fei Fu ,  Eric Moyer ,  Jason Suhr

IPC分类号： G03F7/20 ,  F21V9/00 ,  B05D5/06

CPC分类号： C09D183/04 ,  C08G77/14 ,  C08G77/18 ,  G02B1/111

摘要： An antireflective coating compositions comprising (I) a silsesquioxane resin (II) a compound selected from photo-acid generators and thermal acid generators; and (III) a solvent wherein in the silsesquioxane resin contains a carboxylic acid forming group or a sulfuric acid forming group.

摘要翻译： 一种抗反射涂料组合物，其包含（I）倍半硅氧烷树脂（II）选自光酸产生剂和热酸发生剂的化合物; 和（III）溶剂，其中在倍半硅氧烷树脂中含有羧酸形成基团或形成硫酸的基团。

公开(公告)号：US08507179B2

公开(公告)日：2013-08-13

申请号：US13133175

申请日：2009-10-19

申请人： Peng-Fei Fu ,  Eric Moyer ,  Jason Suhr

发明人： Peng-Fei Fu ,  Eric Moyer ,  Jason Suhr

IPC分类号： G03F7/00 ,  G03F7/11

CPC分类号： C09D183/04 ,  C08G77/14 ,  C08G77/18 ,  G02B1/111

摘要： An antireflective coating compositions comprising (I) a silsesquioxane resin (II) a compound selected from photo-acid generators and thermal acid generators; and (III) a solvent wherein in the silsesquioxane resin contains a carboxylic acid forming group or a sulfuric acid forming group.

摘要翻译： 一种抗反射涂料组合物，其包含（I）倍半硅氧烷树脂（II）选自光酸产生剂和热酸发生剂的化合物; 和（III）溶剂，其中在倍半硅氧烷树脂中含有羧酸形成基团或形成硫酸的基团。

公开(公告)号：US20080273561A1

公开(公告)日：2008-11-06

申请号：US11666813

申请日：2005-02-22

申请人： Peng-Fei Fu ,  Eric Scott Moyer ,  Craig Rollin Yeakle

发明人： Peng-Fei Fu ,  Eric Scott Moyer ,  Craig Rollin Yeakle

IPC分类号： H01S3/04

CPC分类号： H01S5/02415 ,  C09D183/04 ,  G03F7/0757 ,  G03F7/091 ,  H01S5/0612

摘要： A system and method of minimizing the amount of power that is used by an optoelectronic module is disclosed. The system uses a thermoelectric cooler (TEC) to maintain a case temperature of the module at about 50° C. This allows the TEC to operate in the much more efficient heating mode, thus minimizing the amount of current being used to maintain the module temperature. The method includes the steps of determining a temperature range and operating temperature for an optoelectronic module, such that a maximum current level is not exceeded. In one exemplary embodiment, an operating temperature of about 50° C. with a temperature range of from about −5° C. to about 75° C. allows a maximum current of about 300 mA.

摘要翻译： 公开了一种使由光电子模块使用的功率最小化的系统和方法。 该系统使用热电冷却器（TEC）将模块的外壳温度保持在约50°C。这允许TEC以更有效的加热模式运行，从而最小化用于维持模块温度的电流量 。 该方法包括确定光电子模块的温度范围和工作温度的步骤，使得不超过最大电流水平。 在一个示例性实施例中，温度范围为约-5℃至约75℃的约50℃的操作温度允许约300mA的最大电流。

公开(公告)号：US20080014335A1

公开(公告)日：2008-01-17

申请号：US11666822

申请日：2005-09-29

申请人： Peng-Fei Fu ,  Eric Moyer ,  Craig Yeakle

发明人： Peng-Fei Fu ,  Eric Moyer ,  Craig Yeakle

IPC分类号： B05D5/12 ,  C07F7/18

CPC分类号： C09D183/04 ,  G03F7/0757 ,  G03F7/091

摘要： A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OH)x)m HSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p where Ph is a phenyl group, Me is a methyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95, p has a value of 0.05 to 0.95, and m+n+p≈1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.

摘要翻译： 一种在电子设备上形成抗反射涂层的方法，包括：（A）向电子器件施加ARC组合物，其包含（i）具有式的线性公式描述=“在线公式”的倍半硅氧烷树脂= （3-x）/ 2（OH）x（x）x（x）x（x） （OH）x（x）x（x）x（x）x（x） 其中Ph是苯基，Me是甲基，x具有一个或多个基团， 值为0，1或2; m的值为0.05〜0.95，n为0.05〜0.95，p为0.05〜0.95，m + n +p≈1; 和（ii）溶剂; 和（B）除去溶剂并固化倍半硅氧烷树脂以在电子器件上形成抗反射涂层。

公开(公告)号：US5578690A

公开(公告)日：1996-11-26

申请号：US431521

申请日：1995-04-28

申请人： Tobin J. Marks ,  Peng-Fei Fu

发明人： Tobin J. Marks ,  Peng-Fei Fu

IPC分类号： C08F2/38 ,  C08F4/605 ,  C08F4/619 ,  C08F4/6192 ,  C08F4/74 ,  C08F8/00 ,  C08F10/00 ,  C08F10/02 ,  C08F12/00 ,  C08F110/02 ,  C08F212/00 ,  C08G77/08 ,  C08G77/12 ,  C08F210/16

CPC分类号： C08F10/00 ,  C08F10/02 ,  C08F110/02 ,  C08F4/61908 ,  C08F4/61912 ,  C08F4/61922 ,  Y10S526/943

摘要： There is disclosed a method for synthesizing polyolefins having a silyl group at one terminus, said method comprising reacting(A) a monomer selected from the group consisting of ethylene and a combination of ethylene and an .alpha.-olefin; and(B) a silane having the formulaR.sup.2 R.sup.3 R.sup.4 SiH wherein R.sup.2, R.sup.3 and R.sup.4 each represents a monovalent group selected from the group consisting of hydrogen, alkyl having 1 to 4 carbon atoms, aryl, alkylaryl, arylalkyl, alkoxy having 1-4 carbon atoms, phenoxy, fluorinated alkyl having 3 to 6 carbon atoms, a dialkylamino group in which the alkyl groups contain 1 to 4 carbon atoms and a diorganopolysiloxane chain containing 1 to 10 siloxane units, said reaction taking place in the presence of(C) a catalyst comprising a metallocene compound.

摘要翻译： 公开了一端合成具有甲硅烷基的聚烯烃的方法，所述方法包括使（A）选自乙烯和乙烯与α-烯烃的组合的单体反应; 和（B）具有式R 2 R 3 R 4 SiH的硅烷，其中R 2，R 3和R 4各自表示选自氢，具有1至4个碳原子的烷基，芳基，烷基芳基，芳基烷基，具有1-4个碳原子的烷氧基的一价基团， 苯氧基，具有3至6个碳原子的氟化烷基，其中烷基含有1至4个碳原子的二烷基氨基和含有1至10个硅氧烷单元的二有机聚硅氧烷链，所述反应在（C）催化剂存在下进行，所述催化剂包含 茂金属化合物。

公开(公告)号：US20120118856A1

公开(公告)日：2012-05-17

申请号：US13386510

申请日：2010-06-22

申请人： Peng-Fei Fu ,  Eric Scott Moyer ,  Jason D. Suhr

发明人： Peng-Fei Fu ,  Eric Scott Moyer ,  Jason D. Suhr

IPC分类号： B29C67/00

CPC分类号： H01L21/3122 ,  C08G77/12 ,  C08G77/14 ,  C09D183/06 ,  G03F7/405 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/0337

摘要： A silsesquioxane resin is applied over the patterned photo-resist and cured at the pattern surface to produce a cured silsesquioxane resin on the pattern surface. The uncured silsesquioxane resin layer is then removed leaving the cured silsesquioxane resin on the pattern surface. The cured silsesquioxane resin on horizontal surfaces is removed to expose the underlying photo-resist. This photo-resist is removed leaving a pattern of cured silsesquioxane. Optionally, the new pattern can be transferred into the underlying layer(s).

摘要翻译： 在图案化的光刻胶上施加倍半硅氧烷树脂并在图案表面固化，以在图案表面上产生固化的倍半硅氧烷树脂。 然后除去未固化的倍半硅氧烷树脂层，留下固化的倍半硅氧烷树脂在图案表面上。 去除水平表面上固化的倍半硅氧烷树脂以暴露下面的光致抗蚀剂。 去除该光刻胶，留下固化的倍半硅氧烷的图案。 可选地，新图案可以被转移到下层中。

公开(公告)号：US20110236835A1

公开(公告)日：2011-09-29

申请号：US13133050

申请日：2009-10-19

申请人： Peng-Fei Fu ,  Moyer Eric ,  Craig Yeakle

发明人： Peng-Fei Fu ,  Moyer Eric ,  Craig Yeakle

IPC分类号： G03F7/20 ,  B05D5/12

CPC分类号： C09D183/06 ,  C08G77/04 ,  C08G77/14 ,  G03F7/0752 ,  G03F7/091

摘要： Antireflective coatings produced from silsesquioxane resin comprises the units (Ph(CH2)rSiO(3-x)/2(OR′)x)m (HSiO(3-x)/2(OR′)x)n (MeSiO(3-x)/2(OR′)x)o (RSiO(3-x)/2(OR′)x)p (R1SiO(3-x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a carboxylic acid group or a carboxylic acid forming group with the proviso that there is a sufficient amount of carboxylic acid groups to make the resin wet etchable after cure; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, sulfur-containing organic functional groups, hydroxyl producing group, aryl sulphonic ester groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.90; n has a value of 0.05 to 0.99; o has a value of 0 to 0.95; p has a value of 0.01 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q≈1.

摘要翻译： 由倍半硅氧烷树脂制备的抗反射涂层包括单元（Ph（CH2）rSiO（3-x）/ 2（OR'）x）m（HSiO（3-x）/ 2（OR'）x）n（MeSiO x）/ 2（OR'）x）o（RSiO（3-x）/ 2（OR'）x）p（R1SiO（3-x）/ 2（OR'）x）q其中Ph是苯基， 我是甲基; R'是氢原子或具有1至4个碳原子的烃基; R选自羧酸基团或羧酸形成基团，条件是存在足够量的羧酸基团以使树脂在固化后可湿法蚀刻; 并且R 1选自取代的苯基，酯基，聚醚基团; 巯基，含硫有机官能团，羟基产生基团，芳基磺酸酯基团和反应性或可固化的有机官能团; 并且r的值为0,1,2,3或4; x的值为0,1或2; 其中在树脂中m为0至0.90; n的值为0.05〜0.99; o的值为0〜0.95; p的值为0.01〜0.5; q的值为0〜0.5; 和m + n + o + p +q≈1。

公开(公告)号：US20110233489A1

公开(公告)日：2011-09-29

申请号：US13133032

申请日：2009-10-19

申请人： Peng-Fei Fu ,  Eric Moyer ,  Craig Yeakle

发明人： Peng-Fei Fu ,  Eric Moyer ,  Craig Yeakle

IPC分类号： C08G77/12 ,  C08G77/06 ,  C08G77/445 ,  C09D5/00

CPC分类号： C08G77/14 ,  C08G77/04 ,  C08G77/12 ,  C09D183/06 ,  G03F7/0752 ,  G03F7/091

摘要： This invention pertains to silsesquioxane resins useful in antireflective coatings wherein the silsesquioxane resin comprises the units (Ph(CH2)rSiO(3-x)/2(OR′)x)m(HSiO(3-x)/2(OR′)x)n (MeSiO(3-x)/2(OR′)x)c, (RSiO(3-x)/2(OR′)x)p (R1SiO(3-x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a carboxylic acid group, a carboxylic acid forming group, and mixtures thereof; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, sulfur-containing organic functional groups, hydroxyl producing group, aryl sulphonic ester groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.90; n has a value of 0.05 to 0.99; o has a value of 0 to 0.95; p has a value of 0.01 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q≈1.

摘要翻译： 本发明涉及可用于抗反射涂料的倍半硅氧烷树脂，其中倍半硅氧烷树脂包含单元（Ph（CH 2）r SiO（3-x）/ 2（OR'）x）m（HSiO（3-x）/ 2（OR' x）n（MeSiO（3-x）/ 2（OR'）x）c，（RSiO（3-x）/ 2（OR'）x）p（R 1 SiO（3-x）/ 2（OR' ）q其中Ph是苯基，Me是甲基; R'是氢原子或具有1至4个碳原子的烃基; R选自羧酸基团，羧酸形成基团及其混合物; 并且R 1选自取代的苯基，酯基，聚醚基团; 巯基，含硫有机官能团，羟基产生基团，芳基磺酸酯基团和反应性或可固化的有机官能团; 并且r的值为0,1,2,3或4; x的值为0,1或2; 其中在树脂中m为0至0.90; n的值为0.05〜0.99; o的值为0〜0.95; p的值为0.01〜0.5; q的值为0〜0.5; 和m + n + o + p +q≈1。