公开(公告)号：US06660659B1

公开(公告)日：2003-12-09

申请号：US10170925

申请日：2002-06-12

申请人： Philip Allan Kraus ,  Thai Cheng Chua ,  John Holland ,  James P. Cruse

发明人： Philip Allan Kraus ,  Thai Cheng Chua ,  John Holland ,  James P. Cruse

IPC分类号： H01L2131

CPC分类号： H01L21/0234 ,  H01J37/321 ,  H01L21/02332 ,  H01L21/3144 ,  H01L21/3185

摘要： According to one aspect of the invention, a method is provided of processing a substrate, including locating the substrate in a processing chamber, creating a nitrogen plasma in the chamber, the plasma having an ion density of at least 1010 cm−3, and a potential of less than 20 V, and exposing a layer on the substrate to the plasma to incorporate nitrogen of the plasma into the layer.

摘要翻译： 根据本发明的一个方面，提供了一种处理衬底的方法，包括将衬底定位在处理室中，在腔室中产生氮等离子体，等离子体具有至少10cm -1的离子密度， 3>，并且电位低于20V，并将衬底上的层暴露于等离子体以将等离子体的氮引入层中。

公开(公告)号：US06831021B2

公开(公告)日：2004-12-14

申请号：US10461083

申请日：2003-06-12

申请人： Tal Cheng Chua ,  Philip Allan Kraus ,  John Holland

发明人： Tal Cheng Chua ,  Philip Allan Kraus ,  John Holland

IPC分类号： H01L21469

CPC分类号： H01L21/28202 ,  H01J37/321 ,  H01L21/3144 ,  H01L21/3185

摘要： Embodiments of the invention generally provide a method of forming a nitride gate dielectric layer. The method includes generating a nitrogen-containing plasma in a processing chamber via introduction of a nitrogen-containing processing gas into the processing chamber and the application of an ionizing energy to the processing gas, and pulsing the ionizing energy to maintain a mean temperature of electrons in the nitrogen-containing plasma of less than about 0.7 eV.

摘要翻译： 本发明的实施例通常提供形成氮化物栅极电介质层的方法。 该方法包括通过在处理室中引入含氮处理气体和向处理气体中施加电离能，并且使电离能脉冲以维持电子的平均温度，从而在处理室中产生含氮等离子体 在含氮等离子体中小于约0.7eV。

公开(公告)号：US20100198101A1

公开(公告)日：2010-08-05

申请号：US12679730

申请日：2008-09-24

申请人： Xubo Song ,  Martin Fuss ,  K. Jeffrey Eriksen ,  Deniz Erdogmus ,  Mark Deffebach ,  Darryl Kaurin ,  John Holland ,  John Fitchen

发明人： Xubo Song ,  Martin Fuss ,  K. Jeffrey Eriksen ,  Deniz Erdogmus ,  Mark Deffebach ,  Darryl Kaurin ,  John Holland ,  John Fitchen

IPC分类号： A61B5/053

CPC分类号： A61N5/103 ,  A61B5/0536 ,  A61B5/0871 ,  A61B5/091 ,  A61N5/1037 ,  A61N5/1049 ,  A61N2005/1051 ,  A61N2005/1059

摘要： Embodiments herein provide a non-invasive tracking system that accurately predicts the location of tumors, such as lung tumors, in real time, while allowing patients to breathe naturally. This is accomplished by using Electrical Impedance Tomography (EIT), in conjunction with spirometry, strain gauge and infrared sensors, and by using sophisticated patient-specific mathematical models that incorporate the dynamics of tumor motion. With the direction and speed of lung tumor movement successfully tracked, radiation may be effectively delivered to the lung tumor and not to the surrounding healthy tissue, thus increased radiation dosage may be directed to improving local tumor control without compromising functional parenchyma.

摘要翻译： 本文的实施例提供了一种非侵入式跟踪系统，其可以实时准确预测肿瘤（例如肺肿瘤）的位置，同时允许患者自然呼吸。 这通过使用电阻抗层析成像（EIT）与肺量计，应变计和红外传感器结合使用，并通过使用结合肿瘤运动动力学的复杂的患者特定数学模型来实现。 随着肺肿瘤移动的方向和速度的顺利跟踪，辐射可以有效地传递到肺肿瘤而不是周围的健康组织，因此增加的辐射剂量可以用于改善局部肿瘤的控制而不损害功能实质。

公开(公告)号：USD587612S1

公开(公告)日：2009-03-03

申请号：US29327455

申请日：2008-11-06

申请人： Alden M. Mills ,  Mark B. Friedman ,  John Holland ,  Kevan Hollenback ,  Stephen G. Hauser

设计人： Alden M. Mills ,  Mark B. Friedman ,  John Holland ,  Kevan Hollenback ,  Stephen G. Hauser

公开(公告)号：US07422122B2

公开(公告)日：2008-09-09

申请号：US11334298

申请日：2006-01-19

申请人： John Holland

发明人： John Holland

IPC分类号： A47F7/00

CPC分类号： A63B71/0036 ,  A63B71/0045 ,  A63B2102/22 ,  A63B2102/24

摘要： The invention is a rack holding hockey sticks and other sporting equipment. The base is comprised of a member to which is attached at right angles another two members on opposite sides and a post rising vertically from the point of attachment. A second vertical member slides over the first vertical member. Near the top of the second vertical member are attached two members. Attached to these two members are two additional members at right angles. To each of those members are attached a plurality of other members at right angles projecting outwards. There are two additional members attached lower on the second vertical member. Each of these members have an additional member attached at right angles and a plurality of members attached to such member at right angles, which members extend inwards towards the vertical member.

摘要翻译： 本发明是一种搁置曲棍球棒和其他运动器材的机架。 底座由一个构件组成，在该构件上以直角连接两个相对侧的两个构件，以及从安装点垂直上升的柱。 第二垂直构件在第一垂直构件上滑动。 靠近第二垂直构件的顶部附有两个构件。 这两名成员的附属成员是两个成员。 对于这些构件中的每一个，以向外突出的直角附接多个其它构件。 在第二垂直构件上附加有两个附加构件。 这些构件中的每一个具有直角连接的附加构件，并且多个构件以直角附接到该构件，该构件向着垂直构件向内延伸。

公开(公告)号：US20070258186A1

公开(公告)日：2007-11-08

申请号：US11740869

申请日：2007-04-26

申请人： Alexander Matyushkin ,  Dennis Koosau ,  Theodoros Panagopoulos ,  John Holland

发明人： Alexander Matyushkin ,  Dennis Koosau ,  Theodoros Panagopoulos ,  John Holland

IPC分类号： H01T23/00

CPC分类号： H01L21/6831 ,  H01L21/67109 ,  H01L21/6875 ,  Y10T279/23

摘要： An electrostatic chuck for receiving a substrate in a substrate processing chamber comprises a ceramic puck having a substrate receiving surface and an opposing backside surface with a plurality of spaced apart mesas. An electrode is embedded in the ceramic puck to generate an electrostatic force to hold a substrate. Heater coils located at peripheral and central portions of the ceramic puck allow independent control of temperatures of the central and peripheral portions of the ceramic puck. The chuck is supported by a base having a groove with retained air. The chuck and base can also have an overlying edge ring and clamp ring.

摘要翻译： 用于在衬底处理室中接收衬底的静电吸盘包括具有衬底接收表面的陶瓷圆盘和具有多个间隔开的台面的相对的背面。 将电极嵌入陶瓷盘中以产生静电力以保持基板。 位于陶瓷圆盘的周边部分和中心部分的加热线圈允许独立地控制陶瓷盘的中心部分和周边部分的温度。 卡盘由具有保留空气的凹槽的基座支撑。 卡盘和底座也可以有一个上覆边缘环和夹环。

公开(公告)号：US20070245961A1

公开(公告)日：2007-10-25

申请号：US11410781

申请日：2006-04-24

申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

IPC分类号： C23C16/00

CPC分类号： H01J37/32174 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32165

摘要： A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, simultaneously (a) capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer, and (b) inductively coupling RF plasma source power into the process region, and controlling dissociation of species in the process region by controlling the effective frequency of the VHF source power. In a preferred embodiment, the step of coupling VHF source power is performed by coupling VHF source power from different generators having different VHF frequencies, and the step of controlling the effective frequency is performed by controlling the ratio of power coupled by the different generators.

摘要翻译： 在等离子体反应器的腔室中处理工件的方法包括将工艺气体引入到腔室中，同时（a）将VHF等离子体源功率电容耦合到覆盖在晶片上的腔室的工艺区域中，以及（b）电感耦合 RF等离子体源功率进入过程区域，并通过控制VHF源功率的有效频率来控制处理区域中物种的离解。 在优选实施例中，通过耦合具有不同VHF频率的不同发生器的VHF源功率来执行耦合VHF源功率的步骤，并且通过控制由不同发生器耦合的功率比来执行控制有效频率的步骤。

公开(公告)号：US20070079936A1

公开(公告)日：2007-04-12

申请号：US11445559

申请日：2006-06-02

申请人： Maocheng Li ,  John Holland ,  Patrick Leahey ,  Xueyu Qian ,  Michael Barnes ,  Jon Clinton ,  You Wang ,  Nianci Han

发明人： Maocheng Li ,  John Holland ,  Patrick Leahey ,  Xueyu Qian ,  Michael Barnes ,  Jon Clinton ,  You Wang ,  Nianci Han

IPC分类号： B31B1/60 ,  C23F1/00 ,  C23C16/00

CPC分类号： H01P1/08 ,  B32B2315/02 ,  C04B35/63452 ,  C04B37/003 ,  C04B37/005 ,  C04B37/008 ,  C04B2237/10 ,  C04B2237/34 ,  C04B2237/341 ,  C04B2237/343 ,  C04B2237/708 ,  H01J37/32082 ,  Y10T156/10

摘要： A bonded multi-layer RF window may include an external layer of dielectric material having desired thermal properties, an internal layer of dielectric material exposed to plasma inside a reaction chamber, and an intermediate layer of bonding material between the external layer and the internal layer. Heat produced by the chemical reaction inside the chamber and by the transmission of RF energy through the window may be conducted from the internal layer to the external layer, which may be cooled during a semiconductor wafer manufacturing process. A bonded multi-layer RF window may include cooling conduits for circulating coolant to facilitate cooling of the internal layer; additionally or alternatively, gas distribution conduits and gas injection apertures may be included for delivering one or more process gases into a reaction chamber. A system including a plasma reaction chamber may employ the inventive bonded multi-layer RF window.

摘要翻译： 键合的多层RF窗可以包括具有期望的热性质的外部介电材料层，暴露于反应室内的等离子体的介电材料的内部层，以及外层和内层之间的接合材料的中间层。 通过室内的化学反应和通过窗口的RF能量传递产生的热量可以从内层传导到外层，其可在半导体晶片制造过程中被冷却。 粘合的多层RF窗可以包括用于循环冷却剂以便于冷却内层的冷却管道; 另外或替代地，可以包括气体分配管道和气体注入孔，用于将一个或多个处理气体输送到反应室中。 包括等离子体反应室的系统可以采用本发明的结合的多层RF窗口。

公开(公告)号：US20060204560A1

公开(公告)日：2006-09-14

申请号：US11433607

申请日：2006-05-15

申请人： Alexander Walacavage ,  John Holland

发明人： Alexander Walacavage ,  John Holland

IPC分类号： A61K31/718 ,  A61L15/00

CPC分类号： A61K31/00 ,  A61K31/717 ,  A61L15/28 ,  C08L3/02

摘要： A hydrophilic pliable wound dressing consisting of biopolymers creates a new approach to wound dressing by providing a self-assembling hydrophilic gel type moisture permeable barrier applicable to a wide range of wound sizes and depths. Biodegradability and water solubility enable rapid and safe disposal, obviating a significant problem that occurs with conventional type dressings. The initial sheet form of the dressing provides an ideal carrier for delivery of nutrients, debriders, antibiotics, analgesics and physiological regulators.

摘要翻译： 由生物聚合物组成的亲水性韧性伤口敷料通过提供适用于各种伤口尺寸和深度的自组装亲水性凝胶型透湿屏障，创造了一种新的伤口敷料方法。 生物降解性和水溶性使得能够快速和安全地处理，消除常规类型敷料发生的重大问题。 敷料的初始片剂形式为营养物，脱盐剂，抗生素，止痛剂和生理调节剂的输送提供了理想的载体。

公开(公告)号：US20060076109A1

公开(公告)日：2006-04-13

申请号：US11246012

申请日：2005-10-07

申请人： John Holland ,  Theodoros Panagopoulos

发明人： John Holland ,  Theodoros Panagopoulos

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00 ,  H01L21/00

CPC分类号： H01L21/67248 ,  H01L21/67103 ,  H01L21/6831 ,  Y10T279/23

摘要： A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes an electrostatic chuck coupled to a metallic base. The electrostatic chuck includes at least one chucking electrode and metallic base includes at least two fluidly isolated conduit loops disposed therein. In another embodiment, the pedestal assembly includes a support member that is coupled to a base by a material layer. The material layer has at least two regions having different coefficients of thermal conductivity. In another embodiment, the support member is an electrostatic chuck. In further embodiments, a pedestal assembly has channels formed between the base and support member for providing cooling gas in proximity to the material layer to further control heat transfer between the support member and the base, thereby controlling the temperature profile of a substrate disposed on the support member.

摘要翻译： 提供了一种用于在处理期间控制基板的温度的基座组件和方法。 在一个实施例中，基座组件包括联接到金属基座的静电卡盘。 静电吸盘包括至少一个夹紧电极和金属底座，其包括设置在其中的至少两个流体隔离的导管环。 在另一个实施例中，基座组件包括通过材料层联接到基座的支撑构件。 材料层具有至少两个具有不同导热系数的区域。 在另一个实施例中，支撑构件是静电卡盘。 在另外的实施例中，基座组件具有形成在基部和支撑构件之间的通道，用于在材料层附近提供冷却气体，以进一步控制支撑构件和基座之间的热传递，由此控制设置在基座上的基板的温度分布 支持会员