Method for forming light guide layer in semiconductor substrate
    3.
    发明授权
    Method for forming light guide layer in semiconductor substrate 有权
    在半导体衬底中形成导光层的方法

    公开(公告)号:US08546162B2

    公开(公告)日:2013-10-01

    申请号:US13243763

    申请日:2011-09-23

    IPC分类号: H01L21/00

    CPC分类号: G02B6/138 G02B6/136

    摘要: A method for forming a light guide layer with improved transmission reliability in a semiconductor substrate, the method including forming a trench in the semiconductor substrate, forming a cladding layer and a preliminary light guide layer in the trench such that only one of opposite side end portions of the preliminary light guide layer is in contact with an inner sidewall of the trench, and performing a thermal treatment on the substrate to change the preliminary light guide layer into the light guide layer.

    摘要翻译: 一种在半导体衬底中形成具有改善的透射可靠性的导光层的方法,所述方法包括在所述半导体衬底中形成沟槽,在所述沟槽中形成包覆层和预备导光层,使得只有一个相对侧端部 所述预备光导层与所述沟槽的内侧壁接触,并对所述基板进行热处理,以将所述初步导光层改变为所述导光层。