公开(公告)号：US5370765A

公开(公告)日：1994-12-06

申请号：US48744

申请日：1993-04-16

Applicant: Raphael A. Dandl

Inventor： Raphael A. Dandl

IPC: H01J37/32 ,  H05H1/18 ,  H05H1/00

CPC classification number: H05H1/18 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32678 ,  H01J2237/3323 ,  H01J2237/3345

Abstract: A method and apparatus are disclosed employing electron cyclotron resonant (ECR) heating to produce plasma for applications including but not limited to chemical vapor deposition and etching. A magnetic field is formed by magnets circumferentially arranged about a cylindrical and symmetrical chamber with microwave power injected perpendicularly to a longitudinal axis of the chamber for preventing line-of-sight communication of resulting energetic electrons with a specimen being treated. The microwave power is distributed uniformly around the circumference of the chamber by applicators formed by one or more pairs of annular sectors, each of which comprises a slotted wave guide antenna, and coupled to an external source of microwave power by a hybrid coupler. A magnetic field free region produces uniformity of plasma distribution in a plasma stream approaching the outlet. The above characteristics are maintained for the plasma stream over substantial transverse dimensions larger than the specimen. A rectilinear applicator array is also disclosed for selected applications.

Abstract translation: 公开了一种利用电子回旋共振（ECR）加热产生用于包括但不限于化学气相沉积和蚀刻的等离子体的方法和装置。 磁场由围绕圆柱形和对称的室周围布置的磁体形成，微波功率垂直于腔室的纵向轴线注入，用于防止所得到的能量电子与待处理样品的视线通信。 微波功率通过由一对或多对环形扇区形成的施加器均匀地分布在腔室的圆周上，每个环形扇区包括槽形波导天线，并通过混合耦合器耦合到外部的微波功率源。 无磁场区域在等离子流中接近出口产生均匀的等离子体分布。 在大于样品的大的横向尺寸上，维持上述等离子体流的特性。 还公开了用于所选应用的直线施加器阵列。

公开(公告)号：US5133826A

公开(公告)日：1992-07-28

申请号：US320947

申请日：1989-03-09

Applicant: Raphael A. Dandl

Inventor： Raphael A. Dandl

IPC: H01L21/205 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/18 ,  H05H1/46

CPC classification number: H01J37/32229 ,  H01J37/32192 ,  H01J37/32678 ,  H05H1/18 ,  H01J2237/3323 ,  H01J2237/3345

Abstract: A method and apparatus are disclosed employing electron cyclotron resonant (ECR) heating to produce plasma for applications including but not limited to chemical vapor deposition and etching. A magnetic field is formed by magnets circumferentially arranged about a cylindrical and symmetrical chamber with microwave power injected perpendicularly to a longitudinal axis of the chamber for preventing line-of-sight communication of resulting energetic electrons through an outlet at one axial end of the chamber. The circumferential magnets in the symmetrical chamber cause precessing of the electrons resulting in greatly increased plasma density and ion flux or current density even at low gas pressures which are preferably maintained for establishing unidirectionality or anisotropic plasma characteristics. A magnetic field free region is formed between the plasma forming region containing the microwave power source and the circumferential magnets in order to also produce uniformity of plasma distribution in a plasma stream approaching the outlet. Thus, with specimens aranged in communication with the outlet, the above characteristics are maintained for the plasma stream over substantial transverse dimensions larger than the specimen.

Abstract translation: 公开了一种利用电子回旋共振（ECR）加热产生用于包括但不限于化学气相沉积和蚀刻的等离子体的方法和装置。 磁场由围绕圆柱形和对称的室围绕圆周布置的磁体形成，微波功率垂直于室的纵向轴线注入，用于防止所产生的高能电子通过腔的一个轴向端处的出口的视线连通。 对称室中的圆周磁体引起电子的进动，即使在低气体压力下也能大大增加等离子体密度和离子通量或电流密度，优选维持该电极用于建立单向性或各向异性等离子体特性。 在包含微波功率源的等离子体形成区域和圆周磁体之间形成无磁场区域，以便在接近出口的等离子体流中产生等离子体分布的均匀性。 因此，对于与出口连通的样品，在大于样品的大的横向尺寸上维持等离子体流的上述特性。

公开(公告)号：US06873113B2

公开(公告)日：2005-03-29

申请号：US10268970

申请日：2002-10-11

Applicant: Raphael A. Dandl ,  Bill H. Quon

Inventor： Raphael A. Dandl ,  Bill H. Quon

IPC: H01J41/20 ,  F04B37/02

CPC classification number: H01J41/20

Abstract: A stand-alone plasma vacuum pump for pumping gas from a low-pressure inlet to a high-pressure outlet, composed of: a housing enclosing one or more pumping regions located between the inlet and the outlet; a plurality of permanent magnet assemblies providing magnetic fields that extend in the pumping region between the inlet and the outlet, the magnetic field forming magnetic flux channels for guiding and confining plasmas; elements disposed for coupling microwave power into the flux channels to heat electrons, ionize gas, and accelerate plasma ions in a direction from the inlet to the outlet; elements disposed for creating an electric in the magnetic flux channels to accelerate ions in the flux channels toward the outlet by momentum transfer; and a differential conductance baffle proximate to the outlet for promoting flow of plasma ions and neutral atoms to the outlet.

Abstract translation: 一种独立的等离子体真空泵，用于将气体从低压入口泵送到高压出口，所述等离子体真空泵由围绕位于入口和出口之间的一个或多个泵送区域的外壳组成; 多个永磁体组件，其提供在入口和出口之间的泵送区域中延伸的磁场，形成用于引导和限制等离子体的磁通通道的磁场; 用于将微波功率耦合到通量通道中以加热电子，离子化气体并在从入口到出口的方向加速等离子体离子的元件; 被设置用于在磁通量通道中产生电的元件，以通过动量传递将通量通道中的离子加速到出口; 以及靠近出口的差动电导挡板，用于促进等离子体离子和中性原子流到出口。

公开(公告)号：US5975014A

公开(公告)日：1999-11-02

申请号：US5480

申请日：1998-01-12

Applicant: Raphael A. Dandl

Inventor： Raphael A. Dandl

IPC: H05H1/46 ,  C23C14/34 ,  C23C16/50 ,  C23C16/511 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00 ,  H01L21/00

CPC classification number: H01J37/32229 ,  H01J37/32192 ,  H01J37/3222 ,  H01J37/32247 ,  H01J37/32678 ,  H01J37/32688

Abstract: A method and apparatus employing a microwave applicator for use with an ECR plasma source for applications including etching and chemical vapor deposition is provided. A magnetic field is generated by magnets circumferentially arranged about a chamber that is symmetrical about its longitudinal axis. The microwave applicator, which comprises at least one pair of coaxial resonant multiport microwave antenna arrays, injects and distributes microwave power about a plasma forming portion of the chamber. The antenna arrays include a plurality of radiating stubs for radiating microwave power. The stubs are positioned along the arrays at predetermined intervals and selected orientations relative to a coaxial transmission line, for efficiently distributing microwave power uniformly about the plasma forming portion. The position and orientation of the radiating stubs cause microwave power to be launched into the plasma in the form of propagating electromagnetic waves with a polarization suitable for electron cyclotron heating. The applicator is coupled to a microwave power source that preferably supplies microwave power at a frequency of 2.45 GHz. A magnetic-field free region produces uniformity of plasma distribution in a plasma stream that approaches an outlet in the chamber. The plasma stream flows through the plasma forming region toward the specimen with characteristics of high density, uniformity over transverse dimensions larger than the specimen, and low plasma temperature, while operating at gas pressures which can be varied over a wide range.

Abstract translation: 提供了一种使用微波施加器与ECR等离子体源一起用于包括蚀刻和化学气相沉积的应用的方法和装置。 围绕围绕其纵向轴线对称的腔室周向布置的磁体产生磁场。 包括至少一对同轴谐振多端口微波天线阵列的微波施加器在室的等离子体形成部分周围注入并分布微波功率。 天线阵列包括用于辐射微波功率的多个辐射短线。 短截线沿着阵列以预定间隔定位并且相对于同轴传输线选择取向，用于在等离子体形成部分周围均匀地均匀地分布微波功率。 辐射支柱的位置和方向使得微波功率以适合于电子回旋加热的偏振的传播电磁波的形式发射到等离子体中。 施加器耦合到微波功率源，其优选地以2.45GHz的频率提供微波功率。 无磁场区域在等离子体流中产生等离子体分布的均匀性，等离子体流接近室内的出口。 等离子体流在等离子体形成区域朝向具有高密度，均匀性大于样品的横向尺寸以及低等离子体温度的特征流向样品，同时在可在宽范围内变化的气体压力下操作。

公开(公告)号：US4733133A

公开(公告)日：1988-03-22

申请号：US801937

申请日：1985-11-26

Applicant: Raphael A. Dandl

Inventor： Raphael A. Dandl

IPC: H01J25/00 ,  H01J17/26 ,  H05B31/26

CPC classification number: H01J25/005

Abstract: A method and apparatus are disclosed for producing microwave radiation wherein a generally stable, high-beta, relativistic electron plasma is formed and magnetically confined in a magnetic mirror region of a suitable enclosure, a convectively unstable wave then being created in the confined plasma for producing a pulse of relatively intense microwave radiation at a frequency near a local electron gyrofrequency of the plasma, the plasma preferably being formed by simultaneous multiple-frequency electron cyclotron heating and upper off-resonant heating using microwave power at frequencies above the electron gyrofrequency of the plasma. The above steps or functions are preferably sequentially repeated with sequential pulses of microwave radiation being withdrawn from the enclosure, focused by quasi-optical means and directed toward a target including electronic circuitry, the method and apparatus of the invention being preferably adapted for causing the beam of sequential pulses to be coupled into the electronic circuitry for developing substantial amounts of energy therein.

Abstract translation: 公开了一种用于产生微波辐射的方法和装置，其中形成大体上稳定的高β相对论电子等离子体并且磁力限制在合适外壳的磁镜区域中，然后在限制等离子体中产生对流不稳定的波，以产生 在等离子体的局部电子陀螺频率附近的频率处的相对强烈的微波辐射的脉冲，等离子体优选地通过同步多频率电子回旋加热和使用在高于等离子体的电子陀螺频率的频率的微波功率的高次谐振加热 。 上述步骤或功能优选地顺序地重复，其中微波辐射的顺序脉冲从外壳中取出，被准光学装置聚焦并被引向包括电子电路的靶，本发明的方法和装置优选地适于使束 要连接到电子电路中的顺序脉冲，用于在其中显影大量的能量。

公开(公告)号：US06422825B2

公开(公告)日：2002-07-23

申请号：US09749469

申请日：2000-12-28

Applicant: Raphael A. Dandl ,  Wayne L. Johnson ,  Gareth Guest

Inventor： Raphael A. Dandl ,  Wayne L. Johnson ,  Gareth Guest

IPC: F04B3702

CPC classification number: H01J37/32834 ,  F04B17/00 ,  F04B37/14 ,  H01J37/3266 ,  H01J41/14 ,  H05H1/54

Abstract: A plasma pumping cell and method for pumping ions from a first region containing a plasma to a second region when the plasma pumping cell is interposed between the first and second regions, the plasma pumping cell including: a partition member (4) positioned between the first and second regions, the partition member (4) having a through opening defining a conduit (22); a plurality of magnets (24) positioned relative to the conduit in a manner to provide lines of magnetic force that extend through the conduit; a source of free electrons in communication with the conduit; and an electric potential source (34) disposed relative to the conduit to create an electrostatic field which accelerates ions from the conduit (22) to the second region.

Abstract translation: 一种等离子体泵浦单元，以及当等离子体泵浦单元插入在第一和第二区域之间时，将离子从含有等离子体的第一区域抽吸到第二区域的方法，所述等离子体泵浦单元包括：分隔构件（4） 和第二区域，所述分隔构件（4）具有限定导管（22）的通孔; 多个磁体（24），以相对于所述导管定位的方式提供延伸穿过所述导管的磁力线; 与导管连通的自由电子源; 和相对于导管设置的电位源（34），以产生将离子从导管（22）加速到第二区域的静电场。

公开(公告)号：US5707452A

公开(公告)日：1998-01-13

申请号：US676448

申请日：1996-07-08

Applicant: Raphael A. Dandl

Inventor： Raphael A. Dandl

IPC: H05H1/46 ,  C23C14/34 ,  C23C16/50 ,  C23C16/511 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00

CPC classification number: H01J37/3222 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32247 ,  H01J37/32678 ,  H01J37/32688

Abstract: A method and apparatus are disclosed employing a microwave applicator for use with an electron cyclotron resonance (ECR) plasma source for applications including, but not limited to, etching and chemical vapor deposition. A magnetic field is generated by magnets circumferentially arranged about a chamber that is symmetrical about its longitudinal axis. The microwave applicator, which comprises one or more pairs of slotted antenna arrays, injects and distributes microwave power about the entire periphery of a plasma forming portion of the chamber. The antenna arrays include a plurality of radiating stubs for radiating microwave power. The stubs are positioned along the arrays at predetermined intervals for efficiently distributing microwave power uniformly about the periphery of the plasma forming portion. The position and orientation of the radiating stubs cause microwave power to be launched into the plasma in the form of propagating waves with a polarization suitable of electron cyclotron heating. The applicator is coupled to a microwave power source that preferably supplies microwave power at a frequency of 2.45 GHz. A magnetic-field free region produces uniformity of plasma distribution in a plasma stream that approaches an outlet in the chamber. The plasma stream flows through the plasma forming region toward the specimen with characteristics of high density, uniformity over transverse dimensions larger than the specimen, and low plasma temperature, while operating at gas pressures which can be varied over a wide range.

Abstract translation: 公开了使用微波施加器与电子回旋共振（ECR）等离子体源一起用于包括但不限于蚀刻和化学气相沉积的应用的方法和装置。 围绕围绕其纵向轴线对称的腔室周向布置的磁体产生磁场。 包括一对或多对开槽天线阵列的微波施加器在室的等离子体形成部分的整个周边上注入并分布微波功率。 天线阵列包括用于辐射微波功率的多个辐射短线。 短截线沿着阵列以预定间隔定位，以有效地均匀地分布在等离子体形成部分周边的微波功率。 辐射桩的位置和取向使得微波功率以适合于电子回旋加热的极化的传播波的形式发射到等离子体中。 施加器耦合到微波功率源，其优选地以2.45GHz的频率提供微波功率。 无磁场区域在等离子体流中产生等离子体分布的均匀性，等离子体流接近室内的出口。 等离子体流在等离子体形成区域朝向具有高密度，均匀性大于样品的横向尺寸以及低等离子体温度的特征流向样品，同时在可在宽范围内变化的气体压力下操作。

公开(公告)号：US5003225A

公开(公告)日：1991-03-26

申请号：US293307

申请日：1989-01-04

Applicant: Raphael A. Dandl

Inventor： Raphael A. Dandl

IPC: H01J25/00

CPC classification number: H01J25/005

Abstract: A method and apparatus are disclosed for producing microwave radiation wherein a generally stable, high-beta, relativistic electron plasma is formed in a static magnetic field of a suitable enclosure either by an external microwave source or in situ within the plasma by means of at least one pair of steady-state interacting energetic electron beams, a convectively unstable wave then being created in the confined plasma either internally in an oscillator mode or externally in an amplifier mode by means of an external launcher for producing a pulse of relatively intense microwave radiation at a frequency near a local electron gyrofrequency. The above steps or functions are preferably sequentially repeated with sequential pulses of microwave radiation being withdrawn from the enclosure, focused by quasi-optical means and directed toward a target including electronic circuitry, so that the beam of sequential pulses is coupled into the electronic circuitry for developing substantial amounts of energy therein.

Abstract translation: 公开了一种用于产生微波辐射的方法和装置，其中通过外部微波源或在等离子体内原位通过至少在等离子体中在合适的外壳的静态磁场中形成通常稳定的高β相对论电子等离子体 一对稳态相互作用的能量电子束，然后通过外部发射器在振荡器模式内部或外部在放大器模式中在限制等离子体中产生对流不稳定波，用于产生相对强烈的微波辐射的脉冲 频率接近局部电子陀螺频率。 上述步骤或功能优选地顺序地重复，其中微波辐射的顺序脉冲从外壳中撤出，由准光学装置聚焦并被引导到包括电子电路的目标，使得顺序脉冲束被耦合到电子电路中 在其中发展大量的能量。

公开(公告)号：US06897616B2

公开(公告)日：2005-05-24

申请号：US10175676

申请日：2002-06-20

Applicant: Raphael A. Dandl

Inventor： Raphael A. Dandl

IPC: H01J37/32 ,  H01J7/24

CPC classification number: H01J37/32357 ,  H01J37/3266

Abstract: A plasma transport system uses a slow-wave power signal in external radio-frequency (RF) inductors to force plasmas to flow through ducts, such as from a plasma generator to a point of use. A magneto-hydrodynamic force is deliberately created by the RF inductors to displace plasma electrons down along the inside of the ductwork. A charge separation results that both drags the ions along and slows down the electrons with the ion drag. The consequence is that both electrons and ions are motivated down the ductwork and the overall plasma charge stays neutral. A directed stream of energetic ions and neutral gas atoms can be realized. The RF electric fields induced in the plasma tend to counteract any electron cooling and help maintains the plasma electron temperature enough to reduce later reionization power demands.

Abstract translation: 等离子体传输系统使用外部射频（RF）电感器中的慢波功率信号来迫使等离子体流过管道，例如从等离子体发生器到达使用点。 磁流体动力是由射频电感有意创造的，以沿管道系统的内部向下移位等离子体电子。 电荷分离导致两者都沿着离子的方向拖动并且随着离子阻力而减慢电子。 结果是，电子和离子两者都在管道系统下被激励，并且整个等离子体电荷保持中性。 可以实现能量离子和中性气体原子的定向流。 在等离子体中感应的RF电场倾向于抵消任何电子冷却，并有助于维持等离子体电子温度足以减少以后的反电离能力需求。

公开(公告)号：US06729850B2

公开(公告)日：2004-05-04

申请号：US10283358

申请日：2002-10-30

Applicant: Raphael A. Dandl ,  Bill H. Quon ,  Samuel S Antley ,  Andrej S. Mitrovic ,  Wayne L. Johnson

Inventor： Raphael A. Dandl ,  Bill H. Quon ,  Samuel S Antley ,  Andrej S. Mitrovic ,  Wayne L. Johnson

IPC: H05H100

CPC classification number: H01J37/32623 ,  H01J37/3266 ,  H05H1/54

Abstract: A plasma vacuum pump including an array of permanent magnets, one or more plasma conduits or ducts, components for accelerating plasma ions through these conduits, and supporting structures that together comprise at least one applied plasma duct system (APDS) cell. The APDS cell permits large volumes of particles and plasma to flow rapidly in a preferred direction while constricting the flow of neutral particles in the reverse direction. A plasma pump utilizing APDS technology is intended to permit a large throughput of ionized gas at the intermediate pressures of interest in the plasma-enhanced processing industry, compressing this gas to a pressure at which blower-type pumps can be used efficiently to exhaust the spent processing gas at atmospheric pressure.

Abstract translation: 包括永磁体阵列，一个或多个等离子体导管或管道的等离子体真空泵，用于通过这些导管加速等离子体离子的部件，以及一起包括至少一个施加的等离子体管道系统（APDS））的支撑结构。 APDS细胞允许大体积的颗粒和等离子体在优选的方向上快速流动，同时在相反方向上收缩中性粒子的流动。 使用APDS技术的等离子泵旨在允许在等离子体增强加工工业中感兴趣的中压下的大量电离气体压缩，将该气体压缩到可以有效地利用鼓风机型泵来排出废气的压力 在大气压下处理气体。