Automatic program disturb with intelligent soft programming for flash cells
    2.
    发明授权
    Automatic program disturb with intelligent soft programming for flash cells 有权
    自动程序干扰与闪存单元的智能软编程

    公开(公告)号:US06252803B1

    公开(公告)日:2001-06-26

    申请号:US09692881

    申请日:2000-10-23

    IPC分类号: G11C1616

    CPC分类号: G11C16/16

    摘要: A method of erasing a flash electrically-erasable programmable read-only memory (EEPROM) device is provided which includes a plurality of memory cells. An erase pulse is applied to the plurality of memory cells. The plurality of memory cells is overerase verified and an overerase correction pulse is applied to the bitline to which the overerased memory cell is attached. This cycle is repeated until all cells verify as not being overerased. The plurality of memory cells is erase verified and another erase pulse is applied to the memory cells if there are undererased memory cells and the memory cells are again erase verified. This cycle is repeated until all cells verify as not being undererased. After erase verify is completed, the plurality of memory cells is soft program verified and a soft programming pulse is applied to the those memory cells in the plurality of memory cells which have a threshold voltage below a pre-defined minimum value. This cycle is repeated until all of those memory cells in the plurality of memory cells which have a threshold voltage below the pre-defined minimum value are brought above the pre-defined minimum value. The erase method is considered to be finished when there are no memory cells in the plurality of memory cells which have a threshold voltage below the pre-defined minimum value.

    摘要翻译: 提供擦除闪存电可擦除可编程只读存储器(EEPROM)设备的方法,其包括多个存储器单元。 擦除脉冲被施加到多个存储单元。 多个存储器单元被过度验证,并且过高修正脉冲被施加到被过度存储的存储单元附着的位线。 重复此循环,直到所有的单元格都被验证为不被过高。 多个存储器单元被擦除验证,并且如果存在未存储的存储器单元并且存储器单元再次被擦除验证,则另一个擦除脉冲被施加到存储器单元。 重复此循环,直到所有单元格都被验证为不被忽略。 在擦除验证完成之后,多个存储器单元被软件程序验证,并且将软编程脉冲施加到具有低于预定义最小值的阈值电压的多个存储单元中的那些存储单元。 重复该循环,直到具有低于预定义最小值的阈值电压的多个存储器单元中的所有那些存储器单元高于预定义的最小值。 当多个存储单元中没有存储单元的阈值电压低于预先定义的最小值时,擦除方法被认为是完成的。

    Accurate verify apparatus and method for NOR flash memory cells in the presence of high column leakage
    3.
    发明授权
    Accurate verify apparatus and method for NOR flash memory cells in the presence of high column leakage 有权
    在存在高柱泄漏的情况下,NOR闪存单元的精确验证装置和方法

    公开(公告)号:US06400608B1

    公开(公告)日:2002-06-04

    申请号:US09842288

    申请日:2001-04-25

    IPC分类号: G11C1134

    摘要: A technique is provided for reducing column leakage in a flash EEPROM device during an erase verification process, thereby preventing false verifies. The technique has application in NOR arrays or other types of arrays in which a number of cells are connected in parallel. The technique operates by reducing the leakage of the unselected cells in parallel to the selected cell being verified, thereby preventing false verifies. The technique can also be used in conjunction with other techniques for reducing column leakage, such as soft programming, automatic programming disturb erase (APDE), or various other Vth compacting schemes.

    摘要翻译: 提供了一种在擦除验证过程中减少闪存EEPROM器件中的列泄漏的技术,从而防止虚假验证。 该技术在NOR阵列或其他类型的阵列中的应用,其中多个单元并联连接。 该技术通过减少未被选择的小区的泄漏与所验证的所选择的小区并行,从而防止虚假验证来进行操作。 该技术还可以与减少列泄漏的其他技术结合使用,例如软编程,自动编程干扰擦除(APDE)或各种其他Vth压缩方案。

    Threshold voltage compacting for non-volatile semiconductor memory designs
    6.
    发明授权
    Threshold voltage compacting for non-volatile semiconductor memory designs 失效
    用于非易失性半导体存储器设计的阈值电压压缩

    公开(公告)号:US06438037B1

    公开(公告)日:2002-08-20

    申请号:US09851773

    申请日:2001-05-09

    IPC分类号: G11C1606

    CPC分类号: G11C16/3409 G11C16/3404

    摘要: A flash memory design with a compact threshold voltage distribution and a method for compacting the threshold voltage for a flash memory design in which the threshold voltage is compacted by erasing a plurality of memory cells to set the threshold voltage for the memory cells substantially towards a median erased threshold voltage; verifying at least one fast-erase memory cell; selectively soft-programming the memory cells; and erasing subsequent to selectively soft-programming.

    摘要翻译: 具有紧凑阈值电压分布的快闪存储器设计和用于压缩闪速存储器设计的阈值电压的方法,其中阈值电压通过擦除多个存储器单元而被压缩,以将存储器单元的阈值电压基本上朝向中位数 擦除阈值电压; 验证至少一个快速擦除存储器单元; 选择性地软编程存储器单元; 并且在选择性软编程之后擦除。

    Flash memory device with increase of efficiency during an APDE (automatic program disturb after erase) process
    7.
    发明授权
    Flash memory device with increase of efficiency during an APDE (automatic program disturb after erase) process 有权
    闪存器件在APDE期间提高效率(擦除后的自动程序干扰)过程

    公开(公告)号:US06469939B1

    公开(公告)日:2002-10-22

    申请号:US09969572

    申请日:2001-10-01

    IPC分类号: G11C1604

    摘要: A source resistor or a positive voltage is coupled to the source and a negative bias voltage is applied at the substrate or p-well of flash memory cells for enhanced efficiency during programming and/or during an APDE (Automatic Program Disturb after Erase) process for a flash memory device. Furthermore, in a system and method for programming the flash memory device, a flash memory cell of the array of multiple flash memory cells is selected to be programmed. A control gate programming voltage is applied to the control gate of the selected flash memory cell, and a bit line programming voltage is applied to the drain of the selected flash memory cell via the common bit line terminal to which the drain of the selected flash memory cell is connected.

    摘要翻译: 源极电阻或正电压耦合到源极,并且在闪存单元的衬底或p阱处施加负偏置电压,以在编程期间和/或在APDE(擦除后自动程序干扰)处理期间提高效率 闪存设备。 此外,在用于对闪速存储器件进行编程的系统和方法中,选择多个闪速存储器单元的阵列中的闪存单元进行编程。 控制栅极编程电压被施加到所选择的闪速存储器单元的控制栅极,并且位线编程电压通过公共位线端子被施加到所选择的闪存单元的漏极,所述公共位线端子选择闪存的漏极 单元格已连接。

    Method of matching core cell and reference cell source resistances
    8.
    发明授权
    Method of matching core cell and reference cell source resistances 有权
    匹配核心单元和参考单元源电阻的方法

    公开(公告)号:US06654285B1

    公开(公告)日:2003-11-25

    申请号:US10083789

    申请日:2002-02-27

    IPC分类号: G11C1134

    CPC分类号: G11C16/28

    摘要: In a method of reading a memory cell of a memory cell array, electrical potentials are applied to a conductive structure connected to the drain, a conductive structure connected to the source, and the gate of the transistor of a cell to be read. Electrical potential are also applied to a conductive structure connected to the drain, a conductive structure connected to the source, and the gate of the transistor of a reference cell, providing current through the reference cell. The level of resistance to current through the reference cell is chosen by selecting the level of resistance in the conductive structure connected to the source of the transistor of the reference cell.

    摘要翻译: 在读取存储单元阵列的存储单元的方法中,将电位施加到连接到漏极的导电结构,连接到源极的导电结构和要读取的单元的晶体管的栅极。 电势也施加到连接到漏极的导电结构,连接到源极的导电结构和参考单元的晶体管的栅极,提供电流通过参考单元。 通过选择连接到参考单元的晶体管的源极的导电结构中的电阻电平来选择通过参考单元的电流的电平。

    PARALLEL BITLINE NONVOLATILE MEMORY EMPLOYING CHANNEL-BASED PROCESSING TECHNOLOGY
    9.
    发明申请
    PARALLEL BITLINE NONVOLATILE MEMORY EMPLOYING CHANNEL-BASED PROCESSING TECHNOLOGY 有权
    并行线性非线性存储器采用基于通道的处理技术

    公开(公告)号:US20110080792A1

    公开(公告)日:2011-04-07

    申请号:US12575137

    申请日:2009-10-07

    IPC分类号: G11C16/04 G11C7/00

    摘要: Providing for a new combination of non-volatile memory architecture and memory processing technology is described herein. By way of example, disclosed is a parallel bitline semiconductor architecture coupled with a channel-based processing technology. The channel based processing technology provides fast program/erase times, relatively high density and good scalability. Furthermore, the parallel bitline architecture enables very fast read times comparable with drain-based tunneling processes, achieving a combination of fast program, erase and read times far better than conventional non-volatile memories.

    摘要翻译: 本文描述了提供非易失性存储器架构和存储器处理技术的新组合。 作为示例,公开了与基于通道的处理技术相结合的并行位线半导体架构。 基于通道的处理技术提供快速的程序/擦除时间,相对较高的密度和良好的可扩展性。 此外,并行位线架构可实现与基于漏极的隧道工艺相当的非常快的读取时间,实现了比常规非易失性存储器更好的快速程序,擦除和读取时间的组合。

    Memory array with buried bit lines
    10.
    发明授权
    Memory array with buried bit lines 失效
    内存阵列带埋线

    公开(公告)号:US06737703B1

    公开(公告)日:2004-05-18

    申请号:US10095512

    申请日:2002-03-12

    IPC分类号: H01L218247

    CPC分类号: H01L27/11521 H01L27/115

    摘要: In a memory device, a substrate has a plurality of source/drain regions in the substrate. Between the source/drain regions are trenches filled with oxide. Individual bit lines in the form of conductive regions are provided in the substrate, each bit line being under and running along the oxide in a trench. Each bit line connects to source/drain regions by means of connecting conductive regions extending from that bit line to source/drain regions.

    摘要翻译: 在存储器件中,衬底在衬底中具有多个源极/漏极区域。 在源极/漏极区之间是填充有氧化物的沟槽。 导电区域形式的单个位线设置在衬底中,每个位线沿着沟槽中的氧化物在下面并且沿着其延伸。 每个位线通过将从该位线延伸的导电区域连接到源极/漏极区域而连接到源极/漏极区域。