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    Overlaid lead giant magnetoresistive head with side reading reduction
    7.
    发明授权
    Overlaid lead giant magnetoresistive head with side reading reduction 失效
    覆盖铅巨磁阻头，侧读数减少

    公开(公告)号：US06785101B2

    公开(公告)日：2004-08-31

    申请号：US09905522

    申请日：2001-07-12

    申请人： Patrick Rush Webb ,  Mustafa Pinarbasi ,  Richard Hsiao ,  Hardayal Singh Gill

    发明人： Patrick Rush Webb ,  Mustafa Pinarbasi ,  Richard Hsiao ,  Hardayal Singh Gill

    IPC分类号： G11B533

    CPC分类号： B82Y10/00 ,  G11B5/3903 ,  G11B5/398

    摘要： The first and second side surfaces of either a bottom spin valve sensor or a top spin valve sensor are notched so as to enable a reduction in the magnetoresistive coefficient of side portions of the sensor beyond the track width region thereby minimizing side reading by the sensor. The first and second notches of the spin valve sensor are then filled with layers in various embodiments of the invention to complete the spin valve sensor.

    摘要翻译： 底部自旋阀传感器或顶部自旋阀传感器的第一和第二侧表面被切口，以便能够将传感器的侧部的磁阻系数降低到轨道宽度区域之外，从而最小化传感器的侧面读数。 然后，在本发明的各种实施例中，自旋阀传感器的第一和第二缺口填充层以完成自旋阀传感器。

    Methods of making magnetic heads with improved contiguous junctions
    8.
    发明授权
    Methods of making magnetic heads with improved contiguous junctions 失效
    制造具有改进的连续结的磁头的方法

    公开(公告)号：US06996894B2

    公开(公告)日：2006-02-14

    申请号：US10109110

    申请日：2002-03-28

    申请人： Richard Hsiao ,  Wipul Pemsiri Jayasekara ,  Mustafa Pinarbasi ,  Patrick Rush Webb

    发明人： Richard Hsiao ,  Wipul Pemsiri Jayasekara ,  Mustafa Pinarbasi ,  Patrick Rush Webb

    IPC分类号： G11B5/127 ,  B44C1/22

    CPC分类号： B82Y10/00 ,  G11B5/3116 ,  G11B5/313 ,  G11B5/3163 ,  G11B5/3903 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： Methods of making a read head with improved contiguous junctions are described. After sensor layer materials are deposited over a substrate, a lift-off mask is formed over the sensor layer materials in a central region which is surrounded by end regions. Ion milling is performed with use of the lift-off mask such that the sensor layer materials in the end regions are removed and those in the central region remain to form a read sensor. A high-angle ion mill (e.g. between 45–80 degrees) is then performed to remove redeposited material from side walls of the lift-off mask. Next, a reactive ion etch (RIE) is used to reduce the thickness and the width of the lift-off mask and to remove capping layer materials from the top edges of the read sensor. With the reduced-size lift-off mask in place, hard bias and lead layers are deposited adjacent the read sensor as well as over the mask. The reduced-size lift-off mask allows the amount of hard bias to be increased in the contiguous junction region, and the edges of the leads to be deposited more closely over the top edges of the read sensor. Advantageously, the stability of the sensor is enhanced and the transfer curve is improved using a method which can be controlled independently from the initial mask structure and ion milling process. No critical alignments or multiple photoresist processes are necessary.

    摘要翻译： 描述了制造具有改进的连续结的读取头的方法。 在传感器层材料沉积在衬底上之后，在由端部区域包围的中心区域中的传感器层材料上形成剥离掩模。 使用剥离掩模进行离子铣削，使得端部区域中的传感器层材料被去除，并且在中心区域中的传感器层材料保持形成读取传感器。 然后执行高角度离子磨（例如在45-80度之间）以从剥离掩模的侧壁去除再沉积的材料。 接下来，使用反应离子蚀刻（RIE）来减小剥离掩模的厚度和宽度，并从读取传感器的顶部边缘去除封盖层材料。 随着尺寸减小的剥离掩模就位，硬读取传感器以及掩模附近沉积了硬偏置和引线层。 缩小尺寸的剥离掩模允许在连续接合区域中增加硬偏置的量，并且引线的边缘更紧密地沉积在读取传感器的顶部边缘上。 有利地，增强了传感器的稳定性，并且使用可以独立于初始掩模结构和离子铣削过程进行控制的方法来提高传递曲线。 不需要临界对准或多个光刻胶工艺。