Voice communication system and a server apparatus
    1.
    发明申请
    Voice communication system and a server apparatus 有权
    语音通信系统和服务器装置

    公开(公告)号:US20070147343A1

    公开(公告)日:2007-06-28

    申请号:US10579677

    申请日:2004-11-19

    IPC分类号: H04L12/66 H04L12/56

    CPC分类号: H04M7/006

    摘要: In a voice communication system for transferring voice information stored in a protocol data unit under a predetermined communication protocol over a network under the protocol, end voice terminals for transferring and receiving the voice information in the protocol data unit, and a management server for managing said end voice terminal are provided. The management server includes a manager for storing subscriber information indicative of whether or not the end voice terminals are provided with the capability of predetermined broadband voice communication. A user is informed, at the latest before the user initiates a call from the end voice terminal, of whether or not a telephone set of a called party is provided with the capability of the broadband voice communication through the end voice terminal based on the subscriber information. running in a network under a predetermined communication. This increases the satisfaction of the user and allows a business model justifying charging customers to be built.

    摘要翻译: 在用于通过协议的网络上以预定的通信协议传送存储在协议数据单元中的语音信息的语音通信系统中,用于在协议数据单元中传送和接收语音信息的终端语音终端,以及用于管理所述 提供终端语音终端。 管理服务器包括用于存储指示终端语音终端是否具有预定宽带语音通信能力的用户信息的管理器。 在用户从终端语音终端发起呼叫之前,最终通知用户通过终端语音终端基于该用户是否向被叫方的电话机提供宽带语音通信的能力 信息。 在预定通信下在网络中运行。 这增加了用户的满意度,并允许商业模式证明为客户建立收费。

    Voice communication system and a server apparatus
    2.
    发明授权
    Voice communication system and a server apparatus 有权
    语音通信系统和服务器装置

    公开(公告)号:US07822014B2

    公开(公告)日:2010-10-26

    申请号:US10579677

    申请日:2004-11-19

    IPC分类号: H04L12/66

    CPC分类号: H04M7/006

    摘要: A voice communication system transfers voice information stored in a protocol data unit under a predetermined communication protocol over a network, and includes end voice terminals for transferring and receiving the voice information, and a management server for managing said end voice terminal. The management server includes a manager for storing subscriber information indicative of whether or not the end voice terminals are provided with the capability of predetermined broadband voice communication. A user is informed, at the latest before the user initiates a call from the end voice terminal, of whether or not a telephone set of a called party is provided with the capability of the broadband voice communication through the end voice terminal based on the subscriber information. running in a network under a predetermined communication. This increases the satisfaction of the user and allows a business model justifying charging customers to be built.

    摘要翻译: 语音通信系统通过网络传送以预定通信协议存储在协议数据单元中的语音信息,并且包括用于传送和接收语音信息的终端语音终端,以及用于管理所述终端语音终端的管理服务器。 管理服务器包括用于存储指示终端语音终端是否具有预定宽带语音通信能力的用户信息的管理器。 在用户从终端语音终端发起呼叫之前,最终通知用户通过终端语音终端基于该用户是否向被叫方的电话机提供宽带语音通信的能力 信息。 在预定通信下在网络中运行。 这增加了用户的满意度,并允许商业模式证明为客户建立收费。

    Height measurement apparatus, exposure apparatus, and device fabrication method
    3.
    发明授权
    Height measurement apparatus, exposure apparatus, and device fabrication method 有权
    高度测量装置,曝光装置和装置制造方法

    公开(公告)号:US08593615B2

    公开(公告)日:2013-11-26

    申请号:US12840553

    申请日:2010-07-21

    申请人: Ryo Sasaki

    发明人: Ryo Sasaki

    IPC分类号: G03B27/52 G03B27/32

    摘要: The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an optical system configured to guide the measurement light and the reference light to the plurality of detection units, wherein the reference surface is placed such that differences are generated among optical path differences between measurement light beams and reference light beams which enter the plurality of detection units, respectively.

    摘要翻译: 本发明提供了一种测量测试表面的高度的测量装置,该装置包括一个图像感测装置,该图像感测装置包括多个检测单元,该多个检测单元被配置为检测由来自测试表面的测量光形成的干扰光和来自参考表面的参考光, 以及光学系统,被配置为将测量光和参考光引导到所述多个检测单元,其中所述参考表面被放置成使得在测量光束和参考光束之间的光程差之间产生差异,所述参考光进入所述多个检测 单位。

    Measuring apparatus, exposure apparatus, and device fabrication method
    4.
    发明授权
    Measuring apparatus, exposure apparatus, and device fabrication method 失效
    测量装置,曝光装置和装置制造方法

    公开(公告)号:US08233140B2

    公开(公告)日:2012-07-31

    申请号:US12239936

    申请日:2008-09-29

    申请人: Ryo Sasaki

    发明人: Ryo Sasaki

    IPC分类号: G03B27/52 G03B27/68 G01B11/02

    摘要: The present invention provides a measuring apparatus which measures a shape of a surface of a measurement target object, comprising a light projecting optical system configured to split light from a light source into measurement light and reference light so that the measurement light enters the surface of the measurement target object and the reference light enters a reference mirror, a light receiving optical system configured to guide the measurement light reflected by the surface of the measurement target object and the reference light reflected by the reference mirror to a photoelectric conversion device, and a processing unit configured to calculate the shape of the surface of the measurement target object based on an interference pattern which is detected by the photoelectric conversion device and formed by the measurement light and the reference light.

    摘要翻译: 本发明提供了一种测量被测物体的表面形状的测量装置,包括:投影光学系统,被配置为将来自光源的光分离成测量光和参考光,使得测量光进入到 测量目标物体和参考光进入参考反射镜,光接收光学系统,被配置为将由测量对象物体的表面反射的测量光和由参考反射镜反射的参考光引导到光电转换装置,以及处理 单元,被配置为基于由光电转换装置检测并由测量光和参考光形成的干涉图案来计算测量对象物体的表面的形状。

    MEASUREMENT APPARATUS, MEASUREMENT METHOD, COMPUTER, PROGRAM, AND EXPOSURE APPARATUS
    5.
    发明申请
    MEASUREMENT APPARATUS, MEASUREMENT METHOD, COMPUTER, PROGRAM, AND EXPOSURE APPARATUS 审中-公开
    测量装置,测量方法,计算机,程序和曝光装置

    公开(公告)号:US20100125432A1

    公开(公告)日:2010-05-20

    申请号:US12620280

    申请日:2009-11-17

    申请人: Ryo Sasaki

    发明人: Ryo Sasaki

    IPC分类号: G01B11/14 G01B9/02 G06F15/00

    CPC分类号: G03F9/7049 G03F9/7026

    摘要: A measurement apparatus includes an interferometer, and a computer configured to calculate a phase distribution and an amplitude distribution by Fourier-transforming a first interference signal detected by the photoelectric conversion element of the interferometer, to correct the phase distribution using a correction-use phase difference distribution, to calculate a second interference signal by reverse-Fourier-transforming the phase distribution that has been corrected and the amplitude distribution, and to calculate the position of the target surface based on the second interference signal.

    摘要翻译: 测量装置包括干涉仪和计算机,该计算机被配置为通过对由干涉仪的光电转换元件检测到的第一干涉信号进行傅里叶变换来计算相位分布和幅度分布,以使用校正用相位差校正相位分布 分配,以通过对已经被校正的相位分布进行反傅立叶变换和幅度分布来计算第二干扰信号,并且基于第二干扰信号来计算目标表面的位置。

    SURFACE LEVEL DETECTION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    6.
    发明申请
    SURFACE LEVEL DETECTION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 失效
    表面水平检测方法,曝光装置和装置制造方法

    公开(公告)号:US20090009738A1

    公开(公告)日:2009-01-08

    申请号:US11846996

    申请日:2007-08-29

    申请人: Ryo Sasaki

    发明人: Ryo Sasaki

    IPC分类号: G03B27/42 G01B11/26

    摘要: This invention discloses a wafer surface level detection method. The wafer surface level detection method includes a first level measurement step of measuring a level of a surface of a substrate having a plurality of shot regions; a position measurement step of measuring a position along the surface of the substrate; a first movement step of moving the substrate in at least a vertical direction on the basis of the measurement result obtained in the first level measurement step and the measurement result obtained in the position measurement step; and a second level measurement step of measuring the level of the surface of the substrate after the first movement step, wherein each of the plurality of shot regions has a measurement region, wherein in the first movement step, the substrate is moved such that a relative position of the measurement region of each of the plurality of shot regions and each of the plurality of shot regions along the surface is constant, and wherein in the second level measurement step, the measurement region of each of the plurality of shot regions is measured.

    摘要翻译: 本发明公开了一种晶片表面水平检测方法。 晶片表面水平检测方法包括测量具有多个照射区域的基板的表面的水平的第一电平测量步骤; 位置测量步骤,测量沿衬底表面的位置; 基于在第一电平测量步骤中获得的测量结果和在位置测量步骤中获得的测量结果,在至少垂直方向上移动衬底的第一移动步骤; 以及第二电平测量步骤,用于测量在所述第一移动步骤之后的所述衬底的表面的水平,其中所述多个照射区域中的每一个具有测量区域,其中在所述第一移动步骤中,所述衬底被移动, 多个照射区域中的每一个的测量区域和沿着表面的多个照射区域中的每一个的位置是恒定的,并且其中在第二电平测量步骤中,测量多个照射区域中的每一个的测量区域。

    Measurement apparatus for calculation of substrate tilt, exposure apparatus, and device fabrication method
    8.
    发明授权
    Measurement apparatus for calculation of substrate tilt, exposure apparatus, and device fabrication method 有权
    用于计算基板倾斜度的测量装置,曝光装置和装置制造方法

    公开(公告)号:US09164405B2

    公开(公告)日:2015-10-20

    申请号:US12840495

    申请日:2010-07-21

    申请人: Ryo Sasaki

    发明人: Ryo Sasaki

    摘要: The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an optical system configured to guide measurement light beams, reflected at a plurality of measurement points on the test surface, and reference light beams, reflected at a plurality of reference points on the reference surface, to the plurality of detection units, respectively, wherein the reference surface generates differences among optical path differences between the measurement light beams and the reference light beams which enter the plurality of detection units, respectively.

    摘要翻译: 本发明提供了一种测量测试表面的高度的测量装置,该装置包括一个图像感测装置,该图像感测装置包括多个检测单元,该多个检测单元被配置为检测由来自测试表面的测量光形成的干扰光和来自参考表面的参考光, 以及光学系统,被配置为将测量表面上的多个测量点反射的测量光束和在参考表面上的多个参考点反射的参考光束分别引导到多个检测单元,其中 参考表面分别产生进入多个检测单元的测量光束和参考光束之间的光程差的差异。

    Interferometer
    9.
    发明授权
    Interferometer 有权
    干涉仪

    公开(公告)号:US08860949B2

    公开(公告)日:2014-10-14

    申请号:US13150825

    申请日:2011-06-01

    IPC分类号: G01B11/02 G01D5/26

    CPC分类号: G01D5/266

    摘要: An interferometer measures a displacement of an object to be measured by observing a fluctuation in intensity of interfering light generated by dividing light emitted from a light source into two light beams and overlaying the two light beams. The interferometer includes: a light-receiving unit including a light-receiving area including a plurality of partial areas and configured to detect the interfering light in each of the plurality of partial areas; and a processing unit configured to calculate a value of an index indicating uniformity of a phase distribution of the interfering light in the light-receiving area by using a detection result in each of the partial areas.

    摘要翻译: 干涉仪通过观察通过将从光源发射的光分成两束光并产生的干涉光的强度的波动来测量待测物体的位移,并且覆盖两个光束。 所述干涉仪包括:受光单元,其包括包含多个部分区域的光接收区域,并且被配置为检测所述多个部分区域中的每一个中的干涉光; 以及处理单元,被配置为通过使用每个部分区域中的检测结果来计算指示光接收区域中的干扰光的相位分布的均匀性的指标的值。

    Surface level detection method, exposure apparatus, and device manufacturing method
    10.
    发明授权
    Surface level detection method, exposure apparatus, and device manufacturing method 失效
    表面等级检测方法,曝光装置和装置制造方法

    公开(公告)号:US07701553B2

    公开(公告)日:2010-04-20

    申请号:US11846996

    申请日:2007-08-29

    申请人: Ryo Sasaki

    发明人: Ryo Sasaki

    IPC分类号: G03B27/52 G03B27/42

    摘要: A wafer surface level detection method includes a first level measurement step of measuring a level of a surface of a substrate having a plurality of shot regions, a position measurement step of measuring a position along the surface of the substrate, a first movement step of moving the substrate in at least a vertical direction on the basis of the measurement result obtained in the first level measurement step and the measurement result obtained in the position measurement step, and a second level measurement step of measuring the level of the surface of the substrate after the first movement step, wherein each of the plurality of shot regions has a measurement region. In the first movement step, the substrate is moved such that a relative position of the measurement region of each of the plurality of shot regions and each of the plurality of shot regions along the surface is constant, and, in the second level measurement step, the measurement region of each of the plurality of shot regions is measured.

    摘要翻译: 晶片表面电平检测方法包括测量具有多个照射区域的基板的表面的水平的第一电平测量步骤,测量沿着基板的表面的位置的位置测量步骤,移动的第一移动步骤 基于在第一水平测量步骤中获得的测量结果和在位置测量步骤中获得的测量结果,至少在垂直方向上的衬底,以及第二水平测量步骤,用于测量衬底的表面的水平, 第一移动步骤,其中多个拍摄区域中的每一个具有测量区域。 在第一移动步骤中,基板被移动,使得多个拍摄区域中的每一个的测量区域和沿着该表面的多个照射区域中的每一个的相对位置是恒定的,并且在第二水平测量步骤中, 测量多个拍摄区域中的每一个的测量区域。