Rewriteable memory cell comprising a diode and a resistance-switching material
    1.
    发明申请
    Rewriteable memory cell comprising a diode and a resistance-switching material 审中-公开
    包括二极管和电阻切换材料的可重写存储单元

    公开(公告)号:US20060250836A1

    公开(公告)日:2006-11-09

    申请号:US11125939

    申请日:2005-05-09

    IPC分类号: G11C11/00

    摘要: In a novel rewriteable nonvolatile memory cell formed above a substrate, a diode is paired with a reversible resistance-switching material, preferably a metal oxide or nitride such as, for example, NiO, Nb2O5, TiO2, HfO2, Al2O3, MgOx, CrO2, VO, BN, and AlN. In preferred embodiments, the diode is formed as a vertical pillar disposed between conductors. Multiple memory levels can be stacked to form a monolithic three dimensional memory array. In some embodiments, the diode comprises germanium or a germanium alloy, which can be deposited and crystallized at relatively low temperatures, allowing use of aluminum or copper in the conductors.

    摘要翻译: 在形成于基板上方的新型可重写非易失性存储单元中,二极管与可逆电阻切换材料配对,优选为金属氧化物或氮化物,例如NiO,Nb 2 O > 5,TiO 2,HfO 2,Al 2 O 3,MgO, xO,CrO 2,VO,BN和AlN。 在优选实施例中,二极管形成为设置在导体之间的垂直支柱。 可以堆叠多个存储器级别以形成单片三维存储器阵列。 在一些实施例中,二极管包括锗或锗合金,其可以在相对低的温度下沉积和结晶,从而允许在导体中使用铝或铜。

    Programming methods to increase window for reverse write 3D cell
    2.
    发明申请
    Programming methods to increase window for reverse write 3D cell 有权
    编程方法增加反向写入3D单元格的窗口

    公开(公告)号:US20080007989A1

    公开(公告)日:2008-01-10

    申请号:US11819077

    申请日:2007-06-25

    IPC分类号: G11C11/00 G11C11/36

    摘要: A method of operating a nonvolatile memory cell includes providing the nonvolatile memory cell comprising a diode which is fabricated in a first resistivity, unprogrammed state, and applying a forward bias to the diode having a magnitude greater than a minimum voltage required for programming the diode to switch the diode to a second resistivity, programmed state. The second resistivity state is lower than the first resistivity state.

    摘要翻译: 一种操作非易失性存储单元的方法包括提供非易失性存储单元,该非易失性存储单元包括以第一电阻率,未编程状态制造的二极管,以及将正向偏压施加到具有大于将二极管编程所需的最小电压的二极管的幅度 将二极管切换到第二电阻率,编程状态。 第二电阻率状态低于第一电阻率状态。

    Semiconductor device including junction diode contacting contact-antifuse unit comprising silicide
    3.
    发明申请
    Semiconductor device including junction diode contacting contact-antifuse unit comprising silicide 有权
    包括结二极管接触的半导体器件接触 - 反熔丝单元包括硅化物

    公开(公告)号:US20050121742A1

    公开(公告)日:2005-06-09

    申请号:US10728230

    申请日:2003-12-03

    摘要: The invention provides for a vertically oriented junction diode having a contact-antifuse unit in contact with one of its electrodes. The contact-antifuse unit is formed either above or below the junction diode, and comprises a silicide with a dielectric antifuse layer formed on and in contact with it. In preferred embodiments, the silicide is cobalt silicide, and the antifuse is preferably silicon oxide, silicon nitride, or silicon oxynitride grown on the cobalt silicide. The junction diode and contact-antifuse unit can be used as a memory cell, which is advantageously used in a monolithic three dimensional memory array.

    摘要翻译: 本发明提供了一种垂直取向的结二极管,其具有与其电极之一接触的接触 - 反熔丝单元。 接触 - 反熔丝单元形成在结二极管上方或下方,并且包括形成在其上并与其接触的介电反熔丝层的硅化物。 在优选实施例中,硅化物是硅化钴,反熔丝优选是在硅化钴上生长的氧化硅,氮化硅或氮氧化硅。 结二极管和接触 - 反熔丝单元可用作存储单元,其有利地用于单片三维存储器阵列中。

    Nonvolatile memory cell comprising a diode and a resistance-switching material
    4.
    发明申请
    Nonvolatile memory cell comprising a diode and a resistance-switching material 有权
    包括二极管和电阻切换材料的非易失性存储单元

    公开(公告)号:US20060250837A1

    公开(公告)日:2006-11-09

    申请号:US11395995

    申请日:2006-03-31

    IPC分类号: G11C11/00

    摘要: In a novel nonvolatile memory cell formed above a substrate, a diode is paired with a reversible resistance-switching material, preferably a metal oxide or nitride such as, for example, NixOy, NbxOy, TixOy, HFxOy, AlxOy, MgxOy, CoxOy, CrxOy, VxOy, ZnxOy, ZrxOy, BxNy, and AlxNy. In preferred embodiments, the diode is formed as a vertical pillar disposed between conductors. Multiple memory levels can be stacked to form a monolithic three dimensional memory array. In some embodiments, the diode comprises germanium or a germanium alloy, which can be deposited and crystallized at relatively low temperatures, allowing use of aluminum or copper in the conductors. The memory cell of the present invention can be used as a rewriteable memory cell or a one-time-programmable memory cell, and can store two or more data states.

    摘要翻译: 在形成在衬底上方的新型非易失性存储单元中,二极管与可逆电阻切换材料配对,优选地为金属氧化物或氮化物,例如Ni x O y O y, 铌,x O y,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,SUB,SUB 其中,O x Y y O y,Y x O y,Y O x O x,X x O,O x O,X x O, y,x,x,y,y,x,y,x,y,x, / SUB> Y>和< N> N< / SUB>。 在优选实施例中,二极管形成为设置在导体之间的垂直支柱。 可以堆叠多个存储器级别以形成单片三维存储器阵列。 在一些实施例中,二极管包括锗或锗合金,其可以在相对低的温度下沉积和结晶,从而允许在导体中使用铝或铜。 本发明的存储单元可以用作可重写存储单元或一次可编程存储单元,并且可以存储两个或多个数据状态。

    Method for using a memory cell comprising switchable semiconductor memory element with trimmable resistance
    5.
    发明申请
    Method for using a memory cell comprising switchable semiconductor memory element with trimmable resistance 有权
    一种用于使用具有可调整电阻的可切换半导体存储元件的存储单元的方法

    公开(公告)号:US20070072360A1

    公开(公告)日:2007-03-29

    申请号:US11496986

    申请日:2006-07-31

    IPC分类号: H01L21/8234

    摘要: A nonvolatile memory cell comprising a diode formed of semiconductor material can store memory states by changing the resistance of the semiconductor material by application of a set pulse (decreasing resistance) or a reset pulse (increasing resistance.) In preferred embodiments, set pulses are applied with the diode under forward bias, while reset pulses are applied with the diode in reverse bias. By switching resistivity of the semiconductor material of the diode, a memory cell can be either one-time programmable or rewriteable, and can achieve two, three, four, or more distinct data states.

    摘要翻译: 包括由半导体材料形成的二极管的非易失性存储单元可以通过施加设置脉冲(降低电阻)或复位脉冲(增加电阻)来改变半导体材料的电阻来存储存储器状态。在优选实施例中,施加设定脉冲 二极管在正向偏置下,而复位脉冲以二极管反向施加。 通过切换二极管的半导体材料的电阻率,存储器单元可以是一次性可编程的或可重写的,并且可以实现两个,三个,四个或更多个不同的数据状态。

    Integrated circuit embodying a non-volatile memory cell
    7.
    发明申请
    Integrated circuit embodying a non-volatile memory cell 审中-公开
    集成电路体现了非易失性存储单元

    公开(公告)号:US20070007577A1

    公开(公告)日:2007-01-11

    申请号:US11175688

    申请日:2005-07-06

    IPC分类号: H01L29/788

    摘要: An integrated circuit is provided including at least one memory cell. Such memory cell, in turn, includes a transistor and a capacitor. The transistor includes a source, a drain, and a gate. Further, the capacitor includes a well and a gate. The gate of the transistor remains in communication with the gate of the capacitor. In various other embodiments, the memory cell includes a transistor and a capacitor including wells of differing types (e.g. P-type, N-type). In such embodiments, the well of the transistor abuts the well of the capacitor. In still further embodiments, for a more compact design, a diffusion region of the transistor is situated less than 2.5 μm from a diffusion region of the capacitor.

    摘要翻译: 提供了包括至少一个存储单元的集成电路。 这样的存储单元又包括晶体管和电容器。 晶体管包括源极,漏极和栅极。 此外,电容器包括阱和栅极。 晶体管的栅极保持与电容器的栅极通信。 在各种其他实施例中,存储单元包括晶体管和包括不同类型的阱(例如,P型,N型)的电容器。 在这样的实施例中,晶体管的阱邻接电容器的阱。 在另外的实施例中,为了更紧凑的设计,晶体管的扩散区域距离电容器的扩散区域小于2.5μm。

    6-bulk transistor static memory cell using split wordline architecture
    9.
    发明授权
    6-bulk transistor static memory cell using split wordline architecture 失效
    6体晶体管静态存储单元采用分割字线架构

    公开(公告)号:US5654915A

    公开(公告)日:1997-08-05

    申请号:US663603

    申请日:1996-06-14

    CPC分类号: G11C11/412 G11C8/14

    摘要: The present invention relates to a solid-state bi-stable circuit functioning as a six-bulk transistor static memory cell, the circuit comprising a plurality of bitlines and at least a first and second reference line, all of which are positioned in parallel with a plurality of wordlines. The circuit further comprises a plurality of transistors including a first and second load transistor, a first and a second pull-down transistor and a first and a second access transistor, in which each of the plurality of transistors includes a gate, source and drain. The gates of the plurality of transistors are positioned in parallel to minimize area usage.

    摘要翻译: 本发明涉及用作六体晶体管静态存储单元的固态双稳电路,该电路包括多个位线和至少第一和第二参考线,所有这些都与 多个字线。 该电路还包括多个晶体管,其包括第一和第二负载晶体管,第一和第二下拉晶体管以及第一和第二存取晶体管,其中多个晶体管中的每一个包括栅极,源极和漏极。 多个晶体管的栅极并联放置以最小化区域使用。

    Method of fabricating a self-aligning damascene memory structure
    10.
    发明授权
    Method of fabricating a self-aligning damascene memory structure 有权
    制造自对准大马士革记忆结构的方法

    公开(公告)号:US07629247B2

    公开(公告)日:2009-12-08

    申请号:US11786620

    申请日:2007-04-12

    IPC分类号: H01L21/4763

    摘要: A method of forming a three-dimensional, non-volatile memory array utilizing damascene fabrication techniques is disclosed. A bottom set of conductors is formed and a set of first pillar shaped elements of heavily doped semiconductor material as formed thereon. A mold is formed of insulating material having pillar shaped openings self-aligned with the first pillar shaped elements and a second semiconductor is deposited over the mold to form second pillar shaped elements aligned with the first pillar shaped elements. The pillar elements formed may be further processed by forming another mold of insulating material having trench openings aligned with the pillar shaped elements and then filling the trenches with conductive material to form conductors coupled to the pillar shaped elements.

    摘要翻译: 公开了一种使用镶嵌制造技术形成三维非易失性存储阵列的方法。 形成底部的一组导体,并在其上形成一组重掺杂半导体材料的第一柱形元件。 模具由具有与第一柱形元件自对准的柱形开口的绝缘材料形成,并且第二半导体沉积在模具上以形成与第一柱状元件对准的第二柱状元件。 可以通过形成具有与柱状元件对准的沟槽开口的另一个绝缘材料模具,然后用导电材料填充沟槽,以形成连接到柱状元件的导体,来进一步处理所形成的柱元件。