SPACER FORMATION FOR ARRAY DOUBLE PATTERNING
    1.
    发明申请
    SPACER FORMATION FOR ARRAY DOUBLE PATTERNING 审中-公开
    用于阵列双重图案的间隔物形成

    公开(公告)号:US20120138227A1

    公开(公告)日:2012-06-07

    申请号:US13369651

    申请日:2012-02-09

    IPC分类号: C23F1/08

    CPC分类号: H01L21/0337

    摘要: A method for forming an array area with a surrounding periphery area, wherein a substrate is disposed under an etch layer, which is disposed under a patterned organic mask defining the array area and covers the entire periphery area is provided. The patterned organic mask is trimmed. An inorganic layer is deposited over the patterned organic mask where a thickness of the inorganic layer over the covered periphery area of the organic mask is greater than a thickness of the inorganic layer over the array area of the organic mask. The inorganic layer is etched back to expose the organic mask and form inorganic spacers in the array area, while leaving the organic mask in the periphery area unexposed. The organic mask exposed in the array area is stripped, while leaving the inorganic spacers in place and protecting the organic mask in the periphery area.

    摘要翻译: 一种用于形成具有周围周边区域的阵列区域的方法,其中衬底设置在蚀刻层下方,其设置在限定阵列区域并覆盖整个周边区域的图案化有机掩模下方。 图案化的有机面罩被修剪。 在图案化的有机掩模上沉积无机层,其中在有机掩模的被覆盖的周边区域上的无机层的厚度大于无机层在有机掩模的阵列区域上的厚度。 将无机层回蚀刻以露出有机掩模并在阵列区域中形成无机间隔物,同时将外围区域中的有机掩模留置不暴露。 剥离在阵列区域中暴露的有机掩模,同时将无机间隔物留在适当位置并保护外围区域中的有机掩模。

    Spacer formation for array double patterning
    2.
    发明授权
    Spacer formation for array double patterning 有权
    阵列双重图案的间隔物形成

    公开(公告)号:US08986492B2

    公开(公告)日:2015-03-24

    申请号:US13369651

    申请日:2012-02-09

    CPC分类号: H01L21/0337

    摘要: A method for forming an array area with a surrounding periphery area, wherein a substrate is disposed under an etch layer, which is disposed under a patterned organic mask defining the array area and covers the entire periphery area is provided. The patterned organic mask is trimmed. An inorganic layer is deposited over the patterned organic mask where a thickness of the inorganic layer over the covered periphery area of the organic mask is greater than a thickness of the inorganic layer over the array area of the organic mask. The inorganic layer is etched back to expose the organic mask and form inorganic spacers in the array area, while leaving the organic mask in the periphery area unexposed. The organic mask exposed in the array area is stripped, while leaving the inorganic spacers in place and protecting the organic mask in the periphery area.

    摘要翻译: 一种用于形成具有周围周边区域的阵列区域的方法,其中衬底设置在蚀刻层下方,其设置在限定阵列区域并覆盖整个周边区域的图案化有机掩模下方。 图案化的有机面罩被修剪。 在图案化的有机掩模上沉积无机层,其中在有机掩模的被覆盖的周边区域上的无机层的厚度大于无机层在有机掩模的阵列区域上的厚度。 将无机层回蚀刻以露出有机掩模并在阵列区域中形成无机间隔物,同时将外围区域中的有机掩模留置不暴露。 剥离在阵列区域中暴露的有机掩模,同时将无机间隔物留在适当位置并保护外围区域中的有机掩模。

    Spacer formation for array double patterning
    3.
    发明授权
    Spacer formation for array double patterning 有权
    阵列双重图案的间隔物形成

    公开(公告)号:US08138092B2

    公开(公告)日:2012-03-20

    申请号:US12351640

    申请日:2009-01-09

    IPC分类号: H01L21/311

    CPC分类号: H01L21/0337

    摘要: A method for forming an array area with a surrounding periphery area, wherein a substrate is disposed under an etch layer, which is disposed under a patterned organic mask defining the array area and covers the entire periphery area is provided. The patterned organic mask is trimmed. An inorganic layer is deposited over the patterned organic mask where a thickness of the inorganic layer over the covered periphery area of the organic mask is greater than a thickness of the inorganic layer over the array area of the organic mask. The inorganic layer is etched back to expose the organic mask and form inorganic spacers in the array area, while leaving the organic mask in the periphery area unexposed. The organic mask exposed in the array area is stripped, while leaving the inorganic spacers in place and protecting the organic mask in the periphery area.

    摘要翻译: 一种用于形成具有周围周边区域的阵列区域的方法,其中衬底设置在蚀刻层下方,其设置在限定阵列区域并覆盖整个周边区域的图案化有机掩模下方。 图案化的有机面罩被修剪。 在图案化的有机掩模上沉积无机层,其中在有机掩模的被覆盖的周边区域上的无机层的厚度大于无机层在有机掩模的阵列区域上的厚度。 将无机层回蚀刻以露出有机掩模并在阵列区域中形成无机间隔物,同时将外围区域中的有机掩模留置不暴露。 剥离在阵列区域中暴露的有机掩模,同时将无机间隔物留在适当位置并保护外围区域中的有机掩模。

    SPACER FORMATION FOR ARRAY DOUBLE PATTERNING
    4.
    发明申请
    SPACER FORMATION FOR ARRAY DOUBLE PATTERNING 有权
    用于阵列双重图案的间隔物形成

    公开(公告)号:US20100178769A1

    公开(公告)日:2010-07-15

    申请号:US12351640

    申请日:2009-01-09

    IPC分类号: H01L21/3105

    CPC分类号: H01L21/0337

    摘要: A method for forming an array area with a surrounding periphery area, wherein a substrate is disposed under an etch layer, which is disposed under a patterned organic mask defining the array area and covers the entire periphery area is provided. The patterned organic mask is trimmed. An inorganic layer is deposited over the patterned organic mask where a thickness of the inorganic layer over the covered periphery area of the organic mask is greater than a thickness of the inorganic layer over the array area of the organic mask. The inorganic layer is etched back to expose the organic mask and form inorganic spacers in the array area, while leaving the organic mask in the periphery area unexposed. The organic mask exposed in the array area is stripped, while leaving the inorganic spacers in place and protecting the organic mask in the periphery area.

    摘要翻译: 一种用于形成具有周围周边区域的阵列区域的方法,其中衬底设置在蚀刻层下方,其设置在限定阵列区域并覆盖整个周边区域的图案化有机掩模下方。 图案化的有机面罩被修剪。 在图案化的有机掩模上沉积无机层,其中在有机掩模的被覆盖的周边区域上的无机层的厚度大于无机层在有机掩模的阵列区域上的厚度。 将无机层回蚀刻以露出有机掩模并在阵列区域中形成无机间隔物,同时将外围区域中的有机掩模留置不暴露。 剥离在阵列区域中暴露的有机掩模,同时将无机间隔物留在适当位置并保护外围区域中的有机掩模。

    Methods for optimizing HTTP header based authentication and devices thereof
    5.
    发明授权
    Methods for optimizing HTTP header based authentication and devices thereof 有权
    用于优化基于HTTP头的身份验证及其设备的方法

    公开(公告)号:US09172753B1

    公开(公告)日:2015-10-27

    申请号:US13400398

    申请日:2012-02-20

    IPC分类号: G06F15/16 H04L29/08

    摘要: A method, non-transitory computer readable medium and application management computing device includes receiving at an application management computing device a request from a client computing device which requires authentication. A determination is made by the application management computing device whether user network identification information currently is stored for the requesting client computing device. The stored user network identification information for the authentication is obtained by the application management computing device when the user network identification information is determined to be currently stored for the requesting client computing device. The authentication is completed by the application management computing device with the obtained user network identification information.

    摘要翻译: 一种方法,非暂时性计算机可读介质和应用管理计算设备包括在应用管理计算设备处接收来自需要认证的客户端计算设备的请求。 应用管理计算设备确定当前是否为请求客户端计算设备存储用户网络识别信息。 当用户网络识别信息被确定为当前为请求客户端计算设备存储时,由应用管理计算设备获得用于认证的存储的用户网络标识信息。 应用管理计算设备用所获得的用户网络标识信息完成认证。

    SYSTEM AND METHOD FOR CLUSTERING WIRELESS DEVICES IN A WIRELESS NETWORK
    6.
    发明申请
    SYSTEM AND METHOD FOR CLUSTERING WIRELESS DEVICES IN A WIRELESS NETWORK 有权
    用于在无线网络中聚合无线设备的系统和方法

    公开(公告)号:US20090129321A1

    公开(公告)日:2009-05-21

    申请号:US12360240

    申请日:2009-01-27

    申请人: Amit Jain

    发明人: Amit Jain

    IPC分类号: H04W4/00

    摘要: Described are a system and method for clustering wireless devices in a wireless network. The system comprises a wireless access point and a plurality of wireless computing units grouped into a cluster as a function of a predetermined parameter. The cluster includes a cluster head unit and at least one cluster member unit. The at least one cluster member unit utilizes a first power level when wirelessly communicating with the cluster head unit, and the cluster head unit utilizes a second power level when communicating with the AP.

    摘要翻译: 描述了用于在无线网络中对无线设备进行聚类的系统和方法。 该系统包括作为预定参数的函数的被分组为群集的无线接入点和多个无线计算单元。 集群包括集群头单元和至少一个集群成员单元。 当与群集头单元无线通信时,所述至少一个群集成员单元利用第一功率级别,并且当与所述AP通信时,所述群集头单元利用第二功率级别。

    System and Method for Updating State Information in a Router
    7.
    发明申请
    System and Method for Updating State Information in a Router 审中-公开
    更新路由器状态信息的系统和方法

    公开(公告)号:US20090037601A1

    公开(公告)日:2009-02-05

    申请号:US11833696

    申请日:2007-08-03

    IPC分类号: G06F15/173

    CPC分类号: H04L12/66

    摘要: Systems and methods consistent with the present invention enable routing table updates are performed by optimally utilizing the resources of a node without exceeding the resources of the node. Using feedback on the amount of resources available to the nodes, such as in terms of available memory, the node may make new connections before breaking old one where those updates will not exceed available resources. This is referred to as make-before-break. When not enough resources are available, the node will break old connections before making new ones. This is referred to as break-before-make. Unlike the strict make-before-break and break-before-make models, this “loose” make-before-break method considers the amount of available resources in view of the resources required to perform the routing table updates without a node failure. Routes may also be tagged to prioritize the addition of more important routes and the deletion of less significant routes. Methods and systems consistent with the present invention, therefore, provide a routing table update method with which routing table updates are achieved without crashing and at the same time minimizing black hole intervals.

    摘要翻译: 与本发明一致的系统和方法能够通过在不超过节点资源的情况下优化利用节点的资源来执行路由表更新。 使用关于可用于节点的资源量的反馈,例如在可用内存方面,节点可以在破坏旧的连接之前进行新的连接,其中这些更新将不超过可用资源。 这被称为前休假。 当没有足够的资源可用时,节点将在创建新连接之前破坏旧连接。 这被称为break-before-make。 与严格的make-before-break和break-before-make模型不同,这种“松散”的make-before-break方法考虑到执行路由表更新而没有节点失败所需的资源的可用资源量。 路由也可以被标记为优先考虑添加更重要的路由并删除较不重要的路由。 因此,与本发明一致的方法和系统提供路由表更新方法,通过该路由表更新方法实现路由表更新,而不会崩溃,同时最小化黑洞间隔。