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公开(公告)号：US20140291421A1
公开(公告)日：2014-10-02
申请号：US14187556
申请日：2014-02-24
发明人： SeokHoon Kim , Yongmyung Jun , Yongsun Ko , Kyoungseob Kim , Jung-Min Oh , Kuntack Lee , Jihoon Jeong , Yong-Jhin Cho
IPC分类号： B05B1/14
CPC分类号： H01L21/6708 , H01L21/67017 , H01L21/67051
摘要： Provided is a substrate treating apparatus including a housing; a plurality of opening-and-closing members configured to provide a driving force for opening and closing the housing; a fluid storing member supplying a fluid to the opening-and-closing members; and a fluid distribution unit connected to the fluid storing member via a supply conduit to distribute the fluid supplied from the fluid storing member to the opening-and-closing members. The fluid distribution unit includes a distribution conduit diverging from the supply conduit and connected to a corresponding one of the opening-and-closing members; and a fluid distribution member provided at a junction between the supply conduit and the distribution conduit.
摘要翻译： 提供一种基板处理装置，包括壳体; 多个打开和关闭构件，其构造成提供用于打开和关闭壳体的驱动力; 向开闭部件供给流体的流体存储部件; 以及流体分配单元，其经由供应管道连接到流体存储构件，以将从流体存储构件供应的流体分配到打开和关闭构件。 流体分配单元包括从供应导管分支并连接到相应的一个打开和关闭构件的分配管道; 以及设置在供应管道和分配管道之间的接合处的流体分配构件。
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公开(公告)号：US10361100B2
公开(公告)日：2019-07-23
申请号：US15368988
申请日：2016-12-05
发明人： Hyosan Lee , Yongsun Ko , Kyoungseob Kim , Kwangsu Kim , SeokHoon Kim , Kuntack Lee , Yongmyung Jun , Yong-Jhin Cho
摘要： A substrate treatment apparatus is provided. The apparatus may include a process chamber configured to have an internal space, a substrate supporting member disposed in the process chamber to support a substrate, a first supplying port configured to supply a supercritical fluid to a region of the internal space located below the substrate, a second supplying port configured to supply a supercritical fluid to other region of the internal space located over the substrate, and an exhaust port configured to exhaust the supercritical fluid from the process chamber to an exterior region.
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公开(公告)号：US20130145640A1
公开(公告)日：2013-06-13
申请号：US13707253
申请日：2012-12-06
发明人： Hyosan Lee , Yongsun Ko , Kyongseob Kim , Kwangsu Kim , SeokHoon Kim , Kuntack Lee , Yongmyung Jun , Yong-Jhin Cho
IPC分类号： F26B5/04
CPC分类号： H01L21/67034 , F26B5/04 , H01L21/02052 , H01L21/67051 , H01L21/6715
摘要： A substrate treatment apparatus is provided. The apparatus may include a process chamber configured to have an internal space, a substrate supporting member disposed in the process chamber to support a substrate, a first supplying port configured to supply a supercritical fluid to a region of the internal space located below the substrate, a second supplying port configured to supply a supercritical fluid to other region of the internal space located over the substrate, and an exhaust port configured to exhaust the supercritical fluid from the process chamber to an exterior region.
摘要翻译： 提供了一种基板处理装置。 该装置可以包括被配置为具有内部空间的处理室，设置在处理室中以支撑基板的基板支撑构件，被配置为将超临界流体供应到位于基板下方的内部空间的区域的第一供应端口， 第二供应端口，其构造成将超临界流体供应到位于所述基板上方的所述内部空间的其他区域;以及排气端口，其构造成将所述超临界流体从所述处理室排出到外部区域。
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公开(公告)号：US09627233B2
公开(公告)日：2017-04-18
申请号：US14187556
申请日：2014-02-24
发明人： SeokHoon Kim , Yongmyung Jun , Yongsun Ko , Kyoungseob Kim , Jung-Min Oh , Kuntack Lee , Jihoon Jeong , Yong-Jhin Cho
CPC分类号： H01L21/6708 , H01L21/67017 , H01L21/67051
摘要： Provided is a substrate treating apparatus including a housing; a plurality of opening-and-closing members configured to provide a driving force for opening and closing the housing; a fluid storing member supplying a fluid to the opening-and-closing members; and a fluid distribution unit connected to the fluid storing member via a supply conduit to distribute the fluid supplied from the fluid storing member to the opening-and-closing members. The fluid distribution unit includes a distribution conduit diverging from the supply conduit and connected to a corresponding one of the opening-and-closing members; and a fluid distribution member provided at a junction between the supply conduit and the distribution conduit.
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公开(公告)号：US20240021414A1
公开(公告)日：2024-01-18
申请号：US18141341
申请日：2023-04-28
发明人： Suhwan Park , Ohchel Kwon , Yongmyung Jun , Gwanwoo Min , Hyeongkwon Jeong
IPC分类号： H01J37/32
CPC分类号： H01J37/32477 , H01J37/32522 , H01J37/3244 , H01J2237/334
摘要： A shock absorbing plate configured to absorb a shock between a first plate and a second plate stacked on the first plate in a vertical direction, positioned between the first plate and the second plate so that the first plate is apart from the second plate in the vertical direction, and having a circular shape when viewed in the vertical direction. When no pressure is applied to the shock absorbing plate, a vertical thickness of the shock absorbing plate is greatest at a center thereof and decreases from the center toward an outer edge thereof. A plurality of holes penetrate the shock absorbing plate in the vertical direction. A friction coefficient and an elastic modulus of the shock absorbing plate are less than a friction coefficient and an elastic modulus of each of the first plate and the second plate.
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公开(公告)号：US09934959B2
公开(公告)日：2018-04-03
申请号：US14537318
申请日：2014-11-10
发明人： Yong-Jhin Cho , Jung-Min Oh , Yongmyung Jun , Yongsun Ko , Kuntack Lee , Hyosan Lee
IPC分类号： H01L21/02
CPC分类号： H01L21/02101 , H01L21/02057
摘要： A method of purifying a cleaning agent is provided. The method includes heating a first mixed solution including an etching agent, a first cleaning agent, and a second cleaning agent at or below a first temperature and distilling the etching agent and the first cleaning agent and removing the second cleaning agent. The method includes condensing or compressing the etching agent and the first cleaning agent forming a second mixed solution including the etching agent and the first cleaning agent. The method includes heating the second mixed solution at a temperature lower than a second temperature, redistilling the etching agent and extracting the first cleaning agent. The second temperature is lower than the first temperature.
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公开(公告)号：US20170084469A1
公开(公告)日：2017-03-23
申请号：US15368988
申请日：2016-12-05
发明人： Hyosan Lee , Yongsun Ko , Kyoungseob Kim , Kwangsu Kim , SeokHoon Kim , Kuntack Lee , Yongmyung Jun , Yong-Jhin Cho
CPC分类号： H01L21/67034 , F26B5/04 , H01L21/02052 , H01L21/67051 , H01L21/6715
摘要： A substrate treatment apparatus is provided. The apparatus may include a process chamber configured to have an internal space, a substrate supporting member disposed in the process chamber to support a substrate, a first supplying port configured to supply a supercritical fluid to a region of the internal space located below the substrate, a second supplying port configured to supply a supercritical fluid to other region of the internal space located over the substrate, and an exhaust port configured to exhaust the supercritical fluid from the process chamber to an exterior region.
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公开(公告)号：US09534839B2
公开(公告)日：2017-01-03
申请号：US13707253
申请日：2012-12-06
发明人： Hyosan Lee , Yongsun Ko , Kyongseob Kim , Kwangsu Kim , SeokHoon Kim , Kuntack Lee , Yongmyung Jun , Yong-Jhin Cho
CPC分类号： H01L21/67034 , F26B5/04 , H01L21/02052 , H01L21/67051 , H01L21/6715
摘要： A substrate treatment apparatus is provided. The apparatus may include a process chamber configured to have an internal space, a substrate supporting member disposed in the process chamber to support a substrate, a first supplying port configured to supply a supercritical fluid to a region of the internal space located below the substrate, a second supplying port configured to supply a supercritical fluid to other region of the internal space located over the substrate, and an exhaust port configured to exhaust the supercritical fluid from the process chamber to an exterior region.
摘要翻译： 提供了一种基板处理装置。 该装置可以包括被配置为具有内部空间的处理室，设置在处理室中以支撑基板的基板支撑构件，被配置为将超临界流体供应到位于基板下方的内部空间的区域的第一供应端口， 第二供应端口，其构造成将超临界流体供应到位于所述基板上方的所述内部空间的其他区域;以及排气端口，其构造成将所述超临界流体从所述处理室排出到外部区域。
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