公开(公告)号：US20210311387A1

公开(公告)日：2021-10-07

申请号：US17217941

申请日：2021-03-30

申请人： Samsung SDI Co., Ltd.

发明人： Changsoo WOO ,  Eunmi KANG ,  Jaehyun KIM ,  Jimin KIM ,  Taeho KIM ,  Ran NAMGUNG ,  Kyungsoo MOON ,  Hwansung CHEON ,  Seungyong CHAE ,  Seung HAN

IPC分类号： G03F7/004 ,  C07F7/22 ,  H01L21/027

摘要： A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent: In Chemical Formula 1, R is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 aliphatic unsaturated organic group including at least one double bond or triple bond, a substituted or unsubstituted C6 to C30 aryl group, an ethoxy group, a propoxy group, or a combination thereof; and X, Y, and Z are each independently —OR1 or —OC(═O)R2.

公开(公告)号：US20190317403A1

公开(公告)日：2019-10-17

申请号：US16340728

申请日：2017-06-14

申请人： SAMSUNG SDI CO., LTD.

发明人： Shinhyo BAE ,  Taeho KIM ,  Yushin PARK ,  Youjung PARK ,  Hyunji SONG ,  Hyunsoo LEE ,  Hyejin JANG

IPC分类号： G03F7/004 ,  G03F7/16 ,  G03F7/20

摘要： An organic layer composition includes an aromatic ring compound, an additive including perfluoroalkyl in the structure, and a solvent, wherein a fluoro (F) group included in the additive is included in an amount of greater than 0 wt % and less than or equal to 30 wt % based on a total weight, 100 wt % of the additive, and a surface tension decrease rate of the additive measured according to Condition 1 is 0.1% to 30%. The definition of Condition 1 is the same as described in the specification.

公开(公告)号：US20230223262A1

公开(公告)日：2023-07-13

申请号：US18000917

申请日：2021-08-20

申请人： SAMSUNG SDI CO., LTD.

发明人： Kyungsoo MOON ,  Eunmi KANG ,  Jaehyun KIM ,  Jimin KIM ,  Taeho KIM ,  Changsoo WOO ,  Hwansung CHEON ,  Seungyong CHAE ,  Seung HAN

IPC分类号： H01L21/027 ,  H01L21/3213 ,  H01L21/311

CPC分类号： H01L21/0274 ,  H01L21/32135 ,  H01L21/32139 ,  H01L21/31116

摘要： Disclosed are a semiconductor photoresist composition and a method of forming patterns using the semiconductor photoresist composition. The semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1 and a solvent and a method of forming patterns using the same.

公开(公告)号：US20230115975A1

公开(公告)日：2023-04-13

申请号：US17963558

申请日：2022-10-11

申请人： SAMSUNG SDI CO., LTD.

发明人： Taeho KIM

IPC分类号： H01M10/42 ,  H01M10/48 ,  G01R31/396 ,  H02J7/00

摘要： An embodiment provides a battery apparatus including: a battery module including a plurality of battery cells; and a battery management system that receives operation information including mode information and task information about an operation being performed by the battery module from the battery module and that generates a control signal with respect to the battery module based on the operation information to transmit it to a battery module connected thereto. Wherein one mode includes a plurality of tasks of which order is predetermined.