公开(公告)号：US20230311026A1

公开(公告)日：2023-10-05

申请号：US18152485

申请日：2023-01-10

Applicant: SEMES CO.,LTD.

Inventor： Arah CHO ,  Jung Suk GOH ,  Jae Hoon PARK ,  Hojin JANG ,  Jung Yul LEE ,  Kyungjin SEO ,  Woo Sin JUNG

IPC: B01D19/00 ,  H01L21/67

CPC classification number: B01D19/0042 ,  H01L21/67017

Abstract: The present invention relates to a liquid trap tank and a method for trapping liquid, the liquid trap tank may include a tank body configured to have an accommodation space formed therein capable of accommodating a liquid, have an inflow unit formed in one portion thereof, and have a discharge unit formed in the other portion thereof, a first accommodation portion formed inside the tank body and configured to primarily and temporarily accommodate the liquid so that air bubbles are separated from the liquid introduced through the inflow unit, and a second accommodation portion formed inside the tank body and configured to secondarily and temporarily accommodate the liquid moved from the first accommodation portion or to discharge the moved liquid to the outside through the discharge unit.

公开(公告)号：US20210129175A1

公开(公告)日：2021-05-06

申请号：US17085691

申请日：2020-10-30

Applicant: SEMES CO., LTD.

Inventor： Jaeoh BANG ,  Kyungjin SEO ,  Youngseo AN

IPC: B05C13/00 ,  B05C5/02

Abstract: An apparatus for treating a substrate includes a housing having a treatment space inside, a gas supply unit that supplies a hydrophobic gas into the treatment space to hydrophobicize the substrate, and a support unit that supports the substrate in the treatment space. The support unit includes a support plate, a heating member that heats the substrate placed on the support plate, and a height adjustment member that changes a position of the substrate between a first position spaced apart upward from an upper surface of the support plate by a first distance and a second position spaced apart upward from the upper surface of the support plate by a second distance, and the second position is a higher position than the first position.

公开(公告)号：US20220019148A1

公开(公告)日：2022-01-20

申请号：US17380308

申请日：2021-07-20

Applicant: SEMES CO., LTD.

Inventor： Min Jung PARK ,  Jung Yul LEE ,  Choongki MIN ,  Kyungjin SEO

IPC: G03F7/20

Abstract: The inventive concept provides a substrate treating apparatus and a substrate treating method. The sub substrate treating apparatus may include a support unit that supports a substrate, a liquid supply unit that supplies a liquid onto the substrate supported by the support unit, and a controller that controls the liquid supply unit and the support unit, the liquid supply unit may include a pre-treatment nozzle that discharges a first treatment liquid in a stream scheme, and a main nozzle that discharges a second treatment liquid in a liquid curtain scheme, and the controller may control the support unit such that a rotational direction of the substrate when the first treatment liquid is discharged from the main nozzle and a rotational direction of the substrate when the second treatment liquid is discharged from the pre-treatment nozzle are opposite to each other.

公开(公告)号：US20210054507A1

公开(公告)日：2021-02-25

申请号：US16997491

申请日：2020-08-19

Applicant: SEMES CO., LTD.

Inventor： Seunghan LEE ,  Jongsu CHOI ,  Jong Seok SEO ,  Junho SEO ,  Younghun JUNG ,  Kyungjin SEO ,  Jung-Hyun LEE ,  Moon Hyung BAE ,  Sang Jin BAE

IPC: C23C16/455 ,  H01L21/67 ,  C23C16/44

Abstract: An embodiment of the inventive concept provides an apparatus for treating a substrate. The apparatus for treating a substrate includes a chamber having a treating space inside the chamber and a gas inlet unit entering a gas into the treating space. The gas inlet unit includes an introduction pipe through which the gas is entered, and a discharging plate in which a discharging hole discharging the gas entered through the introduction pipe is formed. The discharging hole is arranged such that density for each area of the discharging plate is different.