公开(公告)号：US20220102169A1

公开(公告)日：2022-03-31

申请号：US17486060

申请日：2021-09-27

Applicant: SEMES CO., LTD.

Inventor： Dae Sung KIM ,  Sang Eun NOH ,  Ho Jin JANG ,  Jae Hoon PARK

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/673 ,  H01L21/02

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus comprising: a treating vessel including an outer cup and an inner cup placed in an inner side of the outer cup, the inner cup and the outer cup in combination defining a recollecting route for a recollecting a liquid; a rotatable spin head placed within the treating vessel on which a cleaning jig is placed; wherein the treating vessel comprises a first protrusion protruding from an inner side surface of the outer cup to direct a cleaning liquid scattering from the cleaning jig toward a surface of the inner cup.

公开(公告)号：US20230311026A1

公开(公告)日：2023-10-05

申请号：US18152485

申请日：2023-01-10

Applicant: SEMES CO.,LTD.

Inventor： Arah CHO ,  Jung Suk GOH ,  Jae Hoon PARK ,  Hojin JANG ,  Jung Yul LEE ,  Kyungjin SEO ,  Woo Sin JUNG

IPC: B01D19/00 ,  H01L21/67

CPC classification number: B01D19/0042 ,  H01L21/67017

Abstract: The present invention relates to a liquid trap tank and a method for trapping liquid, the liquid trap tank may include a tank body configured to have an accommodation space formed therein capable of accommodating a liquid, have an inflow unit formed in one portion thereof, and have a discharge unit formed in the other portion thereof, a first accommodation portion formed inside the tank body and configured to primarily and temporarily accommodate the liquid so that air bubbles are separated from the liquid introduced through the inflow unit, and a second accommodation portion formed inside the tank body and configured to secondarily and temporarily accommodate the liquid moved from the first accommodation portion or to discharge the moved liquid to the outside through the discharge unit.

公开(公告)号：US20240416383A1

公开(公告)日：2024-12-19

申请号：US18739684

申请日：2024-06-11

Applicant: SEMES CO., LTD.

Inventor： Ho Jin JANG ,  Jae Hoon PARK

IPC: B05C11/10 ,  B05C5/02 ,  B05C21/00

Abstract: Disclosed is an apparatus for treating a substrate, the apparatus including: an outer cup having a treatment space with an open top; a support unit for supporting a substrate in the treatment space; a guide cup disposed in the treatment space and arranged to surround the support unit; a liquid supply unit for supplying a treatment liquid to a top surface of the substrate supported by the support unit; and a trap ring disposed in a gap between the guide cup and the outer cup to capture the treatment liquid flowing through the gap, in which the trap ring is formed with an exhaust hole through which gas flowing through the gap passes, and the trap ring has a capture space for capturing the treatment liquid on a top surface thereof.

公开(公告)号：US20240222155A1

公开(公告)日：2024-07-04

申请号：US18137287

申请日：2023-04-20

Applicant: SEMES CO., LTD.

Inventor： Young Seo AN ,  Jae Hoon PARK ,  Young Ju JO ,  Kyung Jin SEO ,  Seo Jung PARK ,  Dae Myeong LEE ,  Jae Hyun LIM ,  Nam Kyu KIM

IPC: H01L21/67 ,  B08B3/02 ,  B08B9/093 ,  H01L21/687

CPC classification number: H01L21/67051 ,  B08B3/022 ,  B08B9/093 ,  H01L21/68764 ,  B08B2209/08

Abstract: A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; and a bowl member surrounding the spin chuck, wherein the bowl member includes: a first bowl including an inclined surface inclined downward in an outward direction and having an upper surface of which at least a portion has a curvature; and an upper base disposed on the first bowl, a space between the upper surface of the first bowl and a lower surface of the upper base forms a first flow passage and at least a portion of the first flow passage is formed in an arc shape along the upper surface of the first bowl, and the rinse liquid is supplied toward the inclined surface of the first bowl through the first flow passage.

公开(公告)号：US20240216965A1

公开(公告)日：2024-07-04

申请号：US18125738

申请日：2023-03-24

Applicant: SEMES CO., LTD.

Inventor： Young Seo AN ,  Jae Hoon PARK ,  Young Ju JO ,  Kyung Jin SEO ,  Seo Jung PARK ,  Dae Myeong LEE ,  Jae Hyun LIM ,  Nam Kyu KIM

IPC: B08B9/093 ,  B08B3/02 ,  G03F7/16

CPC classification number: B08B9/093 ,  B08B3/022 ,  G03F7/168 ,  B08B2203/027 ,  B08B2209/08

Abstract: A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.

公开(公告)号：US20240192602A1

公开(公告)日：2024-06-13

申请号：US18333185

申请日：2023-06-12

Applicant: SEMES CO., LTD.

Inventor： Min Jung PARK ,  Soo Bin YONG ,  Jae Hoon PARK

IPC: G03F7/16 ,  G03F1/56 ,  H01L21/02 ,  H01L21/47 ,  H01L21/67

CPC classification number: G03F7/162 ,  G03F1/56 ,  H01L21/02282 ,  H01L21/47 ,  H01L21/67034

Abstract: The inventive concept provides a substrate treating method. The substrate treating apparatus includes first treating including supplying a first liquid to a rotating substrate; and second treating including supplying a second liquid to the rotating substrate after the supplying of the first liquid, and wherein a rotation speed of a substrate is changed during the supplying of the first liquid to the rotating substrate.