公开(公告)号：US20210134617A1

公开(公告)日：2021-05-06

申请号：US17079439

申请日：2020-10-24

Applicant: SEMES CO., LTD.

Inventor： Yong Jun SEO ,  Ye Rim YEON ,  Pil Kyun HEO ,  Byeong Geun KIM ,  Yoon Ki SA ,  Jung Suk GOH ,  Do Yeon KIM ,  Hyun YOON ,  Young Je UM ,  Dong Ok AHN

IPC: H01L21/67 ,  G03F7/30 ,  H01L21/687

Abstract: According to an exemplary embodiment of the present invention, a substrate treatment apparatus includes a chamber member including a treatment space in which a substrate is to be treated, a substrate support unit installed in the treatment space and supporting a substrate, a chemical ejection unit connected to the chamber member and ejecting a chemical fluid to the substrate support unit, and a steam supply unit connected to the chamber member and supplying steam to the chamber member.

公开(公告)号：US20230343610A1

公开(公告)日：2023-10-26

申请号：US18215128

申请日：2023-06-27

Applicant: SEMES CO., LTD.

Inventor： Jung Suk GOH ,  Sun Mi KIM ,  Ji Su HONG ,  Kuk Saeng KIM ,  Cheng Bin CUI ,  Pil Kyun HEO

IPC: H01L21/67 ,  B08B3/04

CPC classification number: H01L21/6708 ,  B08B3/041 ,  H01L21/67253

Abstract: Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate.

公开(公告)号：US20230314951A1

公开(公告)日：2023-10-05

申请号：US18117554

申请日：2023-03-06

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Woo Sin JUNG ,  Youngun YUN ,  Jung Suk GOH

IPC: G03F7/00 ,  G03F7/30 ,  G03F7/09 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/002 ,  G03F7/0392 ,  G03F7/09 ,  G03F7/3071

Abstract: A liquid chemical supply apparatus for supplying a liquid chemical to a plurality of substrate processing apparatuses disposed at different heights includes a pump for providing a hydraulic pressure for moving the liquid chemical to the substrate processing apparatuses, a plurality of liquid chemical supply lines having ends connected to the pump and other ends separately connected to the substrate processing apparatuses, to provide passages through which the liquid chemical moves, and a pump vent line connected to the pump to discharge some of the liquid chemical to outside, wherein flow rate calibration lines are connected between the liquid chemical supply lines and the pump vent line.

公开(公告)号：US20230072728A1

公开(公告)日：2023-03-09

申请号：US17737345

申请日：2022-05-05

Applicant: SEMES CO., LTD.

Inventor： Jae Seong LEE ,  Jung Suk GOH ,  Hae Won CHOI

IPC: H01L21/67 ,  H01L21/02

Abstract: The present disclosure provides a substrate treating apparatus, in which stability is secured by performing a process under a lower pressure condition, and a substrate treating method using the same. The substrate treating apparatus comprises a chamber including a housing and a treating region, wherein a substrate on which a rinse liquid remains is loaded into the chamber, a supply port installed in the housing and for supplying a first drying gas and a second drying gas to the treating region, a first supply line connected to the supply port, and through which the first drying gas is moved, and a second supply line connected to the supply port, and through which the second drying gas is moved, wherein the first drying gas is a gas below a first temperature, and the second drying gas is a gas equal to or above the first temperature, wherein the second drying gas dries the rinse liquid remaining on the substrate.

公开(公告)号：US20210183660A1

公开(公告)日：2021-06-17

申请号：US17115313

申请日：2020-12-08

Applicant: SEMES CO., LTD.

Inventor： Jung Suk GOH ,  Jae Seong LEE ,  Do Youn LIM ,  Kuk Saeng KIM ,  Young Dae CHUNG ,  Tae Shin KIM ,  Jee Young LEE ,  Won Geun KIM ,  Ji Hoon JEONG ,  Kwang Sup KIM ,  Pil Kyun HEO ,  Yoon Ki SA ,  Ye Rim YEON ,  Hyun YOON ,  Do Yeon KIM ,  Yong Jun SEO ,  Byeong Geun KIM ,  Young Je UM

IPC: H01L21/311 ,  H01L21/66 ,  H01L21/67

Abstract: Method and apparatus for etching a thin layer including silicon nitride formed on a substrate are disclosed. Etchant including phosphoric acid and water is supplied on the substrate so that a liquid layer is formed on the substrate. The thin layer is etched by reaction between the thin layer and the etchant. Thickness of the liquid layer is measured to detect variation in the thickness of the liquid layer while etching the thin layer. Variation in the concentration of the phosphoric acid and the water is calculated based on the variation in the thickness of the liquid layer. Water is supplied on the substrate based on the variation in the concentration of the phosphoric acid and the water so that the concentration of the phosphoric acid and the water becomes a predetermined value.

公开(公告)号：US20210134614A1

公开(公告)日：2021-05-06

申请号：US17079445

申请日：2020-10-24

Applicant: SEMES CO., LTD.

Inventor： Young Dae CHUNG ,  Won Geun KIM ,  Jee Young LEE ,  Ji Hoon JEONG ,  Tae Shin KIM ,  Jung Suk GOH ,  Cheng Bin CUI ,  Ye Rim YEON

IPC: H01L21/67

Abstract: A substrate treatment apparatus includes a substrate support unit, a chemical supply unit supplying a chemical solution onto an upper surface of a substrate supported on the substrate support unit, a laser irradiation unit applying a laser pulse to the substrate to heat the substrate, and a controller controlling the laser irradiation unit to emit the laser pulse such that the substrate is repeatedly heated and cooled to maintain a preset temperature.

公开(公告)号：US20230311028A1

公开(公告)日：2023-10-05

申请号：US17702088

申请日：2022-03-23

Applicant: SEMES CO., LTD.

Inventor： Jung Suk GOH ,  Kuk Saeng KIM ,  Do-Youn LIM ,  Wan Hee JEONG

IPC: B01D21/28 ,  B01D21/00 ,  B01D35/06 ,  B01D21/34

CPC classification number: B01D21/283 ,  B01D21/0012 ,  B01D21/34 ,  B01D35/06

Abstract: The present invention provides a liquid supplying unit, including: a nozzle; a liquid supply pipe configured to supply a treatment liquid to the nozzle; and an impurity removing unit installed in the liquid supply pipe to remove an impurity in the treatment liquid, in which the impurity removing unit includes: a measuring unit configured to measure a characteristic of the impurity in the treatment liquid and form impurity data; a vibrating unit configured to apply vibration to the treatment liquid; a capturing unit configured to adsorb the impurity in the treatment liquid to which the vibration is applied; and a control unit configured to control the measuring unit and the vibration unit, and when the impurity data exceeds a reference data range, the control unit operates the vibrating unit.

公开(公告)号：US20230311026A1

公开(公告)日：2023-10-05

申请号：US18152485

申请日：2023-01-10

Applicant: SEMES CO.,LTD.

Inventor： Arah CHO ,  Jung Suk GOH ,  Jae Hoon PARK ,  Hojin JANG ,  Jung Yul LEE ,  Kyungjin SEO ,  Woo Sin JUNG

IPC: B01D19/00 ,  H01L21/67

CPC classification number: B01D19/0042 ,  H01L21/67017

Abstract: The present invention relates to a liquid trap tank and a method for trapping liquid, the liquid trap tank may include a tank body configured to have an accommodation space formed therein capable of accommodating a liquid, have an inflow unit formed in one portion thereof, and have a discharge unit formed in the other portion thereof, a first accommodation portion formed inside the tank body and configured to primarily and temporarily accommodate the liquid so that air bubbles are separated from the liquid introduced through the inflow unit, and a second accommodation portion formed inside the tank body and configured to secondarily and temporarily accommodate the liquid moved from the first accommodation portion or to discharge the moved liquid to the outside through the discharge unit.

公开(公告)号：US20230073867A1

公开(公告)日：2023-03-09

申请号：US17940207

申请日：2022-09-08

Applicant: SEMES CO., LTD. ,  SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION

Inventor： Jung Suk GOH ,  A Rah CHO ,  Woo Sin JUNG ,  Dae Sung KIM ,  Hae Kyung KIM ,  Hyungmin PARK ,  Jungjin LEE ,  Linfeng PIAO ,  Jubeom LEE

IPC: G03F7/16

Abstract: Provided is a liquid supplying apparatus including: a trap tank for receiving a liquid from a storage bottle in which the liquid is stored and accommodating the received liquid; a pipe for connecting the storage bottle and the trap tank; and a valve installed on the pipe and for opening and closing a flow path of the pipe, in which the valve is installed closer to the storage bottle than the trap tank.

公开(公告)号：US20230073468A1

公开(公告)日：2023-03-09

申请号：US17902094

申请日：2022-09-02

Applicant: SEMES CO., LTD. ,  SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION

Inventor： Jung Suk GOH ,  A Rah CHO ,  Hyungmin PARK ,  Linfeng PIAO ,  Jubeom LEE ,  Jungjin LEE

IPC: G01N15/00 ,  G03F7/16

Abstract: The inventive concept relates to an apparatus for treating a substrate. The apparatus includes a liquid supply unit that supplies a liquid to a substrate, a cover that is formed of a light transmitting material and installed on a component provided in the liquid supply unit and that provides an inspection area, and an inspection unit that inspects bubbles contained in the liquid flowing in the component provided in the inspection area. The inspection unit includes a light source that applies light toward the inspection area from outside the cover, a light receiving part that is located outside the cover and that receives the light passing through the inspection area, and an inspection part that inspects the bubbles from the light received by the light receiving part.