SEMICONDUCTOR DEVICES WITH CLASS IV CHANNEL REGION AND CLASS III-V DRIFT REGION

    公开(公告)号:US20220262945A1

    公开(公告)日:2022-08-18

    申请号:US17248983

    申请日:2021-02-16

    Abstract: Diodes, transistors, and other devices having a class IV channel region and a class III-V drift region are described. The class IV channel region, such as a Si channel region, is able to provide all associated advantages, such as ease of manufacturing of many different types of devices, using cost-effective materials and techniques. Meanwhile, the III-V drift region provides substantially lower Ron_sp than a conventional class IV drift region, and substantially enhances the operational behaviors of resulting devices, without sacrificing other parameters, such as size or breakdown voltage.

    SEMICONDUCTOR DESIGN OPTIMIZATION USING AT LEAST ONE NEURAL NETWORK

    公开(公告)号:US20220207351A1

    公开(公告)日:2022-06-30

    申请号:US17137773

    申请日:2020-12-30

    Abstract: According to an aspect, a semiconductor design system includes at least one neural network including a first predictive model and a second predictive model, where the first predictive model is configured to predict a first characteristic of a semiconductor device, and the second predictive model is configured to predict a second characteristic of the semiconductor device. The semiconductor design system includes an optimizer configured to use the neural network to generate a design model based on a set of input parameters, where the design model includes a set of design parameters for the semiconductor device such that the first characteristic and the second characteristic achieve respective threshold conditions.

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