Abstract:
A semiconductor integrated circuit device, a method of manufacturing the same, and a method of driving the same are provided. The device includes a semiconductor substrate, an upper electrode extending from a surface of the semiconductor substrate; a plurality of switching structures extending from both sidewalls of the upper electrode in a direction parallel to the surface of the semiconductor substrate, and a phase-change material layer disposed between the plurality of switching structures and the upper electrode.
Abstract:
A memory cell array includes a semiconductor substrate, a first word line formed on the semiconductor substrate, a second word line formed on the semiconductor substrate and extending substantially parallel to the first word line, a first inter-pattern insulating layer interposed between the first and second word lines, first active pillars formed within the first word line and arranged along the first word line at a first interval, and second active pillars formed within the second word lines, and arranged along the second word line to face the first active pillars, respectively, with the first inter-pattern insulating layer interposed therebetween.
Abstract:
A data processing system includes a central processing unit (CPU), a control block configured to interface with the CPU, a cache memory configured to interface with the control block and arranged to be spaced from the CPU by a first distance, and a combined memory block configured to interface with the control block, arranged to be spaced from the CPU by a second distance larger than the first distance, and configured of a working memory and a storage memory. The combined memory block is configured of a plurality of stacked memory layers, each configured of a plurality of variable resistance memory cells. The working memory is allocated to one memory layer selected among the plurality of memory layers. The storage memory is allocated to remaining memory layers among the plurality of memory layers.
Abstract:
A semiconductor memory device includes a semiconductor substrate, an active region including a plurality of unit active regions and disposed over and spaced from the semiconductor substrate, a pair of word lines formed on a top surface and sides of the unit active region, a dummy word line disposed at a contact of the unit active regions and formed on top surfaces and sides of the unit active regions, a source region in the unit active region between the pair of word lines and electrically connected to the semiconductor substrate, drain regions formed in the unit active region between the pair of word lines and the dummy word line, and first storage layers formed on the drain regions and electrically connected to the drain regions.
Abstract:
A semiconductor integrated circuit device, a method of manufacturing the same, and a method of driving the same are provided. The device includes a semiconductor substrate, an upper electrode extending from a surface of the semiconductor substrate; a plurality of switching structures extending from both sidewalls of the upper electrode in a direction parallel to the surface of the semiconductor substrate, and a phase-change material layer disposed between the plurality of switching structures and the upper electrode.