公开(公告)号：US11837678B2

公开(公告)日：2023-12-05

申请号：US17486219

申请日：2021-09-27

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Charles Baudot ,  Sebastien Cremer ,  Nathalie Vulliet ,  Denis Pellissier-Tanon

IPC: H01L27/146 ,  H01L31/109 ,  H01L31/18 ,  H01L31/0232 ,  H01L31/028 ,  H01L31/105

CPC classification number: H01L31/109 ,  H01L31/028 ,  H01L31/02327 ,  H01L31/105 ,  H01L31/1804

Abstract: A photodiode includes an active area formed by intrinsic germanium. The active area is located within a cavity formed in a silicon layer. The cavity is defined by opposed side walls which are angled relative to a direction perpendicular to a bottom surface of the silicon layer. The angled side walls support epitaxial growth of the intrinsic germanium with minimal lattice defects.

公开(公告)号：US11784275B2

公开(公告)日：2023-10-10

申请号：US17308651

申请日：2021-05-05

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Charles Baudot ,  Sebastien Cremer ,  Nathalie Vulliet ,  Denis Pellissier-Tanon

IPC: H01L33/00 ,  H01L31/105 ,  H01L31/0232 ,  G02B6/12 ,  H01L31/028

CPC classification number: H01L31/105 ,  G02B6/12004 ,  H01L31/028 ,  H01L31/02327

Abstract: A vertical photodiode includes an active area. The contacting pads for the diode terminals are laterally shifted away from the active area so as to not be located above or below the active area. The active area is formed in a layer of semiconductor material by a lower portion of a germanium area that is intrinsic and an upper portion of the germanium area that is doped with a first conductivity type. The vertical photodiode is optically coupled to a waveguide formed in the layer of semiconductor material.

公开(公告)号：US20230074527A1

公开(公告)日：2023-03-09

申请号：US17988141

申请日：2022-11-16

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Sebastien Cremer

IPC: G02F1/1333 ,  G02B6/13 ,  G02F1/01

Abstract: A method includes forming a layer made of a first insulating material on a first layer made of a second insulating material that covers a support, defining a waveguide made of the first material in the layer of the first material, covering the waveguide made of the first material with a second layer of the second material, planarizing an upper surface of the second layer of the second material, and forming a single-crystal silicon layer over the second layer.

公开(公告)号：US11145779B2

公开(公告)日：2021-10-12

申请号：US16294645

申请日：2019-03-06

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Charles Baudot ,  Sebastien Cremer ,  Nathalie Vulliet ,  Denis Pellissier-Tanon

IPC: H01L27/092 ,  H01L29/16 ,  H01L29/04 ,  H01L29/20 ,  H01L31/109 ,  H01L31/18 ,  H01L31/0232 ,  H01L31/028 ,  H01L31/105

Abstract: A photodiode includes an active area formed by intrinsic germanium. The active area is located within a cavity formed in a silicon layer. The cavity is defined by opposed side walls which are angled relative to a direction perpendicular to a bottom surface of the silicon layer. The angled side walls support epitaxial growth of the intrinsic germanium with minimal lattice defects.

公开(公告)号：US20210018790A1

公开(公告)日：2021-01-21

申请号：US16931202

申请日：2020-07-16

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Sebastien Cremer

IPC: G02F1/1333 ,  G02F1/01 ,  G02B6/13

Abstract: A method includes forming a layer made of a first insulating material on a first layer made of a second insulating material that covers a support, defining a waveguide made of the first material in the layer of the first material, covering the waveguide made of the first material with a second layer of the second material, planarizing an upper surface of the second layer of the second material, and forming a single-crystal silicon layer over the second layer.

公开(公告)号：US10511147B2

公开(公告)日：2019-12-17

申请号：US15992573

申请日：2018-05-30

Applicant: Commissariat A L'Energie Atomique et aux Energies Alternatives ,  STMICROELECTRONICS SA ,  STMICROELECTRONICS (CROLLES 2) SAS

Inventor： Thomas Ferrotti ,  Badhise Ben Bakir ,  Alain Chantre ,  Sebastien Cremer ,  Helene Duprez

IPC: H01S5/125 ,  H01S5/12 ,  H01S5/02 ,  H01S5/026 ,  H01S5/10 ,  H01S5/343 ,  H01S5/022 ,  H01S5/042 ,  H01S5/187 ,  H01S5/323 ,  G02B6/12 ,  G02B6/30 ,  G02B6/34

Abstract: The invention relates to a III-V heterostructure laser device (1) arranged in and/or on silicon, comprising: a III-V heterostructure gain medium (3); and an optical rib waveguide (11), arranged facing the gain medium (3) and comprising a slab waveguide (15) equipped with a longitudinal rib (17), the optical rib waveguide (11) being arranged in the silicon. The optical rib waveguide (11) is oriented so that at least one Bragg grating (19, 19a, 19b) is arranged on that side (21) of the slab waveguide (15) which is proximal relative to the gain medium (3) and in that the rib (17) is placed on that side (23) of the slab waveguide (15) that is distal relative to the gain medium (3).

公开(公告)号：US11531224B2

公开(公告)日：2022-12-20

申请号：US16931202

申请日：2020-07-16

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Sebastien Cremer

IPC: G02F1/1333 ,  G02B6/13 ,  G02F1/01

Abstract: A method includes forming a layer made of a first insulating material on a first layer made of a second insulating material that covers a support, defining a waveguide made of the first material in the layer of the first material, covering the waveguide made of the first material with a second layer of the second material, planarizing an upper surface of the second layer of the second material, and forming a single-crystal silicon layer over the second layer.

公开(公告)号：US20180278021A1

公开(公告)日：2018-09-27

申请号：US15992573

申请日：2018-05-30

Applicant: Commissariat A L'Energie Atomique et aux Energies Alternatives ,  STMICROELECTRONICS SA ,  STMICROELECTRONICS (CROLLES 2) SAS

Inventor： Thomas Ferrotti ,  Badhise Ben Bakir ,  Alain Chantre ,  Sebastien Cremer ,  Helene Duprez

IPC: H01S5/12 ,  H01S5/10 ,  H01S5/026 ,  H01S5/02 ,  H01S5/343 ,  H01S5/022 ,  G02B6/12 ,  G02B6/34 ,  G02B6/30 ,  H01S5/187 ,  H01S5/323 ,  H01S5/042

CPC classification number: H01S5/1237 ,  G02B6/30 ,  G02B6/34 ,  G02B2006/12061 ,  G02B2006/12121 ,  H01L2224/32 ,  H01S5/021 ,  H01S5/0215 ,  H01S5/02284 ,  H01S5/026 ,  H01S5/0421 ,  H01S5/1014 ,  H01S5/1032 ,  H01S5/1231 ,  H01S5/187 ,  H01S5/323 ,  H01S5/343 ,  H01S2301/166

Abstract: The invention relates to a III-V heterostructure laser device (1) arranged in and/or on silicon, comprising: a III-V heterostructure gain medium (3); and an optical rib waveguide (11), arranged facing the gain medium (3) and comprising a slab waveguide (15) equipped with a longitudinal rib (17), the optical rib waveguide (11) being arranged in the silicon. The optical rib waveguide (11) is oriented so that at least one Bragg grating (19, 19a, 19b) is arranged on that side (21) of the slab waveguide (15) which is proximal relative to the gain medium (3) and in that the rib (17) is placed on that side (23) of the slab waveguide (15) that is distal relative to the gain medium (3).

公开(公告)号：US20160056612A1

公开(公告)日：2016-02-25

申请号：US14827429

申请日：2015-08-17

Applicant: Commissariat A L'Energie Atomique et aux Energies Alternatives ,  STMICROELECTRONICS SA ,  STMICROELECTRONICS (CROLLES 2) SAS

Inventor： Thomas Ferrotti ,  Badhise Ben Bakir ,  Alain Chantre ,  Sebastien Cremer ,  Helene Duprez

IPC: H01S5/12 ,  H01S5/02 ,  H01S5/343

CPC classification number: H01S5/1237 ,  G02B6/30 ,  G02B6/34 ,  G02B2006/12061 ,  G02B2006/12121 ,  H01L2224/32 ,  H01S5/021 ,  H01S5/0215 ,  H01S5/02284 ,  H01S5/026 ,  H01S5/0421 ,  H01S5/1014 ,  H01S5/1032 ,  H01S5/1231 ,  H01S5/187 ,  H01S5/323 ,  H01S5/343 ,  H01S2301/166

Abstract: The invention relates to a III-V heterostructure laser device (1) arranged in and/or on silicon, comprising:a III-V heterostructure gain medium (3); andan optical rib waveguide (11), arranged facing the gain medium (3) and comprising a slab waveguide (15) equipped with a longitudinal rib (17), the optical rib waveguide (11) being arranged in the silicon.The optical rib waveguide (11) is oriented so that at least one Bragg grating (19, 19a, 19b) is arranged on that side (21) of the slab waveguide (15) which is proximal relative to the gain medium (3) and in that the rib (17) is placed on that side (23) of the slab waveguide (15) that is distal relative to the gain medium (3).

Abstract translation: 本发明涉及一种布置在硅中和/或硅上的III-V异质结构激光器件，包括：III-V异质结构增益介质; 以及面向所述增益介质（3）布置并包括配备有纵向肋（17）的平板波导（15）的光学肋波导（11），所述光学波纹管（11）布置在所述硅中。 光学肋波导（11）被定向成使得至少一个布拉格光栅（19,19a，19b）布置在相对于增益介质（3）近端的平板波导（15）的该侧（21）上， 因为肋（17）被放置在相对于增益介质（3）远端的平板波导（15）的该侧（23）上。

公开(公告)号：US12147105B2

公开(公告)日：2024-11-19

申请号：US17988141

申请日：2022-11-16

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Sebastien Cremer

IPC: G02F1/1333 ,  G02B6/13 ,  G02F1/01

Abstract: A method includes forming a layer made of a first insulating material on a first layer made of a second insulating material that covers a support, defining a waveguide made of the first material in the layer of the first material, covering the waveguide made of the first material with a second layer of the second material, planarizing an upper surface of the second layer of the second material, and forming a single-crystal silicon layer over the second layer.