公开(公告)号：US20160218385A1

公开(公告)日：2016-07-28

申请号：US15092260

申请日：2016-04-06

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Chihiro HIRAIWA ,  Masatoshi MAJIMA ,  Tetsuya KUWABARA ,  Tomoyuki AWAZU ,  Naho MIZUHARA ,  Toshio UEDA ,  Hideyuki DOI ,  Toshiyuki KURAMOTO

IPC: H01M8/1007 ,  H01M8/1006 ,  H01M8/00

CPC classification number: H01M8/1007 ,  B01D53/32 ,  B01D2257/406 ,  B01D2258/0216 ,  H01M4/8885 ,  H01M8/004 ,  H01M8/0232 ,  H01M8/0245 ,  H01M8/0247 ,  H01M8/0637 ,  H01M8/086 ,  H01M8/1006 ,  H01M8/124 ,  H01M8/222 ,  H01M2008/1095 ,  H01M2008/1293 ,  H01M2008/147 ,  Y02E60/521 ,  Y02E60/525 ,  Y02E60/526 ,  Y02E60/566 ,  Y02P70/56

Abstract: Provided are a gas decomposition component, a method for producing a gas decomposition component, and a power generation apparatus. A gas decomposition component 10 includes a cylindrical-body MEA 7 including a first electrode 2 disposed on an inner-surface side, a second electrode 5 disposed on an outer-surface side, and a solid electrolyte 1 sandwiched between the first electrode and the second electrode; and a porous metal body 11s inserted on the inner-surface side of the cylindrical-body MEA and electrically connected to the first electrode, wherein the gas decomposition component further includes a porous conductive-paste-coated layer 11 g formed on an inner circumferential surface of the first electrode, and a metal mesh sheet 11 a disposed on an inner circumferential side of the conductive-paste-coated layer, and an electrical connection between the first electrode and the porous metal body is established through the conductive-paste-coated layer and the metal mesh sheet.

Abstract translation: 提供气体分解成分，气体分解成分的制造方法以及发电装置。 气体分解成分10包括：圆筒体MEA7，其包括设置在内表面侧的第一电极2，设置在外表面侧的第二电极5和夹在第一电极和第二电极之间的固体电解质1 电极; 以及插入在圆筒体MEA的内表面侧并与第一电极电连接的多孔金属体11s，其中气体分解成分还包括形成在内周面上的多孔导电糊涂层11g 以及设置在导电糊剂涂覆层的内周侧上的金属网片11a，并且通过导电膏涂层形成第一电极和多孔金属体之间的电连接 和金属网片。

公开(公告)号：US20130108788A1

公开(公告)日：2013-05-02

申请号：US13716886

申请日：2012-12-17

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： Eiryo TAKASUKA ,  Toshi UEDA ,  Toshiyuki KURAMOTO ,  Masaki UENO

IPC: C23C16/455

CPC classification number: C23C16/455 ,  C23C16/4401 ,  C23C16/45517 ,  C23C16/45519 ,  C23C16/45565 ,  C30B25/165 ,  C30B29/403 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  Y10T428/31504

Abstract: A vapor-phase process apparatus and a vapor-phase process method capable of satisfactorily maintaining quality of processes even when different types of processes are performed are obtained. A vapor-phase process apparatus includes a process chamber, gas supply ports serving as a plurality of gas introduction portions, and a gas supply portion (a gas supply member, a pipe, a flow rate control device, a pipe, and a buffer chamber). The process chamber allows flow of a reaction gas therein. The plurality of gas supply ports are formed in a wall surface (upper wall) of the process chamber along a direction of flow of the reaction gas. The gas supply portion can supply a gas into the process chamber at a different flow rate from each of one gas supply port and another gas supply port different from that one gas supply port among the plurality of gas supply ports.