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    Method for forming transparent conductive film and transparent electrode
    1.
    发明申请
    Method for forming transparent conductive film and transparent electrode 审中-公开
    形成透明导电膜和透明电极的方法

    公开(公告)号：US20060251818A1

    公开(公告)日：2006-11-09

    申请号：US10541039

    申请日：2004-12-17

    申请人： Sadayuki Ukishima ,  Hideo Takei ,  Satoru Ishibashi ,  Tsutomu Atsuki ,  Masaaki Oda ,  Hiroshi Yamaguchi

    发明人： Sadayuki Ukishima ,  Hideo Takei ,  Satoru Ishibashi ,  Tsutomu Atsuki ,  Masaaki Oda ,  Hiroshi Yamaguchi

    IPC分类号： B05D3/02

    CPC分类号： C23C26/00 ,  G02F1/13439 ,  H05K1/092

    摘要： To the surface of a base material, there is applied, a dispersion containing fine particles of at least one metal selected from the group consisting of indium, tin, antimony, aluminum and zinc, fine particles of at least one alloy consisting of at least two metals specified above or a mixture of these fine particles, the coated layer is then fired in a vacuum atmosphere, an inert gas atmosphere, a reducing atmosphere; and subsequently the layer is fired in an oxidizing atmosphere. After this firing step in an oxidizing atmosphere, the coated layer may further be fired in a reducing atmosphere. The inert gas atmosphere is one comprising at least one inert gas selected from the group consisting of rare gases, carbon dioxide and nitrogen and the reducing atmosphere is one comprising at least one reducing gas selected from the group consisting of hydrogen, carbon monoxide and lower alcohols. A transparent electrode is composed of a transparent conductive film prepared according to the foregoing method. The present invention thus permits the formation of a transparent conductive film having a low resistance and a high transmittance while making use of a low temperature firing step.

    摘要翻译： 在基材表面上涂布含有选自铟，锡，锑，铝和锌中的至少一种金属的微粒的分散体，至少一种由至少两种 上述金属或这些细颗粒的混合物，然后在真空气氛，惰性气体气氛，还原气氛中烧制涂层; 随后在氧化气氛中烧制该层。 在氧化气氛中的该烧成工序后，可以在还原气氛中进一步烧成涂层。 惰性气体气氛是包含选自稀有气体，二氧化碳和氮气中的至少一种惰性气体的还原气体，还原气氛是选自氢，一氧化碳和低级醇中的至少一种还原气体 。 透明电极由根据前述方法制备的透明导电膜组成。 因此，本发明允许在利用低温烧制步骤的同时形成具有低电阻和高透射率的透明导电膜。

    Method for forming wiring film, transistor and electronic device
    3.
    发明授权
    Method for forming wiring film, transistor and electronic device 有权
    形成布线膜，晶体管和电子器件的方法

    公开(公告)号：US08218122B2

    公开(公告)日：2012-07-10

    申请号：US12475907

    申请日：2009-06-01

    申请人： Satoru Takasawa ,  Masaki Takei ,  Hirohisa Takahashi ,  Hiroaki Katagiri ,  Sadayuki Ukishima ,  Noriaki Tani ,  Satoru Ishibashi ,  Tadashi Masuda

    发明人： Satoru Takasawa ,  Masaki Takei ,  Hirohisa Takahashi ,  Hiroaki Katagiri ,  Sadayuki Ukishima ,  Noriaki Tani ,  Satoru Ishibashi ,  Tadashi Masuda

    IPC分类号： G02F1/13

    CPC分类号： H01L23/53238 ,  H01L21/2855 ,  H01L23/53233 ,  H01L27/124 ,  H01L2924/0002 ,  H05K1/0306 ,  H05K3/16 ,  H05K3/388 ,  H01L2924/00

    摘要： A wiring film having excellent adhesion and barrier property and a low resistance value is formed. An oxygen gas is introduced into a vacuum chamber in which an object to be film formed is disposed; a sputtering target is sputtered in a vacuum ambience containing oxygen; and a first metallic film is formed on a surface of the object to be film formed. The first sputtering target includes copper as a major component and at least one kind of additive elements selected from an additive element group consisting of Mg, Al, Si, Be, Ca, Sr, Ba, Ra, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb and Dy. Thereafter, a second metallic film is formed on a surface of the first metallic film by sputtering the sputtering target in a state in which the introduction of the oxygen gas into a vacuum ambience is stopped, and then a wiring film is formed by etching the first and second metallic films.

    摘要翻译： 形成具有优异的粘附性和阻隔性和低电阻值的布线膜。 将氧气引入其中设置有被成膜物体的真空室中; 溅射靶在含有氧的真空环境中溅射; 并且在待成膜物体的表面上形成第一金属膜。 第一溅射靶包括铜作为主要成分，以及选自由Mg，Al，Si，Be，Ca，Sr，Ba，Ra，Sc，Y，La，Ce组成的添加元素组中的至少一种添加元素， Pr，Nd，Pm，Sm，Eu，Gd，Tb和Dy。 此后，在将氧气引入真空环境的状态下，通过溅射溅射靶溅射溅射靶，在第一金属膜的表面上形成第二金属膜，然后通过蚀刻第一金属膜形成布线膜 和第二金属膜。

    Sputtering apparatus and film-forming processes
    4.
    发明申请
    Sputtering apparatus and film-forming processes 有权
    溅射装置和成膜工艺

    公开(公告)号：US20080210547A1

    公开(公告)日：2008-09-04

    申请号：US12010585

    申请日：2008-01-28

    申请人： Satoru Takasawa ,  Sadayuki Ukishima ,  Noriaki Tani ,  Satoru Ishibashi

    发明人： Satoru Takasawa ,  Sadayuki Ukishima ,  Noriaki Tani ,  Satoru Ishibashi

    IPC分类号： C23C14/35

    CPC分类号： C23C14/352 ,  C23C14/086 ,  C23C14/568 ,  H01J37/3266 ,  H01J37/32752 ,  H01J37/34 ,  H01J37/3408 ,  H01J37/347

    摘要： A sputtering apparatus for ensuring high target utilization efficiency is provided. The sputtering apparatus 1 of the present invention comprises a moving means 28a, 28b so that first and second magnet members 23a, 23b can be moved by the moving means 28a, 28b in planes parallel to the surfaces of first and second targets 21a, 21b. When the first and second magnet members 23a, 23b move, magnetic field lines as well as deeply eroded regions on the surfaces of the first and second targets 21a, 21b also move, whereby large areas on the surfaces of the first and second targets 21a, 21b are sputtered.

    摘要翻译： 提供了一种用于确保高目标利用效率的溅射装置。 本发明的溅射装置1包括移动装置28a，28b，使得第一和第二磁体构件23a，23b可以通过移动装置28a，28b在与第一和第二表面平行的平面中移动， 第二目标21a，21b。 当第一和第二磁性部件23a，23b移动时，第一和第二靶子21a，21b的表面上的磁场线以及深度侵蚀的区域也移动，由此第一和第二磁体23a的表面上的大面积 溅射第二靶21a，21b。

    Sputtering apparatus and film-forming processes
    5.
    发明授权
    Sputtering apparatus and film-forming processes 有权
    溅射装置和成膜工艺

    公开(公告)号：US08585872B2

    公开(公告)日：2013-11-19

    申请号：US12010585

    申请日：2008-01-28

    申请人： Satoru Takasawa ,  Sadayuki Ukishima ,  Noriaki Tani ,  Satoru Ishibashi

    发明人： Satoru Takasawa ,  Sadayuki Ukishima ,  Noriaki Tani ,  Satoru Ishibashi

    IPC分类号： C23C14/35

    CPC分类号： C23C14/352 ,  C23C14/086 ,  C23C14/568 ,  H01J37/3266 ,  H01J37/32752 ,  H01J37/34 ,  H01J37/3408 ,  H01J37/347

    摘要： A sputtering apparatus for ensuring high target utilization efficiency is provided. The sputtering apparatus 1 of the present invention comprises a moving means 28a, 28b so that first and second magnet members 23a, 23b can be moved by the moving means 28a, 28b in planes parallel to the surfaces of first and second targets 21a, 21b. When the first and second magnet members 23a, 23b move, magnetic field lines as well as deeply eroded regions on the surfaces of the first and second targets 21a, 21b also move, whereby large areas on the surfaces of the first and second targets 21a, 21b are sputtered.

    摘要翻译： 提供了一种用于确保高目标利用效率的溅射装置。 本发明的溅射装置1包括移动装置28a，28b，使得第一和第二磁体构件23a，23b可以通过移动装置28a，28b在平行于第一和第二目标21a，21b的表面的平面中移动。 当第一和第二磁体构件23a，23b移动时，第一和第二目标21a，21b的表面上的磁场线以及深蚀的区域也移动，从而第一和第二目标21a， 21b被溅射。

    Touch panel
    6.
    发明申请
    Touch panel 有权
    触控面板

    公开(公告)号：US20110298738A1

    公开(公告)日：2011-12-08

    申请号：US13137212

    申请日：2011-07-28

    申请人： Hirohisa Takahashi ,  Satoru Ishibashi ,  Noriaki Tani ,  Sadayuki Ukishima ,  Satoru Takasawa ,  Kyuzo Nakamura ,  Haruhiko Yamamoto

    发明人： Hirohisa Takahashi ,  Satoru Ishibashi ,  Noriaki Tani ,  Sadayuki Ukishima ,  Satoru Takasawa ,  Kyuzo Nakamura ,  Haruhiko Yamamoto

    IPC分类号： G06F3/041

    CPC分类号： G06F3/045

    摘要： A touch panel having high durability is provided. Either one or both of a display device and a flexible panel have island-shaped protective bodies formed on surfaces of electrode layers (upper electrode layer, lower electrode layer), and a transparent conductive film is exposed between the protective bodies. Since the protective bodies protrude highly from the surface of the transparent conductive film, when the flexible panel is pressed and the upper electrode and the lower electrode layer are brought into contact, a load to be applied to the transparent conductive film is reduced by the protective bodies, so that the transparent conductive film is not broken.

    摘要翻译： 提供了具有高耐久性的触摸面板。 显示装置和柔性面板中的任一个或两者具有形成在电极层（上电极层，下电极层）的表面上的岛状保护体，并且在保护体之间露出透明导电膜。 由于保护体从透明导电膜的表面突出高度突出，当按压柔性面板并使上部电极和下部电极层接触时，通过保护性 使透明导电膜不破裂。

    TOUCH PANEL AND METHOD FOR MANUFACTURING TOUCH PANEL
    7.
    发明申请
    TOUCH PANEL AND METHOD FOR MANUFACTURING TOUCH PANEL 有权
    触控面板和制造触控面板的方法

    公开(公告)号：US20100295811A1

    公开(公告)日：2010-11-25

    申请号：US12814039

    申请日：2010-06-11

    申请人： Hirohisa TAKAHASHI ,  Satoru Ishibashi ,  Noriaki Tani ,  Sadayuki Ukishima ,  Satoru Takasawa ,  Kyuzo Nakamura ,  Haruhiko Yamamoto

    发明人： Hirohisa TAKAHASHI ,  Satoru Ishibashi ,  Noriaki Tani ,  Sadayuki Ukishima ,  Satoru Takasawa ,  Kyuzo Nakamura ,  Haruhiko Yamamoto

    IPC分类号： G06F3/041

    CPC分类号： G06F3/045

    摘要： A touch panel having high durability is provided. Either one or both of a display device and a flexible panel have island-shaped protective bodies formed on surfaces of electrode layers (upper electrode layer, lower electrode layer), and a transparent conductive film is exposed between the protective bodies. Since the protective bodies protrude highly from the surface of the transparent conductive film, when the flexible panel is pressed and the upper electrode and the lower electrode layer are brought into contact, a load to be applied to the transparent conductive film is reduced by the protective bodies, so that the transparent conductive film is not broken.

    摘要翻译： 提供了具有高耐久性的触摸面板。 显示装置和柔性面板中的任一个或两者具有形成在电极层（上电极层，下电极层）的表面上的岛状保护体，并且在保护体之间露出透明导电膜。 由于保护体从透明导电膜的表面突出高度突出，当按压柔性面板并使上部电极和下部电极层接触时，通过保护性 使透明导电膜不破裂。

    Method for manufacturing solar cell, etching device, and CVD device
    10.
    发明授权
    Method for manufacturing solar cell, etching device, and CVD device 有权
    制造太阳能电池，蚀刻装置和CVD装置的方法

    公开(公告)号：US08420436B2

    公开(公告)日：2013-04-16

    申请号：US13126108

    申请日：2009-10-27

    申请人： Hirohisa Takahashi ,  Satoru Ishibashi ,  Sadayuki Ukishima ,  Masahide Matsubara ,  Satoshi Okabe

    发明人： Hirohisa Takahashi ,  Satoru Ishibashi ,  Sadayuki Ukishima ,  Masahide Matsubara ,  Satoshi Okabe

    IPC分类号： H01L31/0236

    CPC分类号： H01L31/022466 ,  C23C14/086 ,  C23C14/5853 ,  C23C14/5873 ,  H01L31/022483 ,  H01L31/02366 ,  H01L31/076 ,  H01L31/18 ,  H01L31/1884 ,  Y02E10/548

    摘要： A solar cell manufacturing method according to the present invention is a solar cell manufacturing method that forms a transparent conductive film of ZnO as an electric power extracting electrode on a light incident side, the method comprises at least in a following order: a process A forming the transparent conductive film on a substrate by applying a sputtering voltage to sputter a target made of a film formation material for the transparent conductive film; a process B forming a texture on a surface of the transparent conductive film; a process C cleaning the surface of the transparent conductive film on which the texture has been formed using an UV/ozone; and a process D forming an electric power generation layer on the transparent conductive film.

    摘要翻译： 根据本发明的太阳能电池制造方法是在光入射侧形成作为电力提取电极的ZnO的透明导电膜的太阳能电池制造方法，该方法至少按以下顺序形成：工艺A形成 通过施加溅射电压溅射由用于透明导电膜的成膜材料制成的靶的衬底上的透明导电膜; 在透明导电膜的表面上形成纹理的工艺B; 使用UV /臭氧清洗其上已形成纹理的透明导电膜的表面的工艺C; 以及在透明导电膜上形成发电层的工艺D。