公开(公告)号：US20150213755A1

公开(公告)日：2015-07-30

申请号：US14548111

申请日：2014-11-19

Applicant: Samsung Display Co., Ltd.

Inventor： Sung-Kyun PARK ,  Jung-Soo LEE ,  Jun CHUN ,  Jeong-Min PARK ,  Ji-Hyun KIM

IPC: G09G3/32 ,  B32B17/06 ,  B32B38/10 ,  B32B27/08

CPC classification number: B32B17/06 ,  B32B9/00 ,  B32B27/08 ,  B32B27/281 ,  B32B27/286 ,  B32B27/30 ,  B32B27/36 ,  B32B27/38 ,  B32B2307/412 ,  B32B2457/20 ,  H01L21/84 ,  Y10T428/24298

Abstract: A wall structure, method of manufacturing the same, and display panel including the wall structure are disclosed. In one aspect, the wall structure includes a plurality of first walls each extending in a first direction and a plurality of second walls each extending in a second direction crossing the first direction so as to form an intersection region between the first and second walls. The first and second walls are configured to define and surround a plurality of pixel regions of the display device. Each of the first and second walls has a width greater at the intersection region than the remaining non-intersection region.

Abstract translation: 公开了一种壁结构及其制造方法以及包括该壁结构的显示面板。 一方面，壁结构包括各自沿第一方向延伸的多个第一壁和多个第二壁，每个第二壁沿与第一方向交叉的第二方向延伸，以在第一和第二壁之间形成交叉区域。 第一和第二壁构造成限定和围绕显示装置的多个像素区域。 第一和第二壁中的每一个在交叉区域具有比剩余的非交叉区域更大的宽度。

公开(公告)号：US20150212411A1

公开(公告)日：2015-07-30

申请号：US14522771

申请日：2014-10-24

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sung-Kyun PARK ,  Jeong-Min PARK ,  Jung-Soo LEE ,  Ji-Hyun KIM ,  Jun CHUN ,  Ki-Hyun CHO ,  Hyoc-Min YOUN ,  Tai-Hoon YEO ,  Jin-Sun KIM ,  Byung-Uk KIM

IPC: G03F7/038 ,  G03F7/30 ,  H01L21/027

CPC classification number: G03F7/038 ,  G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0755 ,  G03F7/30 ,  H01L21/02112 ,  H01L21/02118 ,  H01L21/311 ,  H01L27/1288

Abstract: A photoresist composition a photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer including at least five functional groups, about 1 to 50 parts by weight of a second acrylate monomer including at most four functional groups with respect to about 100 parts by weight of an acryl-copolymer.

Abstract translation: 光致抗蚀剂组合物包含约0.1至约30重量份的光引发剂，约1至50重量份的包含至少五个官能团的第一丙烯酸酯单体，约1至50重量份的第二 丙烯酸酯单体，相对于约100重量份的丙烯酸共聚物包括至多四个官能团。

公开(公告)号：US20150205204A1

公开(公告)日：2015-07-23

申请号：US14573624

申请日：2014-12-17

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun CHUN ,  Jeong-Min PARK ,  Sung-Kyun PARK ,  Ji-Hyun KIM ,  Jin-Ho JU ,  Hyoc-Min YOUN ,  Dong-Myung KIM ,  Jin-Sun KIM ,  Tai-Hoon YEO ,  Byung-Uk KIM

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F212/34 ,  C08F220/10 ,  C08F220/16 ,  C08F220/18 ,  C08F220/26 ,  G02F2001/13625 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0751 ,  G03F7/30 ,  H01L21/0274 ,  H01L21/31138 ,  H01L51/102

Abstract: A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKa value of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.

Abstract translation: 光致抗蚀剂组合物包括通过与酸反应可分解的酸不稳定聚合物，光酸产生剂，pKa值为9以下的有机碱和溶剂。 基于100重量份的酸不稳定聚合物，光酸产生剂为约1至约30重量份，有机碱为约0.1至约5重量份。 基于组合物的总重量，溶剂为约50至约90重量％。

公开(公告)号：US20180061895A1

公开(公告)日：2018-03-01

申请号：US15678640

申请日：2017-08-16

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jin-Seock KIM ,  Jong-Hee PARK ,  Bong-Won LEE ,  Seung-Bae KANG ,  Sang-Gab KIM ,  Jeong-Min PARK ,  Hyun-Eok SHIN

IPC: H01L27/32 ,  H01L51/52 ,  H01L51/50

CPC classification number: H01L27/322 ,  H01L27/3246 ,  H01L27/3258 ,  H01L27/3276 ,  H01L51/504 ,  H01L51/5237

Abstract: An OLED display device includes a substrate including a display region and a pad region, a display structure in the display region on the substrate, and a pad electrode structure in the pad region on the substrate, the pad electrode structure having a first pad electrode on the substrate, a first insulation layer covering opposite lateral portions of the first pad electrode and exposing a portion of an upper surface of the first pad electrode, a second pad electrode on the first pad electrode and on the first insulation layer, the second pad electrode having a step portion where the first pad electrode and the first insulation layer are overlapped, and a third pad electrode on the second pad electrode and on the first insulation layer, the third electrode covering the second pad electrode.

公开(公告)号：US20170256593A1

公开(公告)日：2017-09-07

申请号：US15444674

申请日：2017-02-28

Applicant: Samsung Display Co., Ltd.

Inventor： Yang-Ho JUNG ,  Chul-Won PARK ,  Jeong-Min PARK ,  Beung-Hwa JEONG

IPC: H01L27/32 ,  G06F3/041

CPC classification number: H01L27/323 ,  G06F3/041 ,  G06F2203/04103 ,  G06F2203/04111 ,  H01L27/3246 ,  H01L51/5253 ,  H01L2227/323

Abstract: A touch display panel including a thin-film transistor substrate including a thin-film transistor, a pixel defining layer disposed on the thin-film transistor substrate and including a first opening, a light emitting structure disposed in the first opening, a thin film encapsulation layer covering the light emitting structure and the pixel defining layer, a first metal pattern disposed on the thin film encapsulation layer, a first insulation pattern disposed on the first metal pattern and having the same shape as the first metal pattern in a plan view, a second metal pattern disposed on the first insulation pattern, and a second insulation layer disposed on the second metal pattern and the thin film encapsulation layer and covering the first metal pattern, the first insulation pattern and the second metal pattern.

公开(公告)号：US20150205200A1

公开(公告)日：2015-07-23

申请号：US14522713

申请日：2014-10-24

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jung-Soo LEE ,  Jeong-Min PARK ,  Sung-Kyun PARK ,  Jun CHUN ,  Ki-Hyun CHO ,  Ji-Hyun KIM ,  Dong-Min KIM ,  Seung-Ki KIM ,  Eun JEAGAL

IPC: G03F7/027 ,  H01L21/467 ,  H01L29/66 ,  G03F7/038

CPC classification number: H01L29/66969 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/0751 ,  G03F7/0755 ,  G03F7/0757 ,  H01L21/31144 ,  H01L27/1288

Abstract: A photoresist composition, a method of forming a pattern, and a method of manufacturing a thin film transistor substrate, the composition including a solvent, a novolak resin, a diazide-based photo-sensitizer, an acryl compound represented by the following Chemical Formula 1:

Abstract translation: 光致抗蚀剂组合物，形成图案的方法以及制造薄膜晶体管基板的方法，所述组合物包括溶剂，酚醛清漆树脂，重氮化物系光敏剂，由以下化学式1表示的丙烯酸化合物 ：

公开(公告)号：US20190355791A1

公开(公告)日：2019-11-21

申请号：US16530213

申请日：2019-08-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jin-Seock KIM ,  Jong-Hee PARK ,  Bong-Won LEE ,  Seung-Bae KANG ,  Sang-Gab KIM ,  Jeong-Min PARK ,  Hyun-Eok SHIN

IPC: H01L27/32 ,  H01L51/50 ,  H01L51/52

Abstract: An OLED display device includes a substrate including a display region and a pad region, a display structure in the display region on the substrate, and a pad electrode structure in the pad region on the substrate, the pad electrode structure having a first pad electrode on the substrate, a first insulation layer covering opposite lateral portions of the first pad electrode and exposing a portion of an upper surface of the first pad electrode, a second pad electrode on the first pad electrode and on the first insulation layer, the second pad electrode having a step portion where the first pad electrode and the first insulation layer are overlapped, and a third pad electrode on the second pad electrode and on the first insulation layer, the third electrode covering the second pad electrode.

公开(公告)号：US20150155161A1

公开(公告)日：2015-06-04

申请号：US14295463

申请日：2014-06-04

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun CHUN ,  Ji-Hyun KIM ,  Sung-Kyun PARK ,  Jeong-Min PARK ,  Jung-Soo LEE ,  Jin-Ho JU

IPC: H01L21/027 ,  G03F7/039

CPC classification number: G03F7/0392 ,  C08G77/14 ,  C08G77/26 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  G03F7/11 ,  H01L21/32139

Abstract: A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer.

Abstract translation: 制造图案的方法包括在基板上形成图案材料层，在图案材料层上形成保护层，在保护层上形成抗蚀剂层，选择性地使抗蚀剂层曝光，并使选择性曝光的抗蚀剂层显影 。