Abstract:
A photoresist composition, a method of forming a pattern, and a method of manufacturing a thin film transistor substrate, the composition including a solvent, a novolak resin, a diazide-based photo-sensitizer, an acryl compound represented by the following Chemical Formula 1:
Abstract:
A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKa value of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.
Abstract:
A method of manufacturing a touch screen panel, including forming first and second conductive layers and an organic insulating layer on a substrate; forming a first organic insulating pattern having a first thickness and a second organic insulating pattern having a second thickness, the second thickness being larger than the first thickness; forming first and second conductive patterns; exposing a part of the second conductive pattern to form a third organic insulating pattern having a thickness smaller than the second thickness; removing the exposed second conductive pattern; forming an organic insulating capping layer surrounding the first and second conductive patterns positioned under the third organic insulating pattern; and forming a third conductive layer on the first conductive pattern and the organic insulating capping layer, the first conductive pattern being exposed, and then forming a connection pattern electrically connected with the exposed first conductive pattern using a second mask.
Abstract:
A wall structure, method of manufacturing the same, and display panel including the wall structure are disclosed. In one aspect, the wall structure includes a plurality of first walls each extending in a first direction and a plurality of second walls each extending in a second direction crossing the first direction so as to form an intersection region between the first and second walls. The first and second walls are configured to define and surround a plurality of pixel regions of the display device. Each of the first and second walls has a width greater at the intersection region than the remaining non-intersection region.
Abstract:
A touch screen panel and manufacturing method thereof are disclosed. In one aspect, the touch screen panel includes a substrate, a plurality of first sensing electrodes formed over the substrate in a first direction and a plurality of second sensing electrodes formed over the substrate in a second direction. The touch screen panel also includes at least one insulating layer formed at intersections between the first and second sensing electrodes. The insulating layer has a line shape that extends in one of the first direction or the second direction and crosses the first or second sensing electrodes.
Abstract:
A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer.
Abstract:
A method of forming a touch screen panel including first sensing electrodes in an active region of a substrate and arranged along a first direction and second sensing electrodes arranged along a second direction intersecting the first direction, the method including forming the first sensing electrodes and first connection patterns, the first connection patterns connecting the first sensing electrodes along the first direction; forming an insulating pattern capping the first sensing electrodes and the first connection patterns so that the first sensing electrodes and the first connection patterns are not exposed; and forming the second sensing electrodes between the first sensing electrodes, and second connection patterns on the insulating pattern, the second connection patterns connecting the second sensing electrodes along the second direction.
Abstract:
A photoresist composition a photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer including at least five functional groups, about 1 to 50 parts by weight of a second acrylate monomer including at most four functional groups with respect to about 100 parts by weight of an acryl-copolymer.