摘要:
Provided are a method and robot device for sharing object data. The method, performed by a robot device, of sharing object data includes: obtaining sensing data related to objects in a certain space; classifying the obtained sensing data into a plurality of pieces of object data based on properties of the objects; selecting another robot device from among at least one other robot device; selecting object data to be provided to the selected robot device from among the classified plurality of pieces of object data; and transmitting the selected object data to the selected robot device, wherein the classifying of the sensing data into a plurality of pieces object data includes generating a plurality of data layers including the classified plurality of pieces of object data.
摘要:
A method of controlling a robot includes obtaining a first image and a second image of a plurality of objects, the first and second image being captured from different positions; obtaining, from the first and second images, a plurality of candidate positions corresponding to each of the plurality of objects, based on a capturing position of each of the first and second images and a direction to each of the plurality of objects from each capturing position; obtaining distance information between each capturing position and each of the plurality of objects in the first and second images by analyzing the first and second images; and identifying a position of each of the plurality of objects from among the plurality of candidate positions based on the distance information.
摘要:
An integrated circuit device includes: a semiconductor substrate having a cell region and a dummy region outside the cell region, a plurality of gate electrodes and a plurality of insulating layers, in the cell region, extending in first and second directions parallel to a main surface of the semiconductor substrate and alternately stacked in a third direction perpendicular to the main surface of the semiconductor substrate, the first and second directions crossing each other, and a plurality of dummy mold layers and a plurality of dummy insulating layers alternately stacked in the dummy region in the third direction, wherein a carbon concentration of an upper dummy mold layer of the plurality of dummy mold layers is less than a carbon concentration of a lower dummy mold layer of the plurality of dummy mold layers, the lower dummy mold layer being between the upper dummy mold layer and the main surface of the semiconductor substrate.
摘要:
Provided are an artificial intelligence (AI) system using a machine learning algorithm like deep learning, or the like, and an application thereof. A robotic cleaning apparatus that generates map data includes a communication interface comprising communication circuitry, a memory configured to store one or more instructions, and a processor configured to control the robotic cleaning apparatus by executing the one or more instructions. The processor is configured, by executing the one or more instructions, to control the robotic cleaning apparatus to: generate basic map data related to a cleaning space, and generate object information regarding at least one object in the cleaning space, the object information being generated based on information obtained by the robotic cleaning apparatus regarding the object in a plurality of different positions of the cleaning space, and including information about a type and a position of the object.
摘要:
A memory device includes a substrate and a plurality of vertical storage nodes linearly spaced apart on the substrate along a first direction. The device further includes at least one support pattern abutting sidewalls of the storage nodes, the at least one support pattern having portions that bridge first pairs of adjacent ones of the storage nodes and openings therein that separate second pairs of adjacent ones of the storage nodes. First distances between the storage nodes of the respective first pairs may be greater than second distances between the storage nodes of the respective second pairs. Methods of fabricating such devices are also described.
摘要:
A semiconductor device includes: a substrate including a memory cell region and a connection region; a plurality of gate lines vertically overlapping each other in the memory cell region of the substrate in a vertical direction, each gate line including a first metal; a stepped connection unit in the connection region and comprising a plurality of conductive pad regions, each conductive pad region including the first metal and integrally connected to a respective gate line of the plurality of gate lines; a plurality of contact structures vertically overlapping the stepped connection unit, each contact structure connected to a respectively corresponding conductive pad region of the plurality of conductive pad regions and including a second metal; and at least one metal silicide layer between at least one contact structure and the respectively corresponding conductive pad region.
摘要:
An integrated circuit memory device includes a stack structure on a semiconductor substrate. The stack structure includes a first gate stack group, which includes a plurality of spaced-apart first gate electrodes, and a second gate stack group, which includes a plurality of spaced-apart second gate electrodes. The second gate stack group extends on the first gate stack group so that the first gate stack group extends between the second gate stack group and the substrate. A plurality of active channel structures are provided, which penetrate vertically through the second gate stack group as upper channel structures and through the first gate stack group as lower channel structures. A plurality of dummy channel structures are provided, which penetrate vertically through the second gate stack group but not through the first gate stack group.
摘要:
A through via structure includes a through via and a capping pattern. The through via includes a metal pattern extending in a vertical direction, and a barrier pattern on a sidewall and a lower surface of the metal pattern. The capping pattern contacts an upper surface of the through via. A lowermost surface of an edge portion of the capping pattern is not higher than a lowermost surface of a central portion of the capping pattern.
摘要:
A memory device includes a substrate and a plurality of vertical storage nodes linearly spaced apart on the substrate along a first direction. The device further includes at least one support pattern abutting sidewalls of the storage nodes, the at least one support pattern having portions that bridge first pairs of adjacent ones of the storage nodes and openings therein that separate second pairs of adjacent ones of the storage nodes. First distances between the storage nodes of the respective first pairs may be greater than second distances between the storage nodes of the respective second pairs. Methods of fabricating such devices are also described.