公开(公告)号：US5157634A

公开(公告)日：1992-10-20

申请号：US602037

申请日：1990-10-23

申请人： Sang H. Dhong ,  Robert L. Franch ,  Wei Hwang

发明人： Sang H. Dhong ,  Robert L. Franch ,  Wei Hwang

IPC分类号： G11C11/401 ,  G11C11/406 ,  G11C29/00 ,  G11C29/04

CPC分类号： G11C11/406

摘要： A DRAM is described including a plurality of operable storage cells, each cell including a capacitance for storing a charge indicative of data. The charge tends to dissipate below an acceptable level after a predetermined time interval T1 for a majority of the operable cells and for a minority of the operable cells, it dissipates below the acceptable level after a shorter time interval T2. The time between DRAM refresh cycles is adjusted so as to be greater than time interval T2. The DRAM comprises: a plurality of redundant storage cells; a decoder for receiving the address of an operable memory cell and providing a first output if the address indicates one of the operable cells of the minority of cells and a second output if the address indicates one of the operable cells of the majority. A switching circuit is responsive to the first output to enable access of a redundant stoarge cell and to prevent access of the minority storage cell. In a preferred embodiment, the redundant storage cells are configured as static storage circuits.

摘要翻译： 描述了包括多个可操作的存储单元的DRAM，每个单元包括用于存储指示数据的电荷的电容。 对于大多数可操作单元，对于大多数可操作单元，对于少数可操作单元，电荷趋于在预定时间间隔T1之后消散到可接受的水平以下，在更短的时间间隔T2之后，其消耗低于可接受的水平。 DRAM刷新周期之间的时间被调整为大于时间间隔T2。 DRAM包括：多个冗余存储单元; 解码器，用于接收可操作存储器单元的地址，并且如果地址指示少数单元的可操作单元中的一个，并且如果地址指示多数的可操作单元之一，则提供第一输出。 开关电路响应于第一输出以使得能够访问冗余的存储单元并且防止少数存储单元的访问。 在优选实施例中，冗余存储单元被配置为静态存储电路。

公开(公告)号：US5292678A

公开(公告)日：1994-03-08

申请号：US882735

申请日：1992-05-14

申请人： Sang H. Dhong ,  Wei Hwang

发明人： Sang H. Dhong ,  Wei Hwang

IPC分类号： H01L27/10 ,  H01L21/8242 ,  H01L27/108 ,  H01L21/265

CPC分类号： H01L27/10805 ,  H01L27/10829 ,  Y10S257/907

摘要： A new interdigitated folded bit line (IFBL) architecture for a future generation high density semiconductor memory design is disclosed. In the architecture, the basic cross-point memory cells are organized orthogonally in rows and columns to form an array matrix. The bit lines run in a row direction while the word lines run in a column direction. Transfer transistors are designed to be shared with the same drain junction and the same bit line contact in order to save area. A choice of at least two described embodiments are provided. In one embodiment, referred to as the offset bit line structure, the bit lines are constructed by using two layers of interconnection lines to connect the interdigitated cells associated to it. By connecting the bit line contacts and with two different interconnecting layers and in an alternating row order, the true and complement bit lines and will run parallel to both sides of the memory array. In another embodiment, referred to as the side wall bit line structure, the bit lines are constructed by using the conductive side wall spacer rails to connect the interdigitated cells associated to it. By connecting the side wall bit line contacts with two sided-side wall spacer rails in an alternating row order, the true and complement bit lines will run parallel to both sides of the memory array.

摘要翻译： 公开了一种用于未来一代高密度半导体存储器设计的新的叉指折叠位线（IFBL）架构。 在架构中，基本交叉点存储单元以行和列正交组织以形成阵列矩阵。 位线在行方向上运行，而字线在列方向上运行。 传输晶体管被设计为与相同的漏极结和相同的位线接触共享，以节省面积。 提供了至少两个描述的实施例的选择。 在一个实施例中，称为偏移位线结构，位线通过使用两层互连线来连接与其相关联的交叉指示的单元来构造。 通过连接位线触点和两个不同的互连层并以交替的行顺序，真和补码位线将平行于存储器阵列的两侧延伸。 在称为侧壁位线结构的另一实施例中，位线通过使用导电侧壁间隔轨道来连接与其相关联的叉指式电池而构成。 通过以交替的行顺序将侧壁位线触点与双面侧壁间隔轨连接，真和补补位线将平行于存储器阵列的两侧延伸。

公开(公告)号：US5250829A

公开(公告)日：1993-10-05

申请号：US818668

申请日：1992-01-09

申请人： Gary B. Bronner ,  Sang H. Dhong ,  Wei Hwang

发明人： Gary B. Bronner ,  Sang H. Dhong ,  Wei Hwang

IPC分类号： H01L27/04 ,  H01L21/822 ,  H01L21/8242 ,  H01L27/10 ,  H01L27/108 ,  H01L27/02 ,  H01L29/78

CPC分类号： H01L27/10829

摘要： A high density substrate plate DRAM cell memory device and process are described in which a buried well region is formed adjacent to deep trench capacitors such that the substrate region of DRAM transfer FETs can be electrically isolated from other FETs on a semiconductor substrate. The buried region is partially formed by ion implantation and diffusion to intersect the walls of the deep trenches.

摘要翻译： 描述了高密度衬底板DRAM单元存储器件和工艺，其中与深沟槽电容器相邻形成掩埋阱区，使得DRAM转移FET的衬底区域可以与半导体衬底上的其它FET电隔离。 掩埋区域通过离子注入和扩散部分形成，以与深沟槽的壁相交。

公开(公告)号：US5075571A

公开(公告)日：1991-12-24

申请号：US636840

申请日：1991-01-02

申请人： Sang H. Dhong ,  Wei Hwang ,  Yoichi Taira

发明人： Sang H. Dhong ,  Wei Hwang ,  Yoichi Taira

IPC分类号： G11C11/407 ,  G11C11/408 ,  H01L21/76 ,  H01L21/8242 ,  H01L27/10 ,  H01L27/108 ,  H03K5/02

CPC分类号： H03K5/023 ,  G11C11/4085

摘要： A wordline driver circuit is shown for a DRAM, the circuit comprising a PMOS transistor structure having one contact coupled to a wordline, a second contact coupled to a negative voltage supply and a gate coupled to a control input, the transistor having an N-well about the gate, first and second contacts. An isolating structure is positioned about the N-well to enable it to be a separately controlled from surrounding N-well structures. Pulse circuits are coupled to the transistor for applying, when activated, a potential that enables the wordline to transition to a more negative potential. A bias circuit is also provided for biasing the N-well at a first potential and a second lower potential, the second lower potential applied when the pulse circuits are activated. As a result, body effects in the PMOS transistor are minimized while at the same time enabling a boost potential to be applied to the wordline.

公开(公告)号：US4954854A

公开(公告)日：1990-09-04

申请号：US355232

申请日：1989-05-22

申请人： Sang H. Dhong ,  Wei Hwang ,  Nicky Chau-Chun Lu

发明人： Sang H. Dhong ,  Wei Hwang ,  Nicky Chau-Chun Lu

IPC分类号： H01L21/223 ,  H01L21/8242 ,  H01L21/8246 ,  H01L27/10 ,  H01L27/108 ,  H01L27/112 ,  H01L29/78

CPC分类号： H01L27/10844 ,  H01L21/2236 ,  H01L27/10838 ,  H01L29/7827 ,  H01L29/7834 ,  H01L27/112

摘要： A structure and fabrication process for a self-aligned, lightly-doped drain/source n-channel field-effect transistor wherein a trench is formed in a well region in a wafer including an epitaxial layer on a substrate. A first, heavily doped drain region and bit line element is formed around the trench on the surface of the well, and a second, lightly-doped drain region is formed proximate to the first drain region and self-aligned to the trench sidewalls. A source region is located beneath the trench, which is filled with polysilicon, above which is gate and further polysilicon forming a transfer wordline. The well region at the trench sidewalls are doped to control the device threshold level, and the device is thereby also located at a wordline/bitline cross-point.

公开(公告)号：US4922128A

公开(公告)日：1990-05-01

申请号：US296995

申请日：1989-01-13

申请人： Sang H. Dhong ,  Wei Hwang ,  Nicky C. Lu

发明人： Sang H. Dhong ,  Wei Hwang ,  Nicky C. Lu

IPC分类号： G11C11/407 ,  G11C8/18 ,  G11C29/00

CPC分类号： G11C29/84 ,  G11C8/18

摘要： A boost clock signal generator which provides a boost clock signal from a pair of phase clocks. A pair of differentially-connected FET transistors which generate a boost clock signal. The transistors have drain connections connected to each of two clock signals, and commonly connected sources which form an output terminal for the boost clock signal. A series pass FET transistor is connected with each gate of the differential transistors for maintaining the gate at a floating voltage potential. A pair of capacitive elements couple the drain of each pair of differentially-connected FET transistors to the gate of an opposite transistor. A first and second logic circuit are connected to the series pass FET transistors for enabling one or the other of the differnetially-connected FET transistors into conduction. The pair of capacitive coupling elements coupling the drain of each pair of differentially-connected FET transistors to the gate of an opposite transistor increase switching speed of the clock signal generator.

公开(公告)号：US5453953A

公开(公告)日：1995-09-26

申请号：US281236

申请日：1994-07-27

申请人： Sang H. Dhong ,  Hyun J. Shin ,  Wei Hwang

发明人： Sang H. Dhong ,  Hyun J. Shin ,  Wei Hwang

IPC分类号： G11C11/407 ,  G11C5/14 ,  G11C8/08 ,  H01L21/822 ,  H01L27/04 ,  G05F3/24

CPC分类号： G11C8/08 ,  G11C5/147

摘要： A voltage regulator is provided for controlling an on-chip voltage generator which produces a boost voltage across a charge reservoir for supply to one input of a plurality of word line drivers in a memory array. The regulator is configured such that the charge reservoir voltage will track the power supply voltage and the difference between the power supply voltage and the charge reservoir voltage will be maintained substantially constant over a predefined power supply range. The voltage regulator includes a bandgap reference generator, a first differential circuit for producing a transition voltage from the reference voltage and the power supply voltage, a first transistor for comparing the power supply voltage with the boost voltage, a second transistor for comparing the transition voltage with the reference voltage and a latching comparator for equating the signal outputs from the first and second transistors so as to define a control signal for the on-chip voltage generator. Along with further specific details of the voltage regulator, a preferred bandgap reference generator is described.

摘要翻译： 提供电压调节器用于控制片上电压发生器，其在电荷储存器两端产生升压电压，以供给存储器阵列中的多个字线驱动器的一个输入端。 调节器被配置为使得电荷储存器电压将跟踪电源电压，并且电源电压和电荷储存器电压之间的差将在预定义的电源范围内保持基本上恒定。 电压调节器包括带隙参考发生器，用于从参考电压和电源电压产生转换电压的第一差分电路，用于将电源电压与升压电压进行比较的第一晶体管，用于将转换电压 与参考电压和锁存比较器，用于使来自第一和第二晶体管的信号输出相等，以便为片上电压发生器定义一个控制信号。 除了电压调节器的进一步具体细节之外，还描述了优选的带隙参考发生器。

公开(公告)号：US5300800A

公开(公告)日：1994-04-05

申请号：US966893

申请日：1992-10-26

申请人： Gary B. Bronner ,  Sang H. Dhong ,  Wei Hwang

发明人： Gary B. Bronner ,  Sang H. Dhong ,  Wei Hwang

IPC分类号： H01L21/76 ,  H01L21/8242 ,  H01L27/10 ,  H01L27/108 ,  H01L29/68 ,  H01L29/78 ,  H01L29/92

CPC分类号： H01L27/10829

摘要： Disclosed is a Dynamic Random Access Memory (DRAM) cell which includes a storage capacitor disposed in a trench formed in a semiconductor substrate and an access transistor disposed in a well which is opposite in conductivity type to that of the substrate and a buried oxide collar which surrounds an upper portion of the trench.

摘要翻译： 公开了一种动态随机存取存储器（DRAM）单元，其包括设置在形成在半导体衬底中的沟槽中的存储电容器和设置在与衬底的导电类型相反的阱中的存取晶体管和埋入氧化物环， 围绕沟槽的上部。

公开(公告)号：US5214603A

公开(公告)日：1993-05-25

申请号：US740758

申请日：1991-08-05

申请人： Sang H. Dhong ,  Wei Hwang ,  Lewis M. Terman ,  Matthew R. Wordeman

发明人： Sang H. Dhong ,  Wei Hwang ,  Lewis M. Terman ,  Matthew R. Wordeman

IPC分类号： H01L27/04 ,  H01L21/822 ,  H01L21/8242 ,  H01L27/10 ,  H01L27/108

CPC分类号： H01L27/10832

摘要： A folded bitline DRAM cell is described which includes a trench capacitor and a planar-configured access transistor. The access transistor is stacked over the capacitor and has a first terminal connected thereto. The access transistor includes a planar-oriented gate. A first wordline has a minor surface in contact with the gate and a major surface that is oriented orthogonally to the gate. An insulating pedestal is positioned adjacent the gate and a passing wordline is positioned on the pedestal, the passing wordline having a major surface parallel to the first wordline. In another embodiment, the folded bitline DRAM cell includes a vertically oriented access transistor having one terminal formed on the upper extent of a contact to the trench capacitor, to provide optimum electrical connection thereto.

公开(公告)号：US5107459A

公开(公告)日：1992-04-21

申请号：US513315

申请日：1990-04-20

申请人： Christopher M. Chu ,  Sang H. Dhong ,  Wei Hwang ,  Nicky C-C. Lu

发明人： Christopher M. Chu ,  Sang H. Dhong ,  Wei Hwang ,  Nicky C-C. Lu

IPC分类号： H01L27/10 ,  G11C11/401 ,  G11C11/4097 ,  H01L21/8242 ,  H01L27/108

CPC分类号： H01L27/10841 ,  G11C11/4097

摘要： A stacked bit-line architecture utilizing high density cross-point memory arrays forms a DRAM semiconductor memory device. The true and complementary bit-line pairs connected to the respective memory cell arrays are formed in two metal layers, one above the other. A bit-line interconnector region is provided that uses a third interconnection layer together with the first and second layers to transpose the vertical stacking of each pair and to transpose the planar alignment of adjacent bit-line pairs. The DRAM memory cell array has a high density cross-point memory cell architecture that behaves electrically as a folded bit-line array.