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12 条记录 (耗时 0.027 秒)

    Direct patterning of silicon by photoelectrochemical etching
    4.
    发明申请
    Direct patterning of silicon by photoelectrochemical etching 有权
    通过光电化学蚀刻直接图案化硅

    公开(公告)号：US20050009374A1

    公开(公告)日：2005-01-13

    申请号：US10838859

    申请日：2004-05-04

    申请人： Jun Gao ,  Michael Sailor ,  Sangeeta Bhatia ,  Christopher Flaim

    发明人： Jun Gao ,  Michael Sailor ,  Sangeeta Bhatia ,  Christopher Flaim

    IPC分类号： B81C1/00 ,  C25F3/12 ,  C25F3/14 ,  H01L21/26 ,  H01L21/3063

    CPC分类号： B81C1/00515 ,  B81C2201/0114 ,  B81C2201/0115 ,  C25F3/12 ,  C25F3/14 ,  H01L21/3063

    摘要： The invention is directed to methods for direct patterning of silicon. The invention provides the ability to fabricate complex surfaces in silicon with three dimensional features of high resolution and complex detail. The invention is suitable, for example, for use in soft lithography as embodiments of the invention can quickly create a master for use in soft lithography. In an embodiment of the invention, electrochemical etching of silicon, such as a silicon wafer, for example, is conducted while at least a portion of the silicon surface is exposed to an optical pattern. The etching creates porous silicon in the substrate, and removal of the porous silicon layer leaves a three-dimensional structure correlating to the optical pattern.

    摘要翻译： 本发明涉及直接图案化硅的方法。 本发明提供了在硅中制造具有高分辨率和复杂细节的三维特征的复杂表面的能力。 本发明适用于例如在软光刻中使用，因为本发明的实施例可以快速地创建用于软光刻的母版。 在本发明的一个实施例中，例如硅的电化学蚀刻被进行，同时硅表面的至少一部分暴露于光学图案。 蚀刻在衬底中产生多孔硅，并且去除多孔硅层留下与光学图案相关的三维结构。

    Use of steady-state oxygen gradients to modulate animal cell functions
    7.
    发明申请
    Use of steady-state oxygen gradients to modulate animal cell functions 审中-公开
    使用稳态氧梯度来调节动物细胞功能

    公开(公告)号：US20060258000A1

    公开(公告)日：2006-11-16

    申请号：US10547057

    申请日：2004-02-26

    申请人： Jared Allen ,  Sangeeta Bhatia

    发明人： Jared Allen ,  Sangeeta Bhatia

    IPC分类号： C12N5/06 ,  C12M1/00 ,  C12N5/08

    CPC分类号： C12M41/34

    摘要： The disclosure provides a bioreactor that allows steady-state oxygen gradients to be imposed upon in vitro culture systems. The bioreactor system of the disclosure has been applied to liver zonation and have shown that physiological oxygen gradients contribute to heterogeneity of tissue cultures in vitro.

    摘要翻译： 本公开提供了允许稳态氧梯度施加于体外培养系统的生物反应器。 本公开的生物反应器系统已经应用于肝脏分区，并且已经显示生理氧梯度有助于体外组织培养物的异质性。

    Microfabricated biopolymer scaffolds and method of making same
    9.
    发明申请
    Microfabricated biopolymer scaffolds and method of making same 有权
    微生物聚合物支架及其制备方法

    公开(公告)号：US20050008675A1

    公开(公告)日：2005-01-13

    申请号：US10750293

    申请日：2003-12-31

    申请人： Sangeeta Bhatia ,  Giovanni Vozzi

    发明人： Sangeeta Bhatia ,  Giovanni Vozzi

    IPC分类号： B29C67/20 ,  A61F2/00 ,  B29C41/34

    CPC分类号： A61F2/00 ,  B29C67/202 ,  Y10T428/24273 ,  Y10T428/24322 ,  Y10T428/26 ,  Y10T428/269

    摘要： The invention is a series of soft lithographic methods for the microfabrication of biopoilymer scaffolds for use in tissue engineering and the development of artificial organs. The methods present a wide range of possibilities to construct two- and three-dimensional scaffolds with desired characteristics according to the final application. The methods utilize an elastomer mold which the biopolymer scaffold is cast. The methods allow for the rapid and inexpensive production of biopolymer scaffolds with limited specialized equipment and user expertise.

    摘要翻译： 本发明是用于组织工程和人造器官发育的生物体支架的微细加工的一系列软平版印刷方法。 根据最终应用，该方法具有广泛的可能性来构建具有所需特征的二维和三维支架。 该方法利用生物聚合物支架铸造的弹性体模具。 该方法允许以有限的专门设备和用户专业知识快速而廉价地生产生物聚合物支架。

    Direct patterning of silicon by photoelectrochemical etching
    10.
    发明授权
    Direct patterning of silicon by photoelectrochemical etching 有权
    通过光电化学蚀刻直接图案化硅

    公开(公告)号：US07433811B2

    公开(公告)日：2008-10-07

    申请号：US10838859

    申请日：2004-05-04

    申请人： Jun Gao ,  Michael J. Sailor ,  Sangeeta Bhatia ,  Christopher Flaim

    发明人： Jun Gao ,  Michael J. Sailor ,  Sangeeta Bhatia ,  Christopher Flaim

    IPC分类号： G06F17/50 ,  C23C20/00

    CPC分类号： B81C1/00515 ,  B81C2201/0114 ,  B81C2201/0115 ,  C25F3/12 ,  C25F3/14 ,  H01L21/3063

    摘要： The invention is directed to methods for direct patterning of silicon. The invention provides the ability to fabricate complex surfaces in silicon with three dimensional features of high resolution and complex detail. The invention is suitable, for example, for use in soft lithography as embodiments of the invention can quickly create a master for use in soft lithography. In an embodiment of the invention, electrochemical etching of silicon, such as a silicon wafer, for example, is conducted while at least a portion of the silicon surface is exposed to an optical pattern. The etching creates porous silicon in the substrate, and removal of the porous silicon layer leaves a three-dimensional structure correlating to the optical pattern.

    摘要翻译： 本发明涉及直接图案化硅的方法。 本发明提供了在硅中制造具有高分辨率和复杂细节的三维特征的复杂表面的能力。 本发明适用于例如在软光刻中使用，因为本发明的实施例可以快速地创建用于软光刻的母版。 在本发明的一个实施例中，例如硅的电化学蚀刻被进行，同时硅表面的至少一部分暴露于光学图案。 蚀刻在衬底中产生多孔硅，并且去除多孔硅层留下与光学图案相关的三维结构。